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1. 发明授权

US07661188B2 Method of manufacturing glass substrate for magnetic disk 失效
标题翻译：制造磁盘用玻璃基板的方法
公开(公告)号：US07661188B2
公开(公告)日：2010-02-16
申请号：US11387929
申请日：2006-03-24
申请人： Yoshinori Marumo
发明人： Yoshinori Marumo
IPC分类号： G11B5/127 , B44C1/22
CPC分类号： B08B3/12 , B08B3/08 , C03C23/0075 , C03C2218/31 , G11B5/8404 , Y10T29/49037 , Y10T29/49043 , Y10T29/49048 , Y10T29/49126 , Y10T29/49128 , Y10T29/4913
摘要： In a manufacturing method of a glass substrate for a magnetic disk including a cleaning process of the glass substrate, the cleaning process includes a process of contacting the glass substrate with a cleaning solution containing a compound, such as thioglycolic acid or a thioglycolic acid derivative, having a thiol group as a functional group.
摘要翻译：在包括玻璃基板的清洗工序的磁盘用玻璃基板的制造方法中，清洗工序包括使玻璃基板与含有化合物如巯基乙酸或巯基乙酸衍生物的清洗液接触的工序，具有巯基作为官能团。

2. 发明申请

US20060266732A1 Method of manufacturing glass substrate for magnetic disk 失效
标题翻译：制造磁盘用玻璃基板的方法
公开(公告)号：US20060266732A1
公开(公告)日：2006-11-30
申请号：US11387929
申请日：2006-03-24
申请人： Yoshinori Marumo
发明人： Yoshinori Marumo
IPC分类号： B44C1/22 , B08B3/12 , B08B7/00 , C03C23/00
CPC分类号： B08B3/12 , B08B3/08 , C03C23/0075 , C03C2218/31 , G11B5/8404 , Y10T29/49037 , Y10T29/49043 , Y10T29/49048 , Y10T29/49126 , Y10T29/49128 , Y10T29/4913
摘要： In a manufacturing method of a glass substrate for a magnetic disk including a cleaning process of the glass substrate, the cleaning process includes a process of contacting the glass substrate with a cleaning solution containing a compound, such as thioglycolic acid or a thioglycolic acid derivative, having a thiol group as a functional group.
摘要翻译：在包括玻璃基板的清洗工序的磁盘用玻璃基板的制造方法中，清洗工序包括使玻璃基板与含有化合物如巯基乙酸或巯基乙酸衍生物的清洗液接触的工序，具有巯基作为官能团。

3. 发明授权

US06926817B2 Solution processing apparatus and solution processing method 失效
标题翻译：解决方案处理设备和解决方案处理方法
公开(公告)号：US06926817B2
公开(公告)日：2005-08-09
申请号：US10143014
申请日：2002-05-13
申请人： Yoshinori Marumo , Koichiro Kimura
发明人： Yoshinori Marumo , Koichiro Kimura
IPC分类号： C25D7/12 , C23C2/00 , C25D17/00 , C25D17/08 , H01L21/00 , H01L21/288 , C25D5/00
CPC分类号： H01L21/67057 , C23C2/003 , H01L21/2885
摘要： A plating apparatus includes a plating solution tank which stores a plating solution, a holder including an inner space to house a wafer and an opening for the wafer to be in contact with the plating solution, and a nitrogen supplying mechanism to supply nitrogen to the inner space of the holder.
摘要翻译：电镀装置包括：电镀溶液槽，存储电镀溶液;保持器，其包括用于容纳晶片的内部空间和用于与电镀液接触的晶片的开口;以及氮供给机构，用于向内部供给氮持有人的空间。

4. 发明授权

US06331890B1 Thickness measuring apparatus, substrate processing method, and substrate processing apparatus 失效
标题翻译：厚度测量装置，基板处理方法和基板处理装置
公开(公告)号：US06331890B1
公开(公告)日：2001-12-18
申请号：US09474126
申请日：1999-12-29
申请人： Yoshinori Marumo , Teruyuki Hayashi
发明人： Yoshinori Marumo , Teruyuki Hayashi
IPC分类号： G01J400
CPC分类号： G01B11/0683
摘要： A film thickness measuring apparatus is provided with a housing which is made up of a base plate and outer cases, and which substantially shuts off the internal region thereof from the outside air, an introduction stage on which a cassette C is mounted, the cassette containing a plurality of substrates which have thin films formed thereon, a measurement stage which is arranged inside the housing and on which the substrate is placed for measuring the film thickness of the thin film, and a conveyance mechanism, arranged inside the housing, for moving the substrates between the inside of the cassette and the measurement stage. A film thickness measuring mechanism is arranged inside the housing. The film thickness measuring mechanism comprises a light emitting mechanism and a detector. The light emitting mechanism includes a laser light source for emitting a laser beam to the thin film on a wafer placed on the measurement stage. The detector detects light reflected from the thin film. On the basis of the information detected by the detector, the film thickness measuring mechanism measures the thickness of the thin film in a non-contact manner. A filter unit is arranged in the housing and located above the measurement stage. Through this filter unit, pure air free of gaseous organic matter is supplied and guided to the region above the measurement stage.
摘要翻译：薄膜厚度测量装置设置有由基板和外壳组成的壳体，其基本上从外部空气中切断其内部区域，安装盒C的导入台，所述盒体包含在其上形成有薄膜的多个基板，布置在壳体内部并且放置基板以测量薄膜的膜厚度的测量台，以及布置在壳体内部的用于移动盒子内部和测量台之间的衬底。膜厚测量机构设置在壳体内。膜厚测量机构包括发光机构和检测器。发光机构包括用于在放置在测量台上的晶片上向激光束发射激光的激光光源。检测器检测从薄膜反射的光。基于由检测器检测到的信息，膜厚测量机构以非接触的方式测量薄膜的厚度。过滤器单元布置在壳体中并位于测量台的上方。通过该过滤器单元，将不含气态有机物的纯空气供给并引导到测量台上方的区域。

5. 发明授权

US08127433B2 Method of manufacturing a glass substrate for magnetic disk 有权
标题翻译：制造磁盘用玻璃基板的方法
公开(公告)号：US08127433B2
公开(公告)日：2012-03-06
申请号：US12650853
申请日：2009-12-31
申请人： Yoshinori Marumo
发明人： Yoshinori Marumo
IPC分类号： G11B5/27 , B44C1/22
CPC分类号： B08B3/12 , B08B3/08 , C03C23/0075 , C03C2218/31 , G11B5/8404 , Y10T29/49037 , Y10T29/49043 , Y10T29/49048 , Y10T29/49126 , Y10T29/49128 , Y10T29/4913
摘要： In a manufacturing method of a glass substrate for a magnetic disk including a cleaning process of the glass substrate, the cleaning process includes a process of contacting the glass substrate with a cleaning solution containing a compound, such as thioglycolic acid or a thioglycolic acid derivative, having a thiol group as a functional group.
摘要翻译：在包括玻璃基板的清洗工序的磁盘用玻璃基板的制造方法中，清洗工序包括使玻璃基板与含有化合物如巯基乙酸或巯基乙酸衍生物的清洗液接触的工序，具有巯基作为官能团。

6. 发明申请

US20110171415A1 GLASS SUBSTRATE FOR A MAGNETIC DISK AND MAGNETIC DISK 有权
标题翻译：用于磁盘和磁盘的玻璃基板
公开(公告)号：US20110171415A1
公开(公告)日：2011-07-14
申请号：US13120320
申请日：2009-09-29
申请人： Shinji Eda , Hideki Isono , Takashi Maeda , Hiroshi Tsuchiya , Yoshinori Marumo
发明人： Shinji Eda , Hideki Isono , Takashi Maeda , Hiroshi Tsuchiya , Yoshinori Marumo
IPC分类号： B32B3/26 , B24B7/00
CPC分类号： C03C23/009 , C03C19/00 , C03C21/008 , C03C23/0075 , C03C2204/08 , C09G1/02 , G11B5/7315 , G11B5/8404 , G11B5/8408
摘要： Provided are a magnetic disk substrate and a method of manufacturing the same, wherein the magnetic disk substrate has very few defects present on its surface with an arithmetic mean roughness (Ra) at a level in the vicinity of 0.1 nm and thus is suitable as a substrate for a magnetic disk with high recording density. The magnetic disk glass substrate is such that the arithmetic mean roughness (Ra) of the main surface of the glass substrate measured using an atomic force microscope with a resolution of 256×256 pixels in a 2 μm×2 μm square is 0.12 nm or less and the number of defects detected to have a size of 0.1 μm to 0.6 μm in plan view and a depth of 0.5 nm to 2 nm is less than 10 per 24 cm2, wherein the defects are each detected using a shift in wavelength between incident light and reflected light upon irradiating and scanning helium neon laser light with a wavelength of 632 nm on the main surface of the glass substrate.
摘要翻译：提供一种磁盘基板及其制造方法，其中，磁盘基板的表面上存在极少的缺陷，算术平均粗糙度（Ra）在0.1nm附近，因此适合作为具有高记录密度的磁盘的基板。磁盘玻璃基板使用原子力显微镜在2μm×2μm的正方形中以256×256像素的分辨率测量的玻璃基板的主面的算术平均粗糙度（Ra）为0.12nm以下并且在平面图中检测为具有0.1μm至0.6μm的尺寸和0.5nm至2nm的深度的缺陷的数量小于每24cm 2的10个，其中每个使用入射光之间的波长偏移检测缺陷并在玻璃基板的主表面上照射和扫描波长为632nm的氦氖激光的反射光。

7. 发明申请

US20090158775A1 Method For Producing Glass Substrate For Magnetic Disk And Method For Manufacturing Magnetic Disk 有权
标题翻译：磁盘用玻璃基板的制造方法及制造磁盘的方法
公开(公告)号：US20090158775A1
公开(公告)日：2009-06-25
申请号：US12088851
申请日：2007-03-16
申请人： Toshio Takizawa , Takumi Koshimizu , Yoshinori Marumo , Masahiro Katagiri
发明人： Toshio Takizawa , Takumi Koshimizu , Yoshinori Marumo , Masahiro Katagiri
IPC分类号： C03C19/00
CPC分类号： B24B7/241 , C03C19/00 , C03C23/0075 , G11B5/8404
摘要： When mirror polishing is performed on a glass substrate by bringing a polishing pad into contact with the surface of the glass substrate while supplying a polishing liquid containing polishing grains to the substrate surface, the pH of the polishing liquid is maintained within a certain range or the agglomeration degree or dispersion degree of the polishing liquid is controlled. Consequently, an adequate mirror polishing rate can be maintained and there can be obtained a glass substrate having a good end shape.
摘要翻译：当在玻璃基板上进行镜面抛光时，通过使抛光垫与玻璃基板的表面接触，同时向衬底表面供给包含抛光颗粒的抛光液体，将抛光液的pH保持在一定范围内或控制研磨液的附聚度或分散度。因此，可以保持足够的镜面研磨速度，并且可以获得具有良好端部形状的玻璃基板。

8. 发明授权

US07198662B2 Electroless plating pre-treatment solution and electroles plating method 有权
标题翻译：无电镀预处理液和电镀电镀法
公开(公告)号：US07198662B2
公开(公告)日：2007-04-03
申请号：US10882340
申请日：2004-07-02
申请人： Yoshinori Marumo
发明人： Yoshinori Marumo
IPC分类号： C23C18/30 , B05D3/10
CPC分类号： H01L21/76843 , C23C18/1607 , C23C18/165 , C23C18/1803 , C23C18/1827 , C23C18/1834 , C23C18/31 , H01L21/288 , H01L21/76849 , H01L21/76873 , H01L21/76877 , H05K3/422
摘要： It is an object of the present invention to provide an electroless plating pre-treatment solution and an electroless plating method capable of shortening the incubation time and achieving cost reduction.As the pre-treatment solution 7 to be supplied onto the wafer W before the electroless plating, an aqueous solution is supplied in which an activation accelerator to accelrate the oxidative decomposition reaction of a reducing agent and an oxide layer remover to remove an oxide layer formed on the wiring portions 4a are dissolved. The activation accelerator includes at least one selected from the group consisting of sulfonic acid having two or more characteristic groups, derivatives of the sulfonic, and salts of the sulfonic acid.
摘要翻译：本发明的目的是提供能够缩短孵育时间并实现成本降低的化学镀预处理溶液和化学镀方法。

9. 发明申请

US20060037858A1 Electroless plating apparatus and electroless plating method 审中-公开
标题翻译：无电镀设备和化学镀方法
公开(公告)号：US20060037858A1
公开(公告)日：2006-02-23
申请号：US10528117
申请日：2003-05-23
申请人： Yoshinori Marumo , Miho Jomen , Takayuki Komiya , Hiroshi Sato , Gishi Chung
发明人： Yoshinori Marumo , Miho Jomen , Takayuki Komiya , Hiroshi Sato , Gishi Chung
IPC分类号： C25D17/06
CPC分类号： C23C18/1619 , C23C18/1669 , C23C18/1678
摘要： A plate is placed near a substrate held by a substrate holding section. A treating liquid is ejected from a treating liquid ejecting section, thereby plating the substrate electrolessly. The treating liquid flows through the gap between the substrate and the plate. Therefore a flow of the treating liquid occurs on the substrate. As a result, a fresh treating liquid can be supplied onto the substrate. Thus, a plating film can be formed very uniformly on the substrate even if the amount of treating liquid is small.
摘要翻译：将板放置在由基板保持部保持的基板附近。处理液从处理液喷射部喷出，由此无电解地镀覆基板。处理液体流过基板和板之间的间隙。因此，处理液的流动发生在基板上。结果，可以将新鲜的处理液体供应到基底上。因此，即使处理液的量少，也可以在基板上非常均匀地形成镀膜。

10. 发明申请

US20050164499A1 Electroless plating method and apparatus 审中-公开
标题翻译：化学镀方法及装置
公开(公告)号：US20050164499A1
公开(公告)日：2005-07-28
申请号：US11082807
申请日：2005-03-18
申请人： Yoshinori Marumo , Hiroshi Sato , Miho Jomen
发明人： Yoshinori Marumo , Hiroshi Sato , Miho Jomen
IPC分类号： C23C18/16 , C23C18/18 , H01L21/00 , H01L21/288 , H01L21/768 , H01L21/44 , H01L21/4763
CPC分类号： H01L21/288 , C23C18/165 , H01L21/67028 , H01L21/67086 , H01L21/76877
摘要： In a method of electroless plating, catalytically active nuclei are formed on a diffusion inhibiting layer (such as a barrier layer), the catalytically active nuclei being catalytically active on a reducing agent contained in an electroless plating solution, and an electroless plating is then carried out by using the electroless plating solution. The method allows the formation of an electrolessly plated coating on a barrier layer through the acceleration of the reaction of a reducing agent contained in an electroless plating solution by catalytically active nucleus.
摘要翻译：在化学镀方法中，在扩散抑制层（例如阻挡层）上形成催化活性核，催化活性核在化学镀溶液中包含的还原剂上具有催化活性的核，然后进行化学镀通过使用化学镀溶液。该方法允许通过催化活性核加速化学镀溶液中所含的还原剂的反应，在阻挡层上形成无电镀层。

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