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1. 发明申请

WO2012094421A3 METHODS AND SYSTEMS FOR IMPROVED LOCALIZED FEATURE QUANTIFICATION IN SURFACE METROLOGY TOOLS 审中-公开
标题翻译：用于改进表面计量学工具中局部化特征量化的方法和系统
公开(公告)号：WO2012094421A3
公开(公告)日：2012-10-26
申请号：PCT/US2012020225
申请日：2012-01-04
申请人： KLA TENCOR CORP , CHEN HAIGUANG , SINHA JAYDEEP , TANG SHUOHONG , HAGER JOHN , ZENG ANDREW , KAMENSKY SERGEY
发明人： CHEN HAIGUANG , SINHA JAYDEEP , TANG SHUOHONG , HAGER JOHN , ZENG ANDREW , KAMENSKY SERGEY
IPC分类号： H01L21/66
CPC分类号： G06T5/002 , G06T5/20 , G06T7/0004 , G06T2207/30148
摘要： A method for enabling more accurate measurements of localized features on wafers is disclosed. The method includes: a) performing high order surface fitting to more effectively remove the low frequency shape components and also to reduce possible signal attenuations commonly observed from filtering; b) constructing and applying a proper two dimensional LFM window to the residual image from the surface fitting processing stage to effectively reduce the residual artifacts at the region boundaries; c) calculating the metrics of the region using the artifact-reduced image to obtain more accurate and reliable measurements; and d) using site-based metrics obtained from front and back surface data to quantify the features of interest. A method for filtering data from measurements of localized features on wafers is disclosed. This method includes an algorithm designed to adjust the filtering behavior according to the statistics of extreme data samples. A method for utilizing the 2D window and the data filtering to yield a more robust and more accurate Localized Feature quantification methodology is disclosed.
摘要翻译：公开了一种用于实现对晶片上的局部化特征的更准确测量的方法。该方法包括：a）执行高阶表面拟合以更有效地去除低频形状分量并且还减少通常从滤波观察到的可能的信号衰减; b）对来自表面拟合处理阶段的残差图像构建和应用适当的二维LFM窗口，以有效减少区域边界处的残留伪影; c）使用伪像减少的图像计算区域的度量以获得更准确和可靠的测量; 和d）使用从正面和背面数据获得的基于场地的度量来量化感兴趣的特征。公开了一种用于从晶片上的局部特征的测量中过滤数据的方法。该方法包括一个算法，设计用于根据极端数据样本的统计数据调整过滤行为。公开了一种用于利用2D窗口和数据过滤来产生更健壮和更准确的局部特征量化方法的方法。

2. 发明申请

WO2012094421A2 METHODS AND SYSTEMS FOR IMPROVED LOCALIZED FEATURE QUANTIFICATION IN SURFACE METROLOGY TOOLS 审中-公开
标题翻译：用于改进表面计量工具中的本地化特征量化的方法和系统
公开(公告)号：WO2012094421A2
公开(公告)日：2012-07-12
申请号：PCT/US2012/020225
申请日：2012-01-04
申请人： KLA-TENCOR CORPORATION , CHEN, Haiguang , SINHA, Jaydeep , TANG, Shuohong , HAGER, John , ZENG, Andrew , KAMENSKY, Sergey
发明人： CHEN, Haiguang , SINHA, Jaydeep , TANG, Shuohong , HAGER, John , ZENG, Andrew , KAMENSKY, Sergey
IPC分类号： H01L21/66
CPC分类号： G06T5/002 , G06T5/20 , G06T7/0004 , G06T2207/30148
摘要： A method for enabling more accurate measurements of localized features on wafers is disclosed. The method includes: a) performing high order surface fitting to more effectively remove the low frequency shape components and also to reduce possible signal attenuations commonly observed from filtering; b) constructing and applying a proper two dimensional LFM window to the residual image from the surface fitting processing stage to effectively reduce the residual artifacts at the region boundaries; c) calculating the metrics of the region using the artifact-reduced image to obtain more accurate and reliable measurements; and d) using site-based metrics obtained from front and back surface data to quantify the features of interest. A method for filtering data from measurements of localized features on wafers is disclosed. This method includes an algorithm designed to adjust the filtering behavior according to the statistics of extreme data samples. A method for utilizing the 2D window and the data filtering to yield a more robust and more accurate Localized Feature quantification methodology is disclosed.
摘要翻译：公开了一种能够更精确地测量晶片上局部特征的方法。该方法包括：a）执行高阶表面拟合以更有效地去除低频形状分量，并且还可以减少通常从滤波观察到的可能的信号衰减; b）从表面拟合处理阶段构造和应用适当的二维LFM窗口到残余图像，以有效地减少区域边界处的残余伪像; c）使用伪影图像计算该区域的度量以获得更准确和可靠的测量; 以及d）使用从前面和背面数据获得的基于站点的度量来量化感兴趣的特征。公开了一种用于从晶片上的局部特征的测量中滤出数据的方法。该方法包括根据极端数据样本统计来调整过滤行为的算法。公开了一种利用2D窗口和数据过滤产生更强大和更准确的局部特征量化方法的方法。

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