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1. 发明授权

US06860945B2 Substrate coating unit and substrate coating method 失效
公开(公告)号：US06860945B2
公开(公告)日：2005-03-01
申请号：US10101707
申请日：2002-03-21
申请人： Shinji Kobayashi , Takahiro Kitano , Masateru Morikawa , Kazuhiro Takeshita , Yoshiyuki Kawafuchi
发明人： Shinji Kobayashi , Takahiro Kitano , Masateru Morikawa , Kazuhiro Takeshita , Yoshiyuki Kawafuchi
IPC分类号： H01L21/027 , H01L21/00 , B05B15/04 , B05B3/00 , B05C5/00
CPC分类号： H01L21/6715
摘要： The present invention is a coating unit for applying a coating solution to a substrate which includes: a discharge nozzle for reciprocating in a predetermined direction above the substrate and discharging the coating solution to the substrate; a holder for holding the substrate and horizontally movable in one direction perpendicular to the predetermined direction; and a cover for covering an upper face of the substrate when the substrate is moved in the one direction to be more forward than the discharge nozzle as viewed from a plane, wherein a lower face of the cover is inclined such as to be higher on the discharge nozzle side. According to the present invention, the cover covering the upper face of the substrate restrains a solvent from evaporating from the coating solution applied on the substrate to secure flatness of a coating film.

2. 发明申请

US20050109274A1 COATING FILM FORMING APPARATUS 失效
标题翻译：涂膜成型设备
公开(公告)号：US20050109274A1
公开(公告)日：2005-05-26
申请号：US10950411
申请日：2004-09-28
申请人： Takahiro Kitano , Norihisa Koga , Toshichika Takei , Yoshiyuki Kawafuchi
发明人： Takahiro Kitano , Norihisa Koga , Toshichika Takei , Yoshiyuki Kawafuchi
IPC分类号： H01L21/30 , B05B13/04 , B05C5/02 , B05C11/10 , H01L21/00 , B05B9/06 , B05C11/00
CPC分类号： H01L21/6715 , B05B13/041 , B05C5/0208 , B05C11/1013
摘要： A substrate is horizontally held by a substrate holding portion freely movable in the Y-direction, and a nozzle portion is provided above and opposing the substrate, and movable in X-direction corresponding to the coating liquid feeding region of the substrate. A discharge opening is formed at a lower end of the nozzle portion, and a channel connecting the discharge opening with a coating liquid feed tube coupled to an upper end of the nozzle portion is formed within the discharge opening. At the mid-stream of the channel, a liquid pool portion larger in diameter than the discharge opening is formed, the inside of which is provided with a filtering member formed by porous bodies blocking the channel. The filtering member forms a pressure loss portion, which absorbs pulsation occurring at the coating liquid feed tube before it reaches the discharge opening.
摘要翻译：基板由能够沿Y方向自由移动的基板保持部水平保持，并且在基板的上方并且与基板相对设置有喷嘴部，并且能够在与基板的涂布液供给区域对应的X方向上移动。在喷嘴部的下端形成有排出口，在喷出口内形成有将排出口与与喷嘴部的上端连结的涂液供给管连结的流路。在通道的中间部分，形成直径大于排出口的液体池部分，其内部设有由堵塞通道的多孔体形成的过滤构件。过滤构件形成压力损失部分，其在到达排出口之前吸收在涂液供给管处发生的脉动。

3. 发明授权

US06932868B2 Coating film forming apparatus 失效
标题翻译：涂膜成膜装置
公开(公告)号：US06932868B2
公开(公告)日：2005-08-23
申请号：US10950411
申请日：2004-09-28
申请人： Takahiro Kitano , Norihisa Koga , Toshichika Takei , Yoshiyuki Kawafuchi
发明人： Takahiro Kitano , Norihisa Koga , Toshichika Takei , Yoshiyuki Kawafuchi
IPC分类号： H01L21/30 , B05B13/04 , B05C5/02 , B05C11/10 , H01L21/00
CPC分类号： H01L21/6715 , B05B13/041 , B05C5/0208 , B05C11/1013
摘要： A substrate is horizontally held by a substrate holding portion freely movable in the Y-direction, and a nozzle portion is provided above and opposing the substrate, and movable in X-direction corresponding to the coating liquid feeding region of the substrate. A discharge opening is formed at a lower end of the nozzle portion, and a channel connecting the discharge opening with a coating liquid feed tube coupled to an upper end of the nozzle portion is formed within the discharge opening. At the mid-stream of the channel, a liquid pool portion larger in diameter than the discharge opening is formed, the inside of which is provided with a filtering member formed by porous bodies blocking the channel. The filtering member forms a pressure loss portion, which absorbs pulsation occurring at the coating liquid feed tube before it reaches the discharge opening.
摘要翻译：基板由能够沿Y方向自由移动的基板保持部水平保持，并且在基板的上方并且与基板相对设置有喷嘴部，并且能够在与基板的涂布液供给区域对应的X方向上移动。在喷嘴部的下端形成有排出口，在喷出口内形成有将排出口与与喷嘴部的上端连结的涂液供给管连结的流路。在通道的中间部分，形成直径大于排出口的液体池部分，其内部设置有由堵塞通道的多孔体形成的过滤构件。过滤构件形成压力损失部分，其在到达排出口之前吸收在涂液供给管处发生的脉动。

4. 发明申请

US20050100681A1 Substrate coating unit and substrate coating method 审中-公开
标题翻译：基材涂布单元和基材涂布方法
公开(公告)号：US20050100681A1
公开(公告)日：2005-05-12
申请号：US11013515
申请日：2004-12-17
申请人： Shinji Kobayashi , Takahiro Kitano , Masateru Morikawa , Kazuhiro Takeshita , Yoshiyuki Kawafuchi
发明人： Shinji Kobayashi , Takahiro Kitano , Masateru Morikawa , Kazuhiro Takeshita , Yoshiyuki Kawafuchi
IPC分类号： H01L21/027 , H01L21/00 , C23C28/00 , B05C5/00
CPC分类号： H01L21/6715
摘要： The present invention is a coating unit for applying a coating solution to a substrate which includes: a discharge nozzle for reciprocating in a predetermined direction above the substrate and discharging the coating solution to the substrate; a holder for holding the substrate and horizontally movable in one direction perpendicular to the predetermined direction; and a cover for covering an upper face of the substrate when the substrate is moved in the one direction to be more forward than the discharge nozzle as viewed from a plane, wherein a lower face of the cover is inclined such as to be higher on the discharge nozzle side. According to the present invention, the cover covering the upper face of the substrate restrains a solvent from evaporating from the coating solution applied on the substrate to secure flatness of a coating film.
摘要翻译：本发明是一种涂布单元，用于将涂布溶液涂布在基材上，该涂布单元包括：排出喷嘴，用于在基板上方沿预定方向往复运动并将涂布溶液排放到基板上; 用于保持基板并在垂直于预定方向的一个方向上可水平移动的保持器; 以及当从平面观察时，当基板沿着一个方向移动到比排出喷嘴更向前时，覆盖基板的上表面的盖，其中盖的下表面倾斜以在排出口侧。根据本发明，覆盖基板的上表面的盖子阻止溶剂从施加在基板上的涂布溶液蒸发，以确保涂膜的平坦度。

5. 发明授权

US06811613B2 Coating film forming apparatus 失效
标题翻译：涂膜成膜装置
公开(公告)号：US06811613B2
公开(公告)日：2004-11-02
申请号：US10298932
申请日：2002-11-19
申请人： Takahiro Kitano , Norihisa Koga , Toshichika Takei , Yoshiyuki Kawafuchi
发明人： Takahiro Kitano , Norihisa Koga , Toshichika Takei , Yoshiyuki Kawafuchi
IPC分类号： B05B1100
CPC分类号： H01L21/6715 , B05B13/041 , B05C5/0208 , B05C11/1013
摘要： A substrate is horizontally held by a substrate holding portion freely movable in the Y-direction, and a nozzle portion is provided above and opposing the substrate, and movable in X-direction corresponding to the coating liquid feeding region of the substrate. A discharge opening is formed at a lower end of the nozzle portion, and a channel connecting the discharge opening with a coating liquid feed tube coupled to an upper end of the nozzle portion is formed within the discharge opening. At the midstream of the channel, a liquid pool portion larger in diameter than the discharge opening is formed, the inside of which is provided with a filtering member formed by porous bodies blocking the channel. The filtering member forms a pressure loss portion, which absorbs pulsation occurring at the coating liquid feed tube before it reaches the discharge opening.
摘要翻译：基板由能够沿Y方向自由移动的基板保持部水平保持，并且在基板的上方并且与基板相对设置有喷嘴部，并且能够在与基板的涂布液供给区域对应的X方向上移动。在喷嘴部的下端形成有排出口，在喷出口内形成有将排出口与与喷嘴部的上端连结的涂液供给管连结的流路。在通道的中部，形成直径大于排出口的液体池部分，其内部设置有由堵塞通道的多孔体形成的过滤构件。过滤构件形成压力损失部分，其在到达排出口之前吸收在涂液供给管处发生的脉动。

6. 发明授权

US06761125B2 Coating film forming system 失效
标题翻译：涂膜成型系统
公开(公告)号：US06761125B2
公开(公告)日：2004-07-13
申请号：US10242711
申请日：2002-09-13
申请人： Takahiro Kitano , Yoshiyuki Kawafuchi , Norihisa Koga , Toshichika Takei
发明人： Takahiro Kitano , Yoshiyuki Kawafuchi , Norihisa Koga , Toshichika Takei
IPC分类号： B05B1504
CPC分类号： H01L21/6715
摘要： A system for supplying a chemical to a substrate to form a liquid film of the chemical on the substrate. The system includes a plate having a slit between a nozzle portion movable in lateral directions, and a substrate held by a substrate holding portion movable in longitudinal directions. Shock eliminating portions, provided at left and right ends of the slit, inhibit mist from being produced from a coating liquid supplied outside of the slit. A pair of shutters are capable of washing the coating liquid received by the surfaces of the shock eliminating portions. In the vicinity of the slit, a suction port is provided over a range corresponding to a movable region of the nozzle for sucking mist produced when the nozzle is scanned to carry out coating. The plate has a slit for dispersing a downward flow outside of the slit.
摘要翻译：一种用于向基板供应化学品以在基板上形成化学品的液膜的系统。该系统包括在横向可移动的喷嘴部分之间具有狭缝的板，以及由可在纵向方向上移动的基板保持部分保持的基板。设置在狭缝的左右两端的冲击消除部防止了从供给到狭缝外部的涂布液产生雾。一对百叶窗能够清洗由冲击消除部分的表面接收的涂布液。在狭缝附近，在与喷嘴的可动区域对应的范围内设置有吸入口，用于吸引喷嘴被扫描时产生的雾以进行涂布。该板具有用于在狭缝之外分散向下流动的狭缝。

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