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    • 10. 发明专利
    • Gas purification system
    • 空值
    • JP4457603B2
    • 2010-04-28
    • JP2003288395
    • 2003-08-07
    • 三菱電機株式会社
    • 正人 倉橋幸治 太田康隆 稲永昌樹 葛本泰宏 谷村
    • A61L9/16A61L9/01A61L9/20A62D3/10A62D3/176A62D3/19A62D3/30A62D101/28B01J19/08F24F7/00F24F7/06
    • PROBLEM TO BE SOLVED: To provide a gas cleaning method and a gas cleaning apparatus at low costs and easy in maintenance, which can decompose and remove chemical substances with high efficiency. SOLUTION: Under the atmosphere, after particulate matters are removed from the gas 8 which contains the particulate matters and the chemical substances, the chemical substances are collected by an adsorbent 3. While the moisture in the gas is collected, the adsorbent 3 which collected the chemical substances is maintained as zero electric potential, and the electric discharge is conducted between the adsorbent and an electrode. By the active species produced on the surface of the adsorbent by the electric discharge, or by the active species produced by the reaction between the irradiated active species and the moisture existing in the atmosphere or on the surface of the adsorbent 3, the chemical substances adsorbed on the adsorbent are decomposed and removed. COPYRIGHT: (C)2004,JPO
    • 要解决的问题:提供一种低成本且易于维护的气体清洁方法和气体清洁装置,其可以高效率地分解和去除化学物质。 解决方案:在大气中,在从含有颗粒物质和化学物质的气体8中除去颗粒物质之后,化学物质被吸附剂3收集。当收集气体中的水分时,吸附剂3 收集的化学物质维持为零电位,并且在吸附剂和电极之间进行放电。 通过放电在吸附剂表面产生的活性物质,或通过被照射的活性物质与存在于大气中或吸附剂3表面的水分反应产生的活性物质,吸附的化学物质 在吸附剂上分解除去。 版权所有(C)2004,JPO