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    • 5. 发明公开
    • 질화물 반도체 발광소자
    • 氮化物半导体发光器件
    • KR1020110057541A
    • 2011-06-01
    • KR1020090113986
    • 2009-11-24
    • 삼성전자주식회사
    • 한상헌천주영김제원이동주신동철심현욱한재웅
    • H01L33/06
    • H01L33/06H01L33/32
    • PURPOSE: A nitride semiconductor light emitting device is provided to improve external quantum efficiency by controlling the thickness of a quantum well according to a low current density and a high current density. CONSTITUTION: An active layer(130) is formed on a first conductive nitride semiconductor layer. An active layer has a structure where a plurality of quantum well layers and quantum barrier layers are alternatively arranged. A second conductive nitride semiconductor layer is formed on the active layer. The plurality of quantum well layers include a first quantum layer(131a) and a second quantum layer(131b) with different thicknesses. The first and second quantum well layers emit light with the same wavelength.
    • 目的:提供氮化物半导体发光器件,以通过根据低电流密度和高电流密度控制量子阱的厚度来提高外部量子效率。 构成:在第一导电氮化物半导体层上形成有源层(130)。 有源层具有交替布置多个量子阱层和量子势垒层的结构。 在有源层上形成第二导电氮化物半导体层。 多个量子阱层包括具有不同厚度的第一量子层(131a)和第二量子层(131b)。 第一和第二量子阱层发射具有相同波长的光。
    • 6. 发明公开
    • 반도체 발광소자 및 이를 제조하는 방법
    • 半导体发光器件及其制造方法
    • KR1020110041683A
    • 2011-04-22
    • KR1020090098623
    • 2009-10-16
    • 삼성전자주식회사
    • 한재웅김제원심현욱신동철이동주한상헌
    • H01L33/20
    • PURPOSE: A semiconductor light emitting device and a manufacturing method thereof are provided to improve the light emission efficiency by reducing the crystal defect in the semiconductor layer. CONSTITUTION: A n-type semiconductor layer(101) has the pit formed on the upper side. An intermediate layer comprises the domain doped on the n-type semiconductor layer to the p-type impurity. An active layer(103) is formed on the intermediate layer. A p-type semiconductor layer(105) is formed on the active layer. The intermediate layer is divided into the low resistance region and the high resistance region formed on the n-type semiconductor layer upper side except for the pit.
    • 目的:提供半导体发光器件及其制造方法,以通过减少半导体层中的晶体缺陷来提高发光效率。 构成:n型半导体层(101)在上侧形成有凹坑。 中间层包括在n型半导体层上掺杂到p型杂质的畴。 在中间层上形成有源层(103)。 在有源层上形成p型半导体层(105)。 中间层被分成低电阻区域和形成在除了凹坑之外的n型半导体层上侧的高电阻区域。
    • 9. 发明公开
    • 반도체 발광소자 및 그 제조방법
    • 半导体发光器件及其制造方法
    • KR1020110091245A
    • 2011-08-11
    • KR1020100010985
    • 2010-02-05
    • 삼성전자주식회사
    • 심현욱한상헌한재웅신동철김제원이동주
    • H01L33/20
    • H01L33/22H01L33/007H01L33/025H01L33/32H01L33/36H01L2933/0016
    • PURPOSE: A semiconductor light emitting device and a manufacturing method thereof are provided to improve optical extraction efficiency by forming a pit in over the top surface of the light emitting device and multiplying light extraction efficiency to the outside through the four sides of the pit. CONSTITUTION: An n-type semiconductor layer(130) has one or more pits on the upper side. An active layer(140) is formed on the n-type semiconductor layer. The area corresponding to the pits has bent upper side along the pits. A p-type semiconductor layer(150) is formed on the active layer. The area corresponding to the pits has bent upper side along the active layer. The active layer and the upper side of the p-type semiconductor layer include a first area which is bent toward the pits and a second area which is not bent.
    • 目的:提供半导体发光器件及其制造方法,以通过在发光器件的顶表面上形成凹坑并通过凹坑的四边将光提取效率乘以外部来提高光提取效率。 构成:n型半导体层(130)在上侧具有一个或多个凹坑。 在n型半导体层上形成有源层(140)。 与坑相对应的区域沿着凹坑弯曲上侧。 在有源层上形成p型半导体层(150)。 与凹坑相对应的区域沿着活性层弯曲上侧。 p型半导体层的有源层和上侧包括朝向凹坑弯曲的第一区域和不弯曲的第二区域。
    • 10. 发明公开
    • 질화물 반도체 발광소자
    • 氮化物半导体发光器件
    • KR1020110070545A
    • 2011-06-24
    • KR1020090127403
    • 2009-12-18
    • 삼성전자주식회사
    • 한재웅심현욱한상헌이동주신동철
    • H01L33/06
    • H01L33/06H01L33/0008H01L33/36H01L2924/12041
    • PURPOSE: A nitride semiconductor light emitting device is provided to improve the optical output of a light emitting device by increasing the injection of holes by reducing potential barrier due to piezoelectric effect. CONSTITUTION: An n type nitride semiconductor layer(120) is formed on a substrate. An active layer(130) is formed on the n type nitride semiconductor layer by alternatively stacking a plurality of quantum well layers(131) and a plurality of quantum barrier layers(133). The quantum barrier layer includes an intermediate well layer(135b) and a sub quantum barrier layer(135a) with a different energy band gap. A p type nitride semiconductor layer(140) is formed on the active layer.
    • 目的:提供一种氮化物半导体发光器件,用于通过由于压电效应降低势垒来增加空穴的注入来改善发光器件的光输出。 构成:在衬底上形成n型氮化物半导体层(120)。 通过交替堆叠多个量子阱层(131)和多个量子势垒层(133),在n型氮化物半导体层上形成有源层(130)。 量子势垒层包括具有不同能带隙的中间阱层(135b)和子量子势垒层(135a)。 在有源层上形成p型氮化物半导体层(140)。