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    • 3. 发明公开
    • 전자 적용을 위한 신규한 전계발광 중합체
    • 用于电子应用的新型电致发光聚合物
    • KR1020090029844A
    • 2009-03-23
    • KR1020097003077
    • 2007-07-04
    • 시바 홀딩 인크
    • 셰퍼토마스무러페터힌터만토비아스슈미트할터베아트
    • C08G61/12C08G61/00C08L65/00H01L51/42
    • H05B33/14C08G61/02C08G61/10C08G61/122C09B57/00C09B57/008C09K11/06C09K2211/1416C09K2211/1466H01L51/0035H01L51/5012Y02E10/549Y10S428/917
    • The present invention relates to novel polymers comprising a repeating unit(s) of the formula (I) wherein at least one of the substituents R1, R2, R3, R4, R5, R6, and R7 is a group-(Sp)x1-HEI, wherein Sp is a spacer unit, HE1 is a group (HE1I), which increases the hole-injection and/or hole-transport properties of the polymers; or a group (HE1II), which increases the electron-injection and/or electron-transport properties of the polymers, or a group (HE1III), which increases the hole-injection and/or hole-transport properties of the polymers and the electron-injection and/or electron-transport properties of the polymers, x1 is 0, or 1, and their use in electronic devices. The polymers according to the invention have excellent solubility in organic solvents and excellent film-forming properties. In addition, high charge carrier mobilities and high temperature stability of the emission color can be observed, if the polymers according to the invention are used in polymer light emitting diodes (PLEDs).
    • 本发明涉及包含式(I)的重复单元的新型聚合物,其中取代基R 1,R 2,R 3,R 4,R 5,R 6和R 7中的至少一个为基团 - (Sp)x1- HEI,其中Sp是间隔单元,HE1是基团(HE1I),其增加了聚合物的空穴注入和/或空穴传输性质; 或增加聚合物的电子注入和/或电子传输性质的组(HE1II)或增加聚合物和电子的空穴注入和/或空穴传输性质的基团(HE1III) - 聚合物的注入和/或电子传输性质,x1为0或1,以及它们在电子器件中的用途。 根据本发明的聚合物在有机溶剂中具有优异的溶解性和优异的成膜性能。 此外,如果根据本发明的聚合物用于聚合物发光二极管(PLED)中,则可以观察到高电荷载流子迁移率和发光颜色的高温稳定性。
    • 4. 发明授权
    • 치환된 옥심 유도체 및 이를 포함하는 조성물
    • 치환된옥심유유도체및이를포함하는조성
    • KR100875612B1
    • 2008-12-24
    • KR1020037015730
    • 2002-05-23
    • 시바 홀딩 인크
    • 마쓰모토아키라야마토히토시아사쿠라도시카게오와마사키무러페터
    • C07D333/36
    • G03F7/0045B33Y70/00C07C309/00C07D333/36G03F7/0007G03F7/001G03F7/0382G03F7/0392Y10S430/114Y10S430/117Y10S430/12Y10S430/122
    • New oxime sulfonate compounds of the formula (I) and (II), wherein R 1 is C 1 -C 12 alkyl, C 1 C 4 haloalkyl, hydrogon, OR 9 , NR 10 R 11 , SR 12 or is phenyl which is unsubstituted or substituted by OH, C 1 -C 18 alkyl, halogen and/or C 1 -C 12 alkoxy; R 2 , R 3 , R 4 and R 5 are for example hydrogen or C 1 -C 12 alkyl; R 6 is for example is C 1 -C 18 alkylsulfonyl, phenyl-C 1 -C 3 alkylsulfonyl or phenylsulfonyl; R' 6 is for example phenylenedisulfonyl or diphenylenedisulfonyl; R 7 , R 8 and R 9 for example are hydrogen or C 1 -C 6 alkyl; R 10 and R 11 , are for example hydrogen or C 1 -C 18 alkyl; R 12 is for example hydrogen, phenyl or C 1 -C 18 alkyl; A is S, O, NR 13 , or a group of formula A1, A2 or A3, R 21 and R22 independently of one other have one of the meanings given for R 7 ; R 23 , R 24 , R 25 and R 26 independently of one another are for example hydrogen, C 1 -C 4 alkyl, halogen or phenyl; Z is CR 22 or N; and Z 1 is CR 22 or N; and Z 1 is CR 22 or N; and Z 1 is CH 2 , S, O or NR 13 are particularly suitable as photo-latent acids in resist applications.
    • 式(I)和(II)的新的肟磺酸盐化合物,其中R SUB 1 1 SUB是C SUB 1 C SUB 12 C 1烷基, SUB> 1< SUB> 4> 4>卤代烷基,hydrogon,OR< sub> 9< SUB>,NR< SUB> 10< SUB> 11< 或者是未取代的或被OH取代的苯基,C 1 -C 18亚烷基,C 1 -C 18亚烷基,卤素和/或C 1 SUB 1 ; / SUB> -C<副> 12< / SUB>烷氧基; R SUB 3 SUB,R SUB 3 SUB,R SUB 4 4 SUB和R SUB 5 SUB例如是氢或C SUB。 1·; / SUB> -C<副> 12< / SUB>烷基; R SUB 6例如为C 1 -C 18烷基磺酰基,苯基-C 1 SUB 1 -C 2 SUB 3 C 1 -C 4烷基磺酰基,苯基-C 1 -C 4烷基磺酰基,苯基-C 1 -C 4烷基磺酰基, ; 3烷基磺酰基或苯磺酰基; 例如亚苯基二磺酰基或二亚苯基二磺酰基; R SUB 7 / SUB,R SUB 8 / SUB和R SUB 9 9例如是氢或C 1 -C 4烷基。 6≤/ SUB>烷基; R SUB 10和SUB SUB 11例如是氢或C 1 -C 18烷基,C 18烷基,C 1 -C 18烷基,C 1 -C 18烷基,C 1 -C 18烷基, R SUB 12例如为氢,苯基或C 1 -C 18亚烷基18 C 18亚烷基或C 1 -C 18亚烷基; A是S,O,NR SUB 13 / SUB或式A1,A2或A3,R SUB 21和SUB 22的基团彼此独立地具有以下含义之一: R<副大于7< / SUB取代; 其中R SUB,23 SUB,R SUB 24,SUB SUB 25,SUB SUB 26和SUB SUB 26分别是彼此独立的例如氢, C 1 -C 4烷基,卤素或苯基; C 1 -C 4烷基,C 1 -C 4烷基,C 1 -C 4烷基,C 1 -C 4烷基, Z是CR SUB 22 / N或N; 并且Z SUB 1 1 SUB是CR SUB 22 SUB或N; 并且Z SUB 1 1 SUB是CR SUB 22 SUB或N; 并且Z SUB1 / SUB是CH SUB 2 SUB,S,O或NR SUB 13 SUB特别适合作为抗蚀剂应用中的光潜酸。
    • 6. 发明公开
    • 설포네이트 유도체 및 잠산으로서의 이의 용도
    • 磺酸盐衍生物及其用途Jamsan
    • KR1020040089607A
    • 2004-10-21
    • KR1020047012252
    • 2003-01-28
    • 시바 홀딩 인크
    • 마쓰모토아키라야마토히토시아사쿠라도시카게무러페터
    • G03F7/004
    • G03F7/0037B33Y70/00C07C323/66C07C381/00G03F7/001G03F7/0045G03F7/038G03F7/0382G03F7/0392G03F7/0397G03F7/0758Y10S430/114
    • 본 발명의
      산의 작용시 경화되는 화합물 또는 산의 작용시 용해도가 증가되는 화합물(a) 및
      감광성 산 공여체로서의 하나 이상의 화학식 Ia, Ib, IIa, IIb, IIIa, IIIb, IVa, IVb, Va, Vb 또는 VIa의 화합물(b)을 포함하는, 화학 증폭형 감광성 내식막 조성물은 우수한 내식막 특성을 갖는 높은 분해능을 제공한다.
      화학식 Ia

      화학식 Ib

      화학식 IIa

      화학식 IIb

      화학식 IIIa

      화학식 IIIb

      화학식 IVa

      화학식 IVb

      화학식 Va

      화학식 Vb

      화학식 VIa

      위의 화학식 Ia 내지 VIa에서,
      n은 1 또는 2이고;
      m은 0 또는 1이며;
      X
      0 은 -[CH
      2 ]
      h -X 또는 CH=CH
      2 이고;
      h는 2, 3, 4, 5 또는 6이며;
      R
      1 은, n이 1인 경우, 예를 들면, 임의로 치환된 페닐, 나프틸, 안트라실, 페난트릴 또는 헤테로아릴이고;
      R
      1 은, n이 2인 경우, 예를 들면, 임의로 치환된 페닐렌 또는 나프틸렌이며;
      R
      2 는, 예를 들면, R
      1 에 대한 정의들 중의 하나이고;
      X는, 예를 들면, -OR
      20 , -NR
      21 R
      22 , -SR
      23 이며;
      X'는 이고;
      X
      1 및 X
      2 는, 예를 들면, -O-, -S- 또는 직접 결합이며;
      A
      3 은, 에를 들면, 페닐렌이고;
      R
      3 은, 예를 들면, R
      1 에 대한 정의들 중의 하나이며;
      R
      4 는, 예를 들면, R
      2 에 대한 정의들 중의 하나이고;
      R
      5 및 R
      6 은, 예를 들면, 수소이며;
      G는, 예를 들면, -S- 또는 -O-이고;
      R
      7 은, n이 1인 경우, 예를 들면, 임의로 치환된 페닐이고, n이 2인 경우, 예를 들면, 페닐렌이며;
      R
      8 및 R
      9 는, 예를 들면, C
      1 -C
      18 알킬이고;
      R
      10 은 R
      7 에 대한 정의들 중의 하나이며;
      R
      11 은, 예를 들면, C
      1 -C
      18 알킬이고;
      R
      12 , R
      13 , R
      14 , R
      15 , R
      16 , R
      17 및 R
      18 은, 예를 들면, 수소 또는 C
      1 -C
      18 알킬이며;
      R
      20 , R
      21 , R
      22 및 R
      23 은, 예를 들면, 페닐 또는 C
      1 -C
      18 알킬이다.
    • 9. 发明公开
    • 아실포스판 및 이의 유도체의 제조방법
    • 制备其中的酰亚胺及其衍生物的方法
    • KR1020070086609A
    • 2007-08-27
    • KR1020077014374
    • 2005-11-14
    • 시바 홀딩 인크
    • 무러페터울프쟝-피에르부르크하르트슈테판그뤼츠마허한스외르크슈타인다니엘디틀리커쿠르트
    • C07F9/50C07F9/02
    • G03F7/029C07F9/5036C07F9/5337C07F9/5537C07F9/65515C07F9/6552
    • The invention relates to a process for the preparation of (bis)acylphosphanes of formula I, wherein n and m are each independently of the other 1 or 2; R1 if n = 1, is e.g. unsubstituted or substituted C1-C 18alkyl or C2-C18alkenyl, or phenyl, R1 if n = 2, is e.g. a divalent radical of the monovalent radical defined above; R2 is e.g. C1-C18alkyl, C3-C12 cycloalkyl, C2-C18alkenyl, mesityl, phenyl, naphthyl; R3 is one of the radicals defined under R1; the process comprises the steps a) contacting e.g. elemental phosphorous [P] ∞, P(Hal)3 with a reducing metal optionally in the presence of a catalyst or an activator in a solvent to obtain metal phosphides Me3P or Me'3P2, wherein Me is an alkali metal and Me' is an earth alkali metal or to obtain metal polyphosphides b) optionally adding a proton source, optionally in the presence of a catalyst or an activator to obtain metal dihydrogen phosphides MePH2; c) subsequent acylation reaction with m acid halides of formula III or m carboxylic acid esters of formula IV or, in case that in formula I m = 1, with one carboxylic ester of formula IV followed by one acid halide of formula III or vice versa, wherein R is the residue of an alcohol and R2 is as defined above; d) alkylation reaction subsequent reaction with an electrophilic agent R 1Hal or other electrophilic agents to obtain the compounds of formula I. An oxidation step may follow to obtain mono-and bisacylphosphane oxides or mono-and bisacylphosphane sulfides, which are used as photoinitiators.
    • 本发明涉及制备式(I)的(双)酰基磷烷的方法,其中n和m各自独立地为1或2; 如果n = 1,则为R1。 未取代或取代的C 1 -C 18烷基或C 2 -C 18链烯基或苯基,如果n = 2,则为R 1。 上述定义的一价基团的二价基团; R2是例如 C 1 -C 18烷基,C 3 -C 12环烷基,C 2 -C 18烯基,均三甲基,苯基,萘基; R3是R1下定义的基团之一; 该方法包括以下步骤:a) 元素磷[P]∞,P(Hal)3与还原金属,任选在催化剂或活化剂存在下在溶剂中,得到金属磷化物Me3P或Me'3P2,其中Me是碱金属,Me'是 碱土金属或获得金属多磷酸盐b)任选地在催化剂或活化剂存在下加入质子源以获得金属磷化氢MePH2; c)随后与式III的酰基卤或式IV的羧酸酯的酰化反应,或在式I中m = 1的情况下,与一种式IV的羧酸酯接触,然后加入式III的酰卤,反之亦然 其中R是醇的残基,R 2如上所定义; d)烷基化反应随后与亲电子试剂R 1 Hal或其他亲电子试剂反应得到式Ⅰ化合物。随后可以进行氧化步骤,得到单酰基和双酰基膦烷氧化物或用作光引发剂的单酰基和双酰基磷烷硫化物。