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    • 1. 发明授权
    • 노광 장치 및 이를 이용하여 마스크와 기판 사이의 간극을설정하는 방법
    • 掩膜与底物之间建立Gab的曝光装置及方法
    • KR100793260B1
    • 2008-01-10
    • KR1020060033220
    • 2006-04-12
    • 주식회사 코디엠김광선김종원이우영조현찬
    • 임천희강흥석김채수김광선이우영조현찬김종원
    • H01L21/027
    • 본 발명에 따른 노광 장치는 마스크를 지지하는 마스크 홀더부, 기판을 지지하는 기판 스테이지부, 상기 기판 스테이지부를 지지하는 척 실린더부, 상기 척 실린더부를 X 축, Y 축, 그리고 θ 축으로 이동시키는 척 실린더 구동부를 포함한다. 척 실린더부는 상단 외측 측면에 스퍼 기어, 하단 외측 측면에 나사산, 그리고 하단 내측 측면에 오목부가 구비되고, 오목부 중심에 관통홀이 형성되어 있는 간극 조절 상부 하우징, 상단 내측 측면에 상기 간극 조절 상부 하우징의 나사산에 대응하는 나사산, 그리고 상부 내측에 오목부가 구비되고, 오목부 중심에 관통홀이 형성되어 있는 간극 조절 하부 하우징, 상기 간극 조절 상부 하우징의 관통홀과 간극 조절 하부 하우징의 관통홀을 통과하여 상하 운동하며, 상기 간극 조절 상부 하우징의 오목부의 하단과 상기 간극 조절 하부 하우징의 오목부의 상단 사이에 구비되는 공간부에 위치하는 돌출부를 가지는 간극 조절 샤프트, 및 공기를 공급 받아 상승하며, 상승시 상기 간극 조절 샤프트도 동시에 상승시키는 실린더 로드를 포함한다. 간극 조절 상부 하우징은 스퍼 기어를 이용하여 나사산을 따라 회전하면서 상부로 이동하여, 마스크와 기판 사이의 간극을 설정한다.
      노광 장치, 마스크, 간극
    • 2. 发明公开
    • 노광 장치 및 이를 이용하여 마스크와 기판 사이의 간극을설정하는 방법
    • 用于建立掩模和基材之间的GAB的曝光装置和方法
    • KR1020070101715A
    • 2007-10-17
    • KR1020060033220
    • 2006-04-12
    • 주식회사 코디엠김광선김종원이우영조현찬
    • 임천희강흥석김채수김광선이우영조현찬김종원
    • H01L21/027
    • G03F9/7023G03F7/7035G03F7/707G03F7/70716G03F7/70775
    • An exposure device and a method for establishing a gap between a mask and a substrate using the same are provided to exchange a chuck cylinder part by forming the chuck cylinder part with one unit system. An exposure device includes a chuck cylinder part. The chuck cylinder part includes an upper gap control housing(310), a lower gap control housing(320), a gap control shaft(330), a cylinder rod(340), and a gap maintaining part(500). The upper gap control housing has a spur gear and a screw thread at the outer side thereof, and has a concave part on the inner wall thereof. The gap control shaft passes through a through hole which is formed on the concave part of the upper gap control housing. The lower gap control housing has a bigger diameter than the upper gap control housing to receive the upper gap control housing, and has a concave part on the inner wall thereof. The gap control shaft passes through a through hole which is formed on the concave part of the lower gap control housing. The cylinder rod is contacted to the gap control shaft, and raises the gap control shaft by receiving air from a cylinder air passage. The gap maintaining part fixes a gap control unit for preventing the chuck cylinder part from falling below the established gap when the air is exhausted.
    • 提供曝光装置和使用其的掩模和基板之间建立间隙的方法,以通过用一个单元系统形成卡盘圆筒部分来更换卡盘圆筒部分。 曝光装置包括卡盘筒部分。 卡盘缸部分包括上间隙控制壳体(310),下间隙控制壳体(320),间隙控制轴(330),气缸杆(340)和间隙保持部分(500)。 上间隙控制壳体在其外侧具有正齿轮和螺纹,并且在其内壁上具有凹部。 间隙控制轴穿过形成在上部间隙控制壳体的凹部上的通孔。 下部间隙控制壳体具有比上部间隙控制壳体更大的直径以容纳上部间隙控制壳体,并且在其内壁上具有凹部。 间隙控制轴穿过形成在下部间隙控制壳体的凹部上的通孔。 气缸杆与间隙控制轴接触,并通过从气缸空气通道接收空气来升高间隙控制轴。 间隙保持部固定用于当空气排出时防止卡盘缸部件落在建立的间隙之下的间隙控制单元。
    • 3. 发明授权
    • 노광장치
    • 曝光装置
    • KR100823180B1
    • 2008-04-18
    • KR1020070026692
    • 2007-03-19
    • 주식회사 코디엠이우영김광선김종원
    • 강흥석이우영김광선김종원
    • H01L21/027
    • G03F7/70191G03F7/70316
    • An exposure apparatus is provided to adjust the quantity of light of a lamp by using an inexpensive light quantity adjusting part having a plurality of light transmission holes without using an expensive ND(neutral density) filter. A reflection plate collects the light generated from a lamp to reflect the collected light downward, installed in a chamber. A light quantity adjusting part(210) adjusts the quantity of light transferred from the reflection plate, installed under the reflection plate and capable of being changed. A pair of first and second reflection mirrors reflect the light having passed through the light quantity adjusting part in both lateral directions. A pair of lenses collects the light transferred as a dispersed state through the second reflection mirror to transfer the collected light to the edge of the substrate. A sub chamber can guarantee the path of parallel light transferred to the first reflection mirror, connected to the lower part of the chamber, and the light quantity adjusting part can be installed in the sub chamber.
    • 提供一种曝光装置,通过使用具有多个透光孔的便宜的光量调节部件,而不使用昂贵的ND(中性密度)滤光片来调节灯的光量。 反射板收集从灯产生的光以将收集的光向下反射,安装在室中。 光量调节部(210)调整从安装在反射板的下方的能够变化的反射板传递的光量。 一对第一反射镜和第二反射镜在两个横向上反射通过光量调节部分的光。 一对透镜通过第二反射镜收集作为分散状态传送的光,以将收集的光转移到基板的边缘。 子室可以保证传送到第一反射镜的平行光的路径,连接到室的下部,并且光量调节部可以安装在子室中。
    • 5. 发明授权
    • 액체분사용 슬릿 노즐
    • 用于喷雾液体的液体喷嘴
    • KR100823182B1
    • 2008-04-21
    • KR1020070026694
    • 2007-03-19
    • 주식회사 코디엠이우영김종원
    • 강흥석박용규이우영김종원
    • G02F1/13
    • B05C5/0254B05B1/044B05C5/0262B05C11/10G02F1/1303
    • A slit nozzle for injecting liquid is provided to secure the uniform liquid injection pressure over the entire slit nozzle, thereby injecting the liquid into an object with wide area uniformly. A supply member has an inlet connected with a pipe for supplying liquid. A longitudinally formed guide groove is communicated with the inlet. A distribution member(200) is closely combined with a side of the guide groove and has a longitudinally formed distribution groove at the other side thereof. The distribution groove and guide groove are communicated by plural distribution holes. A fixing member(300) is combined with the other side of the distribution member. A gap plate(400) is installed between the distribution member and the fixing member and forms a gap so that the liquid is injected downwardly toward the distribution member and the fixing member. The section shape of the guide groove and the distribution groove is a semi-circle or a semi-ellipse.
    • 设置用于注入液体的狭缝喷嘴以确保在整个狭缝喷嘴上均匀的液体喷射压力,从而将液体均匀地喷射到具有广泛区域的物体中。 供给构件具有与用于供应液体的管连接的入口。 纵向成形的引导槽与入口连通。 分配构件(200)与导向槽的一侧紧密结合,并且在其另一侧具有纵向形成的分配槽。 分配槽和引导槽通过多个分配孔连通。 固定构件(300)与分配构件的另一侧组合。 间隔板(400)安装在分配构件和固定构件之间并形成间隙,使得液体朝向分配构件和固定构件向下注入。 引导槽和分配槽的截面形状是半圆形或半椭圆形。
    • 6. 发明授权
    • 냉각장치가 구비된 노광설비
    • 具有冷却装置的曝光装置
    • KR100823181B1
    • 2008-04-21
    • KR1020070026693
    • 2007-03-19
    • 주식회사 코디엠이우영서화일김종원
    • 강흥석박용규이우영서화일김종원
    • H01L21/027
    • G03F7/70891G03F7/7015G03F7/702
    • Exposure equipment with a cooling apparatus is provided to adjust the temperature in a chamber by supplying and circulating water of low temperature to cooling pipes installed in both sides of the chamber. A reflection plate for reflecting the light generated from a lamp downward is installed in a chamber. A pair of first and second reflection mirrors reflect the light transferred from the reflection plate in both lateral directions. A pair of lenses collect the light transferred as a dispersed state from the second reflection mirror to transfer the collected light to the edge of a substrate. Cooling pipes(150a,150b) uniformly maintains the inner temperature of the chamber increased by the lamp, installed in both lateral surfaces of the chamber. A sub chamber can guarantee the path of the parallel light transferred to the first reflection mirror through the reflection plate, installed between the lamp and the first reflection mirror.
    • 提供具有冷却装置的曝光设备,通过将低温水供应并循环到安装在室的两侧的冷却管道来调节室内的温度。 用于将从灯泡产生的光向下反射的反射板安装在室中。 一对第一和第二反射镜在两个横向上反射从反射板传递的光。 一对透镜从第二反射镜收集作为分散状态传送的光以将收集的光转印到基板的边缘。 冷却管(150a,150b)通过安装在室的两个侧表面中的灯均匀地保持室的内部温度升高。 子室可以保证通过安装在灯和第一反射镜之间的反射板传递到第一反射镜的平行光的路径。
    • 9. 发明授权
    • 기판 스테이지
    • 基台阶段
    • KR100776634B1
    • 2007-11-15
    • KR1020060055749
    • 2006-06-21
    • 주식회사 코디엠이우영김종원서재용
    • 강흥석이우영김종원서재용
    • H01L21/683
    • H01L21/6838G02F1/1303H01L21/687
    • A substrate stage is provided to simplify transfer and post-treatment processes on a substrate by decreasing a size of an upper stage of the substrate stage. A substrate stage includes a lower stage, plural upper stages(200), and plural couplers(300). The lower stage is arranged to correspond to a size of a substrate. The upper stage is arranged to correspond to a portion of a size of the substrate. The upper stage is contacted with the substrate and supports and fixes the substrate. The coupler couples the upper stage with the lower stage while adjusting a distance between the upper and lower stages. An overall size of the upper stages corresponds to a size of the substrate. The substrate stage supports and fixes the substrate in a horizontal direction accurately.
    • 提供衬底台以通过减小衬底台的上级的尺寸来简化衬底上的传输和后处理过程。 衬底台包括下级,多个上级(200)和多个联接器(300)。 下层设置成对应于基板的尺寸。 上层设置成对应于基板尺寸的一部分。 上层与衬底接触并支撑并固定衬底。 耦合器将上级与下级耦合,同时调节上级和下级之间的距离。 上层的总体尺寸对应于基板的尺寸。 衬底台在水平方向上准确地支撑并固定衬底。