专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

KR102100184B1 디스플레이 장치 有权
公开(公告)号：KR102100184B1
公开(公告)日：2020-04-13
申请号：KR1020130017118
申请日：2013-02-18
申请人： 삼성전자주식회사
发明人： 김학영 , 김고현
IPC分类号： H04N5/64 , G06F1/16

2. 发明授权

KR102040288B1 디스플레이 장치 有权
公开(公告)号：KR102040288B1
公开(公告)日：2019-11-04
申请号：KR1020130021459
申请日：2013-02-27
申请人： 삼성전자주식회사
发明人： 김고현 , 김학영
IPC分类号： H04N5/64 , H04N21/4227

3. 发明公开

KR1020170107167A 플라즈마 처리 장치 审中-实审
标题翻译：等离子处理设备
公开(公告)号：KR1020170107167A
公开(公告)日：2017-09-25
申请号：KR1020160030741
申请日：2016-03-15
申请人： 삼성전자주식회사
发明人： 조남기 , 김학영 , 송인철
IPC分类号： H01J37/32
摘要： 플라즈마처리장치가제공된다. 플라즈마처리장치는, 용기본체와상기용기본체상의상부판을포함하는반응챔버, 상기반응챔버내에, 상기용기본체의일면상에배치되고, 자기장을투과시키는윈도우(window), 및상기윈도우내에배치되는펠티어(peltier) 소자를포함한다.
摘要翻译：提供了一种等离子体处理装置。的等离子体处理装置，在反应室中，所述包括在容器主体与容器主体的顶板的反应室，设置在容器主体的第一表面上，用于发送的磁场的窗口（窗口），以及设置在所述窗口中，还有一个珀耳帖元件。

4. 发明公开

KR1020140021788A 프로젝션 장치 无效
标题翻译：投影设备
公开(公告)号：KR1020140021788A
公开(公告)日：2014-02-20
申请号：KR1020120087907
申请日：2012-08-10
申请人： 삼성전자주식회사
发明人： 임재근 , 김학영 , 박준석 , 허진
IPC分类号： G03B21/14 , G03B21/56
CPC分类号： G03B21/56 , G03B21/10 , G03B21/60
摘要： A projection device mounts an image projection unit and a screen unit in one mounting unit. The screen unit comprises; a screen; and a screen attachment unit in which the screen is attached. The screen attachment unit comprises; a front plate in which the screen is attached; a back plate arranged on the back side of the front plate; and a strength reinforcement member which is arranged between the front and back plates.
摘要翻译：投影装置将图像投影单元和屏幕单元安装在一个安装单元中。屏幕单元包括：屏幕; 以及其中安装有屏幕的屏幕附接单元。屏幕附接单元包括：安装屏幕的前板; 布置在前板背面的背板; 以及布置在前板和后板之间的强度加强构件。

5. 发明公开

KR1020080018054A 조리개 유닛 및 이를 갖는 영상투사장치와 디스플레이장치 无效
标题翻译： IRIS单元和图像投影设备及其显示设备
公开(公告)号：KR1020080018054A
公开(公告)日：2008-02-27
申请号：KR1020060080130
申请日：2006-08-23
申请人： 삼성전자주식회사
发明人： 김학영 , 송기범 , 강병조
IPC分类号： H04N5/74
CPC分类号： G03B9/02 , G03B7/00
摘要： An iris unit, an image projection device having the same, and a display unit are provided to simplify the structure, not generate noise, obtain a fast response speed, and reduce the costs by simplifying an assembling process. A main disk body(145) is housed in a mirror unit and includes a main opening(147) formed on an optical path. A shutter member is rotatably combined with the main disk body(145) to open and close the main opening(147). A driving unit(150) rotates the shutter member by generating electromagnetic force. The driving unit(150) includes the first coil(151) combined at one side of the shutter member and has current flowing therethrough by an applied power, and the first main magnet(155) combined to the main disk body(145) along a rotating direction of the first coil(151). The first bracket(161) is prepared at one side of the main opening(147) and rotatably supports the shutter member with respect to the main disk body(145). The second bracket(165) is prepared at the other side of the main opening(147) and combined to the main disk body(145) to guide rotating of the first coil(151).
摘要翻译：为了简化结构，不产生噪音，获得快速的响应速度，简化了组装过程，提供了具有该光圈单元的图像投影装置和显示单元以及显示单元。主盘体（145）容纳在镜单元中，并且包括形成在光路上的主开口（147）。活门构件与主盘体（145）可旋转地组合以打开和关闭主开口（147）。驱动单元（150）通过产生电磁力使活门构件旋转。驱动单元（150）包括在活门构件的一侧上组合的第一线圈（151），并且通过施加的动力使电流流过其中，并且第一主磁体（155）沿着主体盘体第一线圈（151）的旋转方向。第一支架（161）准备在主开口（147）的一侧，并相对于主盘体（145）可旋转地支撑活门构件。第二支架（165）在主开口（147）的另一侧准备并组合到主盘体（145）上以引导第一线圈（151）的旋转。

6. 发明公开

KR1020040029529A 화학 기상 증착 장비의 웨이퍼 척 어셈블리 无效
标题翻译：化学气相沉积装置组装
公开(公告)号：KR1020040029529A
公开(公告)日：2004-04-08
申请号：KR1020020059828
申请日：2002-10-01
申请人： 삼성전자주식회사
发明人： 김학영
IPC分类号： H01L21/68
摘要： PURPOSE: A wafer chuck assembly of CVD equipment is provided to load stably a wafer on a chuck by preventing a falling effect of the wafer into the chuck due to the mis-alignment of a flat zone of the wafer. CONSTITUTION: A wafer chuck assembly of CVD equipment includes a chuck(200) and a plurality of chuck pins(300). A wafer(100) induced into a chamber for performing a chemical vapor deposition reaction is loaded on the chuck(200). The chuck pins(300) are projected to an upper portion of the chuck(200) in order to guide the wafer on an upper surface of the chuck(200). The chuck pins(300) are spread from a peripheral part of an opposite edge to a flat zone of the wafer(100) to a side part of the wafer(100).
摘要翻译：目的：提供CVD设备的晶片卡盘组件，以通过防止由于晶片的平坦区域的错位而使晶片向卡盘中的下落效应而将晶片稳定地装载在卡盘上。构成：CVD设备的晶片卡盘组件包括卡盘（200）和多个卡盘销（300）。诱导到用于进行化学气相沉积反应的室中的晶片（100）被装载在卡盘（200）上。卡盘销（300）突出到卡盘（200）的上部，以将晶片引导到卡盘（200）的上表面上。卡盘销（300）从相对边缘的周边部分延伸到晶片（100）的平坦区域到晶片（100）的侧部。

7. 发明公开

KR1020030003600A 반도체 장치의 제조를 위한 펌프 시스템 无效
标题翻译：用于制造半导体器件的泵系统
公开(公告)号：KR1020030003600A
公开(公告)日：2003-01-10
申请号：KR1020010039524
申请日：2001-07-03
申请人： 삼성전자주식회사
发明人： 김학영
IPC分类号： H01L21/02
摘要： PURPOSE: A pump system for fabricating a semiconductor device is provided to prevent the inflow of byproducts stacked in the inside of an exhaust line into a pump in a consolidation process of the exhaust line. CONSTITUTION: A turbo molecular pump(140) and a dry pump(150) are connected with a process chamber(110). A throttle valve(160) and the first high vacuum valve(170) are installed on a vacuum line for connecting the process chamber(110) with the turbo molecular pump(140). The throttle valve(160) is used for controlling an opening state or a closing state of the vacuum line to maintain a degree of vacuum. A fore-line valve(180) is installed at a connecting line for connecting the turbo molecular pump(140) with the dry pump(150). An exhaust line(190) is used for exhausting the remaining gases from the inside of the supply line(120). The first air valve(200) is installed on the supply line(120). The second air valve(210) is installed on the exhaust line(190). The second high vacuum valve(220) is installed at the supply line(120) adjacent to the dry pump(150).
摘要翻译：目的：提供一种用于制造半导体器件的泵系统，以防止在排气管线的固结过程中将堆放在排气管内部的副产物流入泵中。构成：涡轮分子泵（140）和干式泵（150）与处理室（110）连接。节气门（160）和第一高真空阀（170）安装在用于将处理室（110）与涡轮分子泵（140）连接的真空管线上。节流阀（160）用于控制真空管线的打开状态或关闭状态以保持真空度。前轮阀（180）安装在连接涡轮分子泵（140）与干式泵（150）的连接管线处。排气管线（190）用于从供应管线（120）的内部排出剩余的气体。第一空气阀（200）安装在供应管线（120）上。第二空气阀（210）安装在排气管（190）上。第二高真空阀（220）安装在与干式泵（150）相邻的供应管线（120）处。

8. 发明公开

KR1020140107008A 디스플레이 장치 审中-实审
标题翻译：显示设备
公开(公告)号：KR1020140107008A
公开(公告)日：2014-09-04
申请号：KR1020130021459
申请日：2013-02-27
申请人： 삼성전자주식회사
发明人： 김고현 , 김학영
IPC分类号： H04N5/64 , H04N21/4227
CPC分类号： G06F3/005 , G06F3/017 , G06F3/0304
摘要： A display apparatus according to one embodiment of the present invention provides a user interaction, and includes: a display body which includes an image display surface; and a photographing unit which includes a camera module to photograph a user to sense the gesture of the user, wherein the photographing unit is arranged in a first location received in the display body during a non-photographing process, and is arranged in a second location protruding outside the display body during a photographing process. The camera module is closer to the image display surface when the photographing unit is located in the first location in comparison with the second location.
摘要翻译：根据本发明的一个实施例的显示装置提供用户交互，并且包括：显示体，包括图像显示面; 以及拍摄单元，其包括照相机模块，用于拍摄用户以感测用户的手势，其中拍摄单元被布置在非拍摄过程期间在显示体中接收的第一位置，并且布置在第二位置在拍摄过程中突出到显示体外部。与第二位置相比，当摄影单元位于第一位置时，相机模块更靠近图像显示表面。

9. 发明公开

KR1020140061803A 프로젝션 장치 审中-实审
标题翻译：投影设备
公开(公告)号：KR1020140061803A
公开(公告)日：2014-05-22
申请号：KR1020120128881
申请日：2012-11-14
申请人： 삼성전자주식회사
发明人： 김학영 , 박준석 , 김성태 , 노정호 , 허진
IPC分类号： G03B21/14 , G03B21/56
CPC分类号： G03B21/10 , G03B21/28 , G03B21/56
摘要： A projection apparatus according to an embodiment of the present invention is configured to comprise: an image projection unit to enlarge and project by forming an image; a screen unit for displaying the image projected from the image projection unit; and a mounting unit on which the image projection unit and the screen unit are mounted in an integrated manner, wherein the screen unit is configured to include a radius of curvature.
摘要翻译：根据本发明的实施例的投影装置被配置为包括：图像投影单元，其通过形成图像来放大和投影; 屏幕单元，用于显示从图像投影单元投影的图像; 以及安装单元，其中图像投影单元和屏幕单元以集成的方式安装在该安装单元上，其中屏幕单元被配置为包括曲率半径。

10. 发明公开

KR1020060131239A 웨이퍼 히터 블럭 및 이를 포함하는 반도체 제조 장치 无效
标题翻译：用于制造包括其的半导体的加热器块和装置
公开(公告)号：KR1020060131239A
公开(公告)日：2006-12-20
申请号：KR1020050051519
申请日：2005-06-15
申请人： 삼성전자주식회사
发明人： 김학영
IPC分类号： H01L21/205
CPC分类号： C23C16/4586 , H01L21/67103
摘要： A wafer heater and a semiconductor manufacturing apparatus with the same are provided to improve the productivity and to enhance working efficiency by preventing the generation of defects due to a guide pin using a guide groove with a slide instead of the guide pin. A wafer heater block(100) includes a heater for a wafer. The wafer heater block further includes a heater block body and a plurality of lift pins. The heater block body(120) includes a guide groove at an upper portion and a plurality of through holes. The plurality of lift pins(140) are capable of moving up and down in the through holes. The guide groove has a tilted side.
摘要翻译：提供了一种晶片加热器和具有该晶片加热器的半导体制造装置，以通过使用具有滑动件的引导槽而不是引导销来防止由于引导销而产生缺陷而提高生产率和提高工作效率。晶片加热器块（100）包括用于晶片的加热器。晶片加热器块还包括加热器块体和多个提升销。加热块体（120）包括在上部的引导槽和多个通孔。多个提升销（140）能够在通孔中上下移动。引导槽具有倾斜侧。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式