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    • 1. 发明申请
    • CHAMBER COMPONENTS FOR CVD APPLICATIONS
    • 用于CVD应用的CHAMBER组件
    • WO2010006279A3
    • 2010-04-22
    • PCT/US2009050282
    • 2009-07-10
    • APPLIED MATERIALS INCHINCKLEY KIMBERLYZHANG YIZHENHERNANDEZ MANUELBANG WONLUBOMIRSKY DMITRY
    • HINCKLEY KIMBERLYZHANG YIZHENHERNANDEZ MANUELBANG WONLUBOMIRSKY DMITRY
    • H01L21/205H01L21/00
    • C23C16/452C23C16/4481C23C16/45512C23C16/45591
    • Apparatus for use with a processing chamber are provided. In one aspect a blocker plate is provided including an annular plate having an inner portion of a first thickness and the annular plate having an aperture pattern including a center portion, a first patterned portion concentrically disposed around the center portion and comprising a first plurality of apertures having a first number of apertures, an second patterned portion concentrically disposed around the first patterned portion and comprising a second plurality of apertures having a second number of apertures greater than the first number of apertures, a perimeter portion concentrically disposed around the second patterned portion, and an outer portion comprising a raised concentric portion disposed on a perimeter of the annular plate. In another aspect, a second, third, and fourth blocker plates are provided. Additionally, a mixing apparatus and a liquid evaporating apparatus for use in a processing chamber are provided.
    • 提供了一种用于处理室的设备。 在一个方面,提供了阻挡板,其包括具有第一厚度的内部部分的环形板,并且环形板具有包括中心部分的孔图案,第一图案部分围绕中心部分同心地设置,并且包括第一多个孔 具有第一数量的孔,第二图案部分同心地设置在第一图案化部分周围,并且包括第二多个孔,其具有大于第一数量孔的第二数量的孔,围绕第二图案化部分同心设置的周边部分, 以及包括设置在所述环形板的周边上的升高的同心部分的外部部分。 另一方面,提供第二,第三和第四阻滞板。 此外,提供了一种用于处理室的混合装置和液体蒸发装置。
    • 2. 发明申请
    • CHAMBER COMPONENTS FOR CVD APPLICATIONS
    • 用于CVD应用的腔室组件
    • WO2010006279A2
    • 2010-01-14
    • PCT/US2009/050282
    • 2009-07-10
    • APPLIED MATERIALS, INC.HINCKLEY, KimberlyZHANG, YizhenHERNANDEZ, ManuelBANG, WonLUBOMIRSKY, Dmitry
    • HINCKLEY, KimberlyZHANG, YizhenHERNANDEZ, ManuelBANG, WonLUBOMIRSKY, Dmitry
    • H01L21/205H01L21/00
    • C23C16/452C23C16/4481C23C16/45512C23C16/45591
    • Apparatus for use with a processing chamber are provided. In one aspect a blocker plate is provided including an annular plate having an inner portion of a first thickness and the annular plate having an aperture pattern including a center portion, a first patterned portion concentrically disposed around the center portion and comprising a first plurality of apertures having a first number of apertures, an second patterned portion concentrically disposed around the first patterned portion and comprising a second plurality of apertures having a second number of apertures greater than the first number of apertures, a perimeter portion concentrically disposed around the second patterned portion, and an outer portion comprising a raised concentric portion disposed on a perimeter of the annular plate. In another aspect, a second, third, and fourth blocker plates are provided. Additionally, a mixing apparatus and a liquid evaporating apparatus for use in a processing chamber are provided.
    • 提供了与处理室一起使用的设备。 在一个方面中,提供一种阻挡板,其包括具有第一厚度的内部的环形板,并且环形板具有包括中心部分的孔图案,第一图案部分同心地围绕中心部分设置并且包括第一多个孔 具有第一数量的孔,同心地设置在第一图案部分周围的第二图案部分,以及包括具有比第一数量的孔大的第二数量的孔的第二多个孔,围绕第二图案部分同心布置的周边部分, 以及外部部分,其包括设置在环形板的周边上的凸起同心部分。 另一方面,提供了第二,第三和第四阻挡板。 另外,还提供了用于处理室的混合装置和液体蒸发装置。