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1. 发明公开

KR1020100002206A 화학 증폭형 포지티브 레지스트 조성물 审中-实审
标题翻译：一种化学放大的积极抵抗组合物
公开(公告)号：KR1020100002206A
公开(公告)日：2010-01-06
申请号：KR1020090057302
申请日：2009-06-25
申请人： 스미또모 가가꾸 가부시키가이샤
发明人： 시게마쓰준지 , 에다마쓰구니시게 , 미야가와다카유키 , 가마부치아키라
IPC分类号： G03F7/039 , G03F7/004
CPC分类号： G03F7/0397 , G03F7/0046
摘要： PURPOSE: A chemically amplified positive resist composition is provided to form a resist film having good homogeneous film surface, to suppress the formation of defects, and to be suitable for ArF excimer laser lithography process, KrF excimer laser lithography process and ArF immersion lithography process. CONSTITUTION: A chemically amplified positive resist composition comprises: a resin (A) which itself is insoluble or poorly soluble in an aqueous alkali solution but becomes soluble in an aqueous alkali solution by the action of an acid and which comprises a structural unit having an acid-labile group in a side chain and a structural unit represented by the formula (I), wherein R1 represents a hydrogen atom or a methyl group, ring X1 represents an unsubstituted or substituted C3-C30 cyclic hydrocarbon group having -COO- and k represents an integer of 1 to 4, a resin (B) which comprises a structural unit represented by the formula (II), wherein R2 represents a hydrogen atom, a methyl group or a trifluoromethyl group, and an acid generator.
摘要翻译：目的：提供化学放大的正性抗蚀剂组合物以形成具有良好的均匀膜表面的抗蚀剂膜，以抑制缺陷的形成，并且适用于ArF准分子激光光刻工艺，KrF准分子激光光刻工艺和ArF浸没光刻工艺。构成：化学增幅正型抗蚀剂组合物包括：本身在碱性水溶液中不溶或难溶于但在酸性水溶液中溶解的树脂（A），其包含具有酸的结构单元（I）表示的结构单元，其中，R 1表示氢原子或甲基，环X1表示未取代或取代的C 30 -C 30环状烃基，k表示 1〜4的整数，由式（II）表示的结构单元的树脂（B），其中，R2表示氢原子，甲基或三氟甲基，酸产生剂。

2. 发明授权

KR101556096B1 산 발생제에 적합한 염 및 이를 함유하는 화학 증폭형포지티브 내식막 조성물 有权
标题翻译：适用于酸产生剂的盐和含有该盐的化学放大型正性抗蚀剂组合物
公开(公告)号：KR101556096B1
公开(公告)日：2015-09-30
申请号：KR1020070083532
申请日：2007-08-20
申请人： 스미또모 가가꾸 가부시키가이샤
发明人： 시게마쓰준지 , 요시다이사오 , 하라다유카코 , 스에쓰구마스미
IPC分类号： G03F7/039
CPC分类号： C07C309/17 , C07C381/12 , C07C2601/14 , C07C2603/74 , C07D313/06 , C07D333/46 , C07D335/00 , G03F7/0045 , G03F7/0397
摘要： 본발명은화학식 1의염을제공한다. 화학식 1 위의화학식 1에서, X는하나이상의 2가지환식탄화수소그룹을함유하는 C3-C30 2가그룹이고, 상기 C3-C30 2가그룹에서하나이상의 -CH-는 -O- 또는 -CO-로치환될수 있고, Y는 C1-C6 알콕시그룹, C1-C4 퍼플루오로알킬그룹, C1-C6 하이드록시알킬그룹, 하이드록실그룹및 시아노그룹으로부터선택된하나이상의그룹으로치환될수 있는 C3-C30 환식탄화수소그룹이고, 상기 C3-C30 환식탄화수소그룹에서하나이상의 -CH-는 -O- 또는 -CO-로치환될수 있고, Q및 Q는각각독립적으로불소원자또는 C1-C6 퍼플루오로알킬그룹이고, A는유기상대이온이다.

3. 发明公开

KR1020080037533A 다가 페놀 화합물 및 이를 함유하는 화학증폭형 레지스트조성물 无效
标题翻译：多羟基苯酚化合物和含有其的化学稳定组合物
公开(公告)号：KR1020080037533A
公开(公告)日：2008-04-30
申请号：KR1020070106879
申请日：2007-10-23
申请人： 스미또모 가가꾸 가부시키가이샤
发明人： 다케모토이치키 , 안도노부오 , 시게마쓰준지
IPC分类号： C07C43/02 , C07C43/20 , C07C33/36
CPC分类号： C07C39/15 , C07C67/31 , C07C69/712 , G03F7/0045 , G03F7/0397 , Y10S430/106 , Y10S430/111
摘要： A novel polyhydric phenol compound, a method for preparing the compound, and a chemically amplified resist composition containing the compound are provided to improve the resolution and line edge roughness of pattern. A polyhydric phenol compound is represented by the formula I, wherein at least one of R1, R2, R3, R4 and R5 is a group represented by the formula II, and the rest is H. In the formula II, X1, X2, X3 and X4 are independently H or a C1-C4 alkyl group; n is an integer of 0-3; Z1 is a C1-C6 alkyl group or a C3-C12 cycloalkyl group; and Y is an alicyclic hydrocarbon group. A chemically amplified resist composition comprises the polyhydric phenol compound of the formula I; and an acid generator.
摘要翻译：提供了一种新型多元酚化合物，该化合物的制备方法和含有化合物的化学放大型抗蚀剂组合物，以提高图案的分辨率和线边缘粗糙度。多元酚化合物由式I表示，其中R 1，R 2，R 3，R 4和R 5中的至少一个为式II表示的基团，其余为H.在式II中，X 1，X 2，X 3 X4独立地为H或C1-C4烷基; n为0-3的整数; Z1是C1-C6烷基或C3-C12环烷基; Y为脂环族烃基。化学放大抗蚀剂组合物包含式I的多元酚化合物; 和酸发生剂。

4. 发明公开

KR1020080018113A 산 발생제에 적합한 염 및 이를 함유하는 화학 증폭형포지티브 내식막 조성물 有权
标题翻译：适用于酸发生器的盐和含有该酸的化学阳离子组合物
公开(公告)号：KR1020080018113A
公开(公告)日：2008-02-27
申请号：KR1020070083532
申请日：2007-08-20
申请人： 스미또모 가가꾸 가부시키가이샤
发明人： 시게마쓰준지 , 요시다이사오 , 하라다유카코 , 스에쓰구마스미
IPC分类号： G03F7/039
CPC分类号： C07C309/17 , C07C381/12 , C07C2601/14 , C07C2603/74 , C07D313/06 , C07D333/46 , C07D335/00 , G03F7/0045 , G03F7/0397
摘要： A salt suitable for an acid generator, a method for preparing the salt, and a chemically amplified positive corrosion resistant layer composition containing the salt are provided to improve the resolution of pattern. A salt suitable for an acid generator is represented by the formula 1, wherein X is a C3-C30 divalent group containing at least two acyclic hydrocarbon groups whose at least one -CH2- can be substituted with -O- or -CO-; Y is a C3-C30 cyclic hydrocarbon group capable of being substituted with a C1-C6 alkoxy group, a C1-C4 perfluoroalkyl group, a C1-C6 hydroxyalkyl group, a hydroxyl group or a cyano group whose at least one -CH2- can be substituted with -O- or -CO-; Q1 and Q2 are independently F or a C1-C6 perfluoroalkyl group; and A^+ is an organic counterion.
摘要翻译：提供适用于酸产生剂的盐，制备盐的方法，以及含有该盐的化学放大的耐腐蚀积层组合物以提高图案的分辨率。适用于酸发生剂的盐由式1表示，其中X是含有至少两个无环烃基的C 3 -C 30二价基团，其至少一个-CH 2 - 可以被-O-或-CO-取代; Y是能够被C 1 -C 6烷氧基，C 1 -C 4全氟烷基，C 1 -C 6羟基烷基，羟基或氰基取代的C 3 -C 30环烃基，其至少一个-CH 2 - 可以被-O-或-CO-取代; Q1和Q2独立地为F或C1-C6全氟烷基; 而A ^ +是一种有机的抗衡离子。

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