专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

US20050012889A1 Liquid crystal display device and manufacturing method thereof 有权
标题翻译：液晶显示装置及其制造方法
公开(公告)号：US20050012889A1
公开(公告)日：2005-01-20
申请号：US10890250
申请日：2004-07-14
申请人： Akira Ishii , Yoshitaka Imabayashi
发明人： Akira Ishii , Yoshitaka Imabayashi
IPC分类号： G02F1/1339
CPC分类号： G02F1/13394
摘要： In a liquid crystal display device having a pair of substrates that are opposite to and bonded to each other, a liquid crystal layer is sealed between the pair of substrates, and columnar spacers are formed on one of the pair of substrates and in contact with the other substrate to maintain a gap between the pair of substrates. The surfaces of support columns of the columnar spacers are made to be rough to enhance the friction force between the pair of substrates and to prevent the other of the pair of substrates from diverging from the one of the pair of substrates, so that display quality of the liquid crystal display device is improved.
摘要翻译：在具有彼此相对并接合的一对基板的液晶显示装置中，在一对基板之间密封液晶层，并且在一对基板中的一个基板上形成柱状间隔件，并与其他衬底以保持该对衬底之间的间隙。柱状间隔件的支撑柱的表面被制成粗糙以增强一对基板之间的摩擦力，并且防止一对基板中的另一个从一对基板之一发散，使得显示质量改善了液晶显示装置。

2. 发明授权

US08685631B2 Inspection method for patterning of photoresist 有权
标题翻译：光刻胶图形化检测方法
公开(公告)号：US08685631B2
公开(公告)日：2014-04-01
申请号：US12817623
申请日：2010-06-17
申请人： Yoshihiro Daito , Ryuuta Watanabe , Yoshitaka Imabayashi
发明人： Yoshihiro Daito , Ryuuta Watanabe , Yoshitaka Imabayashi
IPC分类号： G03F7/22
CPC分类号： G03F7/16
摘要： A nozzle is moved while supplying a photoresist liquid from a slit. A photoresist layer is formed on a film. A resist pattern which covers a portion of the film is formed from the photoresist layer by photolithography. Inspection of the resist pattern is performed. The photolithography includes an exposure which is performed so as to transfer a latent image to the photoresist layer, and a development of the photoresist layer which is performed so as to leave the latent image. The latent image contains a dummy latent image which extends in an unbroken manner parallel to the longitudinal direction of the slit. The resist pattern contains a dummy resist formed correspondingly to the dummy latent image. The inspection of the resist pattern includes the detection of the presence or non-presence of a cut in the dummy resist in the longitudinal direction.
摘要翻译：在从狭缝供给光致抗蚀剂液体的同时移动喷嘴。在膜上形成光致抗蚀剂层。通过光刻从光致抗蚀剂层形成覆盖膜的一部分的抗蚀剂图案。进行抗蚀剂图案的检查。光刻法包括进行曝光以将潜像转印到光致抗蚀剂层，以及显影以使离开潜像的方式被执行。潜像包含以与缝隙的纵向方向平行的不间断的方式延伸的虚拟潜像。抗蚀剂图案包含对应于虚拟潜像形成的虚拟抗蚀剂。抗蚀剂图案的检查包括在纵向方向上检测伪抗蚀剂中的切口的存在或不存在。

3. 发明申请

US20100323304A1 INSPECTION METHOD FOR PATTERNING OF PHOTORESIST 有权
标题翻译：用于绘制光刻胶的检查方法
公开(公告)号：US20100323304A1
公开(公告)日：2010-12-23
申请号：US12817623
申请日：2010-06-17
申请人： Yoshihiro DAITO , Ryuuta Watanabe , Yoshitaka Imabayashi
发明人： Yoshihiro DAITO , Ryuuta Watanabe , Yoshitaka Imabayashi
IPC分类号： G03F7/20
CPC分类号： G03F7/16
摘要： A nozzle is moved while supplying a photoresist liquid from a slit. A photoresist layer is formed on a film. A resist pattern which covers a portion of the film is formed from the photoresist layer by photolithography. Inspection of the resist pattern is performed. The photolithography includes an exposure which is performed so as to transfer a latent image to the photoresist layer, and a development of the photoresist layer which is performed so as to leave the latent image. The latent image contains a dummy latent image which extends in an unbroken manner parallel to the longitudinal direction of the slit. The resist pattern contains a dummy resist formed correspondingly to the dummy latent image. The inspection of the resist pattern includes the detection of the presence or non-presence of a cut in the dummy resist in the longitudinal direction.
摘要翻译：在从狭缝供给光致抗蚀剂液体的同时移动喷嘴。在膜上形成光致抗蚀剂层。通过光刻从光致抗蚀剂层形成覆盖膜的一部分的抗蚀剂图案。进行抗蚀剂图案的检查。光刻法包括进行曝光以将潜像转印到光致抗蚀剂层，以及显影以使离开潜像的方式被执行。潜像包含以与缝隙的纵向方向平行的不间断的方式延伸的虚拟潜像。抗蚀剂图案包含对应于虚拟潜像形成的虚拟抗蚀剂。抗蚀剂图案的检查包括在纵向方向上检测伪抗蚀剂中的切口的存在或不存在。

4. 发明授权

US07248330B2 Liquid crystal display device and manufacturing method thereof 有权
标题翻译：液晶显示装置及其制造方法
公开(公告)号：US07248330B2
公开(公告)日：2007-07-24
申请号：US10890250
申请日：2004-07-14
申请人： Akira Ishii , Yoshitaka Imabayashi
发明人： Akira Ishii , Yoshitaka Imabayashi
IPC分类号： G02F1/1339
CPC分类号： G02F1/13394
摘要： In a liquid crystal display device having a pair of substrates that are opposite to and bonded to each other, a liquid crystal layer is sealed between the pair of substrates, and columnar spacers are formed on one of the pair of substrates and in contact with the other substrate to maintain a gap between the pair of substrates. The surfaces of support columns of the columnar spacers are made to be rough to enhance the friction force between the pair of substrates and to prevent the other of the pair of substrates from diverging from the one of the pair of substrates, so that display quality of the liquid crystal display device is improved.
摘要翻译：在具有彼此相对并接合的一对基板的液晶显示装置中，在一对基板之间密封液晶层，并且在一对基板中的一个基板上形成柱状间隔件，并与其他衬底以保持该对衬底之间的间隙。柱状间隔件的支撑柱的表面被制成粗糙以增强一对基板之间的摩擦力，并且防止一对基板中的另一个从一对基板之一发散，使得显示质量改善了液晶显示装置。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式