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1. 发明申请

WO2010006279A3 CHAMBER COMPONENTS FOR CVD APPLICATIONS 审中-公开
标题翻译：用于CVD应用的CHAMBER组件
公开(公告)号：WO2010006279A3
公开(公告)日：2010-04-22
申请号：PCT/US2009050282
申请日：2009-07-10
申请人： APPLIED MATERIALS INC , HINCKLEY KIMBERLY , ZHANG YIZHEN , HERNANDEZ MANUEL , BANG WON , LUBOMIRSKY DMITRY
发明人： HINCKLEY KIMBERLY , ZHANG YIZHEN , HERNANDEZ MANUEL , BANG WON , LUBOMIRSKY DMITRY
IPC分类号： H01L21/205 , H01L21/00
CPC分类号： C23C16/452 , C23C16/4481 , C23C16/45512 , C23C16/45591
摘要： Apparatus for use with a processing chamber are provided. In one aspect a blocker plate is provided including an annular plate having an inner portion of a first thickness and the annular plate having an aperture pattern including a center portion, a first patterned portion concentrically disposed around the center portion and comprising a first plurality of apertures having a first number of apertures, an second patterned portion concentrically disposed around the first patterned portion and comprising a second plurality of apertures having a second number of apertures greater than the first number of apertures, a perimeter portion concentrically disposed around the second patterned portion, and an outer portion comprising a raised concentric portion disposed on a perimeter of the annular plate. In another aspect, a second, third, and fourth blocker plates are provided. Additionally, a mixing apparatus and a liquid evaporating apparatus for use in a processing chamber are provided.
摘要翻译：提供了一种用于处理室的设备。在一个方面，提供了阻挡板，其包括具有第一厚度的内部部分的环形板，并且环形板具有包括中心部分的孔图案，第一图案部分围绕中心部分同心地设置，并且包括第一多个孔具有第一数量的孔，第二图案部分同心地设置在第一图案化部分周围，并且包括第二多个孔，其具有大于第一数量孔的第二数量的孔，围绕第二图案化部分同心设置的周边部分，以及包括设置在所述环形板的周边上的升高的同心部分的外部部分。另一方面，提供第二，第三和第四阻滞板。此外，提供了一种用于处理室的混合装置和液体蒸发装置。

2. 发明申请

WO2010006279A2 CHAMBER COMPONENTS FOR CVD APPLICATIONS 审中-公开
标题翻译：用于CVD应用的腔室组件
公开(公告)号：WO2010006279A2
公开(公告)日：2010-01-14
申请号：PCT/US2009/050282
申请日：2009-07-10
申请人： APPLIED MATERIALS, INC. , HINCKLEY, Kimberly , ZHANG, Yizhen , HERNANDEZ, Manuel , BANG, Won , LUBOMIRSKY, Dmitry
发明人： HINCKLEY, Kimberly , ZHANG, Yizhen , HERNANDEZ, Manuel , BANG, Won , LUBOMIRSKY, Dmitry
IPC分类号： H01L21/205 , H01L21/00
CPC分类号： C23C16/452 , C23C16/4481 , C23C16/45512 , C23C16/45591
摘要： Apparatus for use with a processing chamber are provided. In one aspect a blocker plate is provided including an annular plate having an inner portion of a first thickness and the annular plate having an aperture pattern including a center portion, a first patterned portion concentrically disposed around the center portion and comprising a first plurality of apertures having a first number of apertures, an second patterned portion concentrically disposed around the first patterned portion and comprising a second plurality of apertures having a second number of apertures greater than the first number of apertures, a perimeter portion concentrically disposed around the second patterned portion, and an outer portion comprising a raised concentric portion disposed on a perimeter of the annular plate. In another aspect, a second, third, and fourth blocker plates are provided. Additionally, a mixing apparatus and a liquid evaporating apparatus for use in a processing chamber are provided.
摘要翻译：提供了与处理室一起使用的设备。在一个方面中，提供一种阻挡板，其包括具有第一厚度的内部的环形板，并且环形板具有包括中心部分的孔图案，第一图案部分同心地围绕中心部分设置并且包括第一多个孔具有第一数量的孔，同心地设置在第一图案部分周围的第二图案部分，以及包括具有比第一数量的孔大的第二数量的孔的第二多个孔，围绕第二图案部分同心布置的周边部分，以及外部部分，其包括设置在环形板的周边上的凸起同心部分。另一方面，提供了第二，第三和第四阻挡板。另外，还提供了用于处理室的混合装置和液体蒸发装置。

3. 发明申请

WO2011143012A2 HEATER WITH INDEPENDENT CENTER ZONE CONTROL 审中-公开
标题翻译：加热器具有独立的中心区域控制
公开(公告)号：WO2011143012A2
公开(公告)日：2011-11-17
申请号：PCT/US2011035014
申请日：2011-05-03
申请人： APPLIED MATERIALS INC , LUBOMIRSKY DMITRY , GONDHALEKAR SUDHIR R , VENKATARAMAN SHANKAR , FLOYD KIRBY H , ZHANG YIZHEN
发明人： LUBOMIRSKY DMITRY , GONDHALEKAR SUDHIR R , VENKATARAMAN SHANKAR , FLOYD KIRBY H , ZHANG YIZHEN
IPC分类号： H01L21/02 , H01L21/683
CPC分类号： H01L21/67103 , H01L21/68792
摘要： A substrate heater comprising a ceramic substrate support having a substantially flat upper surface for supporting a substrate during substrate processing; a resistive heater embedded within the substrate support; a heater shaft coupled to a back surface of the substrate support, the heater having an interior cavity that extends along its longitudinal axis and ends at a bottom central surface of the substrate support; and a supplemental heater, separate from the ceramic substrate support, positioned within the interior cavity of the heater shaft in thermal contact with a portion of the bottom central surface of the substrate support such that the supplemental heater can alter the temperature of a central area of the upper surface of the substrate support.
摘要翻译：一种衬底加热器，包括陶瓷衬底支撑件，其具有在衬底处理期间用于支撑衬底的基本平坦的上表面; 嵌入在所述衬底支架内的电阻加热器; 加热器轴，其耦合到所述基板支撑件的后表面，所述加热器具有沿着其纵向轴线延伸并且在所述基板支撑件的底部中心表面处终止的内部空腔; 以及与陶瓷基板支撑件分开的补充加热器，其位于加热器轴的内部空腔内，与基板支撑件的底部中心表面的一部分热接触，使得补充加热器可以改变加热器轴的中心区域的温度衬底的上表面支撑。

4. 发明申请

WO2011143012A3 HEATER WITH INDEPENDENT CENTER ZONE CONTROL 审中-公开
公开(公告)号：WO2011143012A3
公开(公告)日：2011-11-17
申请号：PCT/US2011/035014
申请日：2011-05-03
申请人： APPLIED MATERIALS, INC. , LUBOMIRSKY, Dmitry , GONDHALEKAR, Sudhir, R. , VENKATARAMAN, Shankar , FLOYD, Kirby, H. , ZHANG, Yizhen
发明人： LUBOMIRSKY, Dmitry , GONDHALEKAR, Sudhir, R. , VENKATARAMAN, Shankar , FLOYD, Kirby, H. , ZHANG, Yizhen
IPC分类号： H01L21/02 , H01L21/683
摘要： A substrate heater comprising a ceramic substrate support having a substantially flat upper surface for supporting a substrate during substrate processing; a resistive heater embedded within the substrate support; a heater shaft coupled to a back surface of the substrate support, the heater having an interior cavity that extends along its longitudinal axis and ends at a bottom central surface of the substrate support; and a supplemental heater, separate from the ceramic substrate support, positioned within the interior cavity of the heater shaft in thermal contact with a portion of the bottom central surface of the substrate support such that the supplemental heater can alter the temperature of a central area of the upper surface of the substrate support.

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