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    • 5. 发明申请
    • STRUCTURAL MEMBER FOR POLISHING
    • 结构构件用于抛光
    • WO2012173885A2
    • 2012-12-20
    • PCT/US2012/041535
    • 2012-06-08
    • 3M INNOVATIVE PROPERTIES COMPANYFUJITA, JunSAITO, Yusuke
    • FUJITA, JunSAITO, Yusuke
    • B24D3/20B24D11/00B24D3/34
    • B24D11/00
    • A structural member for polishing including a supporting member, a polishing material, and an adhesive agent layer bonding these together. The adhesive agent layer includes a polymer of monomers including from 58 to 85 wt% of a first monomer, from 2 to 7 wt% of a second monomer, and from 10 to 40 wt% of a third monomer. The first monomer is an alkyl (meth)acrylate having an alkyl group with carbon counts from 8 to 18 carbon atoms and provides a homopolymer with a glass transition temperature of 0°C or less. The second monomer is a polar monomer that provides a homopolymer with a glass transition temperature of 50°C or greater. The third monomer is an alkyl (meth)acrylate having an alkyl group with carbon counts from 4 to 18 carbon atoms or an aralkyl group having carbon counts from 7 to 18 carbon atoms and provides a homopolymer with a glass transition temperature of 10°C or greater.
    • 一种用于抛光的结构构件,包括支撑构件,抛光材料和将它们结合在一起的粘合剂层。 粘合剂层包括单体的聚合物,其包含58至85重量%的第一单体,2至7重量%的第二单体和10至40重量%的第三单体。 第一单体是具有碳数为8至18个碳原子的烷基的(甲基)丙烯酸烷基酯,并提供玻璃化转变温度为0℃或更低的均聚物。 第二单体是提供玻璃化转变温度为50℃或更高的均聚物的极性单体。 第三单体是具有碳数为4至18个碳原子的烷基或碳数为7至18个碳原子的芳烷基的(甲基)丙烯酸烷基酯,并提供玻璃化转变温度为10℃的均聚物或 更大。