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热词
    • 1. 发明授权
    • Exposure apparatus and method
    • 曝光装置和方法
    • US4707609A
    • 1987-11-17
    • US823732
    • 1986-01-29
    • Yoshinori Shimamura
    • Yoshinori Shimamura
    • G03F7/20G21G5/00
    • G03F7/70016G03F7/7005G03F7/70975
    • An exposure apparatus for exposing a first object to a radiation energy passed through a second object, having a pattern, thereby to transfer the pattern of the second object onto the first object, the exposure apparatus including a radiation energy source, at least one spare radiation energy source and an arrangement for substituting the first-mentioned radiation energy source by the second-mentioned, spare, radiation energy source when the service life of the first-mentioned radiation energy source becomes over or nearly over, wherein the spare radiation energy source is energized or actuated when the intensity of irradiation of the first-mentioned radiation energy source is decreased to a predetermined value and, at the same time or after elapse of a predetermined time, the first-mentioned radiation energy source is sustituted by the spare radiation energy source.
    • 一种用于将第一物体暴露于穿过第二物体的辐射能量的曝光装置,具有图案,从而将第二物体的图案转印到第一物体上,该曝光装置包括辐射能量源,至少一个备用辐射 能量源和用于当第一提及的备用辐射能量源首先提到的辐射能量源在第一个提到的辐射能量源的使用寿命变得过高或接近超过时代替首先提到的辐射能源的装置,其中备用辐射能源是 当第一次提到的辐射能源的照射强度降低到预定值时,并且在同一时间或经过预定时间之后,首先提到的辐射能量源由备用辐射能量 资源。