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    • 3. 发明公开
    • 패턴형성방법
    • 图案形成方法,用于图案形成方法的抗蚀组合物,用于图案形成方法的阴极开发解决方案和用于图案形成方法的负面开发的冲洗解决方案
    • KR1020080092883A
    • 2008-10-16
    • KR1020080033950
    • 2008-04-11
    • 후지필름 가부시키가이샤
    • 츠바키히데아키타루타니신지미즈타니카즈요시와다켄지호시노와타루
    • G03F7/004
    • G03F7/0045G03F7/004G03F7/0047G03F7/038G03F7/0382G03F7/20
    • A patterning method is provided to reduce line edge roughness, and to improve dimensional stability of a pattern. A patterning method includes the steps of: (a) coating a substrate with a resist composition containing a resin which contains repeating units represented by the following formula(NGH-1), increases in polarity under an action of an acid, and decreases in solubility in a negative type developer; (b) performing exposure; and (c) performing developing using a negative type developer. In the formula, R_NGH1 represents a hydrogen atom or alkyl group, and each of R_NGH2 to R_NGH4 represents a hydrogen atom or hydroxyl group, with the proviso that at least one of R_NGH2 to R_NGH4 represents a hydroxyl group.
    • 提供了一种图案化方法以减少线边缘粗糙度,并提高图案的尺寸稳定性。 图案化方法包括以下步骤:(a)用含有含有下式(NGH-1)表示的重复单元的树脂的抗蚀剂组合物涂布基材,在酸的作用下极性增加,溶解度降低 在负型显影剂中; (b)进行曝光; 和(c)使用负型显影剂进行显影。 在该式中,R_NGH1表示氢原子或烷基,R_NGH2至R_NGH4各自表示氢原子或羟基,条件是R_NGH2至R_NGH4中的至少一个表示羟基。