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    • 4. 发明申请
    • SYSTEM FOR MANUFACTURING LINEAR GEAR AND THE METHOD THEREOF
    • 制造线性齿轮的系统及其方法
    • US20090158804A1
    • 2009-06-25
    • US12302310
    • 2007-06-07
    • Hee-Won JungYoung-June ParkGil-Yong YeomDong-Sam KimJung-Su Lee
    • Hee-Won JungYoung-June ParkGil-Yong YeomDong-Sam KimJung-Su Lee
    • B21D37/16B21K1/30
    • B21K1/767B21H5/00Y10T29/49467
    • The present invention relates to a system for and a method of manufacturing a linear gear (rack gear), in which a forming roll and a guide roll are used to form gear teeth in a sequential manner so as not to require a high load, thereby enabling to easily manufacture the rack gear. A system for manufacturing a rack gear according to the invention includes a forming roll having a convexo-concave portion formed on a part of the surface contacting with a linear bar, a guide roll adapted to roll while facing the forming roll, and at least one support member for supporting the linear bar so as to allow the linear bar to linearly move. A method of manufacturing a rack gear according to the invention includes a first step of passing a linear bar through between a pair of rollers provided in front of a forming roll and a guide roll, a second step of charging the linear bar into a charging hole between the forming roll and the guide roll, a third step of rolling the forming roll and the guide roll to partly form teeth on the outer circumferential surface of the linear bar, and a fourth step of rolling the forming roll and the guide roll forward or backward to discharge the linear bar.
    • 本发明涉及一种用于制造线性齿轮(齿条)的系统和方法,其中使用成形辊和导辊以顺序方式形成齿轮齿以不需要高负载,从而 能够容易地制造齿条。 根据本发明的用于制造齿条的系统包括:成形辊,其具有形成在与直线杆接触的表面的一部分上的凸凹部,适于在面向成形辊的同时滚动的导辊;以及至少一个 用于支撑线性杆的支撑构件,以允许线性杆线性移动。 根据本发明的制造齿条的方法包括:使线性杆穿过设置在成形辊前面的一对辊和引导辊之间的第一步骤,将线性条装入充电孔的第二步骤 在成形辊和引导辊之间的第三步骤,使成形辊和引导辊滚动以在直线杆的外周面上部分地形成齿;以及第四步骤,将成形辊和引导辊向前滚动或 向后排出线性杆。
    • 8. 发明申请
    • Method for nitriding metal in salt bath and metal manufactured using the same
    • 盐浴中金属氮化和使用其制造的金属的方法
    • US20070193659A1
    • 2007-08-23
    • US11588370
    • 2006-10-27
    • Hee Won JungDong Nyung LeeYoung June ParkDong Sam KimKyu Hwan OhYinzhong Shen
    • Hee Won JungDong Nyung LeeYoung June ParkDong Sam KimKyu Hwan OhYinzhong Shen
    • C23C8/26
    • C23C8/50
    • Provided is a method for nitriding a metal in a salt bath by using a non-cyanide salt and a nitrided metal manufactured using the same. The method includes the steps of: immerging at least one salt selected from the group consisting of KNO3, KNO2, Ca(NO3)2, NaNO3 and NaNO2 into the salt bath; melting the salt by heating and maintaining the molten salt at a predetermined temperature; and submerging the metal in the salt bath. Nitriding in non-cyanide salts, such as potassium nitrate (KNO3), potassium nitrite (KNO2), sodium nitrate (NaNO3), sodium nitrite (NaNO2), calcium nitrate (Ca(NO3)2) and their mixtures, is capable of solving an environmental pollution problem and reducing a cost. Also, the method is capable of increasing nitrided depth of the metal two to six times compared to conventional nitriding methods. As a result, the method can be carried out in various application fields.
    • 提供了通过使用非氰化物盐和使用其制造的氮化金属在盐浴中氮化金属的方法。 该方法包括以下步骤:将至少一种选自KNO 3,KNO 2,Ca(NO 3 3)2的盐, 2 N 2,NaNO 3和NaNO 2进入盐浴; 通过加热和保持熔盐在预定温度来熔化盐; 并将金属浸入盐浴中。 在非氰化物盐如硝酸钾(KNO 3 N),亚硝酸钾(KNO 2),硝酸钠(NaNO 3)中氮化, ,亚硝酸钠(NaNO 2),硝酸钙(Ca(NO 3 3)2)及其混合物,能够解决环境污染 问题并降低成本。 此外,与常规氮化方法相比,该方法能够将金属的氮化深度提高两到六倍。 结果,该方法可以在各种应用领域中进行。
    • 9. 发明授权
    • Semiconductor device and method for fabricating the same
    • 半导体装置及其制造方法
    • US06303441B1
    • 2001-10-16
    • US09306915
    • 1999-05-07
    • Young June ParkJong Ho LeeHyeok Jae Lee
    • Young June ParkJong Ho LeeHyeok Jae Lee
    • H01L21336
    • H01L29/66613H01L21/84H01L27/1203H01L29/66772H01L29/78621H01L29/78696
    • A semiconductor device and a method for fabricating the same is disclosed, which minimizes device degradation, minimizes noises, and simplifies the fabrication process. The device includes a substrate having a first semiconductor layer, a buried insulating film, and a second semiconductor layer stacked; a field oxide film for separating the second semiconductor layer into a first region and a second region; a recess region formed in a particular region of the second region; gate insulating films and gate electrodes formed in stacks on each of a particular region in the first region and the recess region in the second region; first impurity regions formed in surfaces of the second semiconductor layer on both sides of the gate electrode in the first region; and second impurity regions formed in surfaces of the second semiconductor layer on both sides of the gate electrode in the recess region in the second region so that the second semiconductor layer below the gate electrode is fully depleted.
    • 公开了一种半导体器件及其制造方法,其使器件劣化最小化,使噪声最小化并简化制造工艺。 该器件包括具有第一半导体层,埋入绝缘膜和堆叠的第二半导体层的衬底; 用于将第二半导体层分离成第一区域和第二区域的场氧化物膜; 形成在所述第二区域的特定区域中的凹部区域; 在第一区域中的特定区域和第二区域中的凹陷区域中的每一个上堆叠形成栅极绝缘膜和栅电极; 在所述第一区域中的所述栅电极的两侧上形成在所述第二半导体层的表面中的第一杂质区; 以及在所述第二区域中的所述凹部区域中的所述栅电极的两侧上形成在所述第二半导体层的表面中的第二杂质区域,使得所述栅电极下方的所述第二半导体层完全耗尽。
    • 10. 发明授权
    • Reference potential adjustment device and a measuring device equipped with the same
    • 参考电位调节装置和配备有该电位的测量装置
    • US08917079B2
    • 2014-12-23
    • US13637789
    • 2011-02-16
    • Jin Hong AhnYoung June Park
    • Jin Hong AhnYoung June Park
    • G01R17/02G01R19/00B82Y15/00G01R1/28G01N27/414G01N27/48
    • B82Y15/00G01N27/4146G01N27/48G01R1/28G01R19/0084Y10S977/742
    • A reference potential adjusting apparatus is provided. The reference potential adjusting apparatus includes a reference potential measuring unit configured to measure a potential of a solution, a counter electrode disposed in the solution, and configured to change the potential of the solution through oxidation-reduction reactions with the solution, and a comparator configured to compare a measurement voltage provided by the reference voltage measuring unit to a reference voltage provided by a reference voltage supply unit, and to adjust reactions of the counter electrode with the solution according to the result of the comparison. The reference potential measuring unit includes a reference electrode, a common electrode disposed to be spaced apart from the reference electrode, and at least one nano structure contacting the reference electrode and the common electrode, and having electrical conductivity changing according to the potential of the solution.
    • 提供了一种参考电位调节装置。 参考电位调节装置包括:配置为测量溶液电位的参考电位测量单元,设置在溶液中的对电极,并且被配置为通过与溶液的氧化还原反应来改变溶液的电位,并且配置有比较器 将由参考电压测量单元提供的测量电压与由参考电压供应单元提供的参考电压进行比较,并根据比较结果调整对电极与溶液的反应。 参考电位测量单元包括参考电极,设置成与参考电极间隔开的公共电极以及与参考电极和公共电极接触的至少一个纳米结构,并根据溶液的电位而变化的电导率 。