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    • 8. 发明专利
    • Exposure equipment and exposure method
    • 曝光设备和曝光方法
    • JP2014010451A
    • 2014-01-20
    • JP2013125992
    • 2013-06-14
    • Samsung Electro-Mechanics Co Ltdサムソン エレクトロ−メカニックス カンパニーリミテッド.
    • LEE CHANG BOCHOI CHEOL HORYU CHANG SUP
    • G03F9/00G01B11/00H01L21/027
    • PROBLEM TO BE SOLVED: To provide exposure equipment and an exposure method capable of high reliability arrangement between a substrate and a mask.SOLUTION: The exposure equipment comprises: an input part 110 of acquiring image data to the arrangement mark of a substrate; a design data storage part 150 stored with design data to the exposure position of the substrate; a coordinate data generation part 120 of generating coordinate data equivalent to the position of the arrangement mark using the image data acquired by the input part 110; a virtual division part 130 of forming the virtual region of the substrate using the coordinate data of the coordinate data generation part 120 and dividing the virtual region with a diagonal line to form respective divided virtual regions; a linear correction part 140 of performing linear correction to the virtual regions respectively divided by the virtual division part to generate linear data; an exposure data generation part 160 of generating exposure data as exposure position change value using the linear data of the linear correction part 140 and the design part of the storage part 150; and an exposure part 170 of performing exposure using the design data and the exposure data.
    • 要解决的问题:提供能够在基板和掩模之间具有高可靠性布置的曝光设备和曝光方法。解决方案:曝光设备包括:将图像数据采集到基板的布置标记的输入部分110; 将设计数据存储到基板的曝光位置的设计数据存储部分150; 使用由输入部110获取的图像数据生成与布置标记的位置相当的坐标数据的坐标数据生成部120; 使用坐标数据生成部120的坐标数据形成基板的虚拟区域并用对角线分割虚拟区域的虚拟分割部130,形成分割的虚拟区域; 对由虚拟分割部分分割的虚拟区域进行线性校正的线性校正部140,生成线性数据; 使用线性校正部140的线性数据和存储部150的设计部分,生成曝光数据作为曝光位置变化值的曝光数据生成部160; 以及使用设计数据和曝光数据进行曝光的曝光部170。