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    • 5. 发明授权
    • Exposure apparatus, exposure method, and device manufacturing method
    • 曝光装置,曝光方法和装置制造方法
    • US07365828B2
    • 2008-04-29
    • US11215021
    • 2005-08-31
    • Yuichi Takamura
    • Yuichi Takamura
    • G03B27/42G03B27/52
    • G03F7/70341
    • An exposure apparatus which exposes a pattern of an original onto a substrate through a projection optical system with a space between the projection optical system and the substrate filled with liquid. The apparatus includes a liquid supply nozzle configured to supply the liquid to the space through a liquid supply opening, a liquid supply unit configured to supply the liquid into the liquid supply nozzle, a liquid recovery unit configured to recover the liquid in the liquid supply nozzle by using a vacuum source, and a gas supply unit configured to supply a gas into the liquid supply nozzle through a pipe connected to the liquid supply opening of the liquid supply nozzle. A gas supply by the gas supply unit is started and a liquid recovery by the liquid recovery unit is started while a liquid supply by the liquid supply unit is stopped.
    • 一种曝光装置,其通过投影光学系统将原稿的图案曝光到基板上,在投影光学系统和填充有液体的基板之间具有空间。 该装置包括:液体供给喷嘴,其构造成通过液体供给口将液体供给到该空间;液体供给单元,其构造成将液体供给到液体供给喷嘴;液体回收单元,其构造成回收液体供给喷嘴 通过使用真空源,以及气体供给单元,被配置为通过与液体供给喷嘴的液体供给口连接的管道将气体供给到液体供给喷嘴。 开始由气体供给单元供给的气体,并且通过液体供给单元的液体供给停止而开始液体回收单元的液体回收。
    • 7. 发明申请
    • Device manufacturing apparatus and method of controlling same
    • 装置制造装置及其控制方法
    • US20060207680A1
    • 2006-09-21
    • US11376240
    • 2006-03-16
    • Yuichi Takamura
    • Yuichi Takamura
    • B65B1/04
    • H01L21/67201
    • An apparatus for processing an article in order to manufacture a device includes a process chamber in which the article is processed; a relay chamber; a first load-lock chamber disposed between an outside of the apparatus and the relay chamber; a second load-lock chamber disposed between the relay chamber and the process chamber; a first adjusting mechanism configured to adjust atmosphere in the process chamber to a first atmosphere; and a second adjusting mechanism configured to adjust atmosphere in the relay chamber to a second atmosphere that is an intermediate atmosphere between the first atmosphere and atmosphere of the outside.
    • 一种用于处理制品以便制造装置的装置包括:处理室,其中处理物品; 中继室; 设置在所述装置的外部和所述中继室之间的第一装载锁定室; 设置在所述中继室和所述处理室之间的第二加载锁定室; 第一调节机构,被配置为将处理室中的气氛调节到第一气氛; 以及第二调节机构,被配置为将所述中继室中的气氛调节到作为所述第一大气和所述外部气氛之间的中间气氛的第二气氛。