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    • 3. 发明申请
    • Antireflection film, production method of the same, polarizing plate and display
    • 防反射膜,其制作方法,偏光板及显示屏
    • US20060181774A1
    • 2006-08-17
    • US11352826
    • 2006-02-13
    • Yoshikazu OjimaKatsumi MaejimaToshiyuki Ikeda
    • Yoshikazu OjimaKatsumi MaejimaToshiyuki Ikeda
    • G02B1/10
    • G02B1/111
    • An antireflection film comprising a transparent substrate film having thereon a hard coat, a high refractive index layer and a low refractive index layer, wherein: (i) the high refractive index layer is formed by applying a coating solution containing the following (a) to (c); (ii) the low refractive index layer is formed by applying a coating solution containing the following (d) and (e); (iii) the antireflection film is heat treated, wherein (a) metal oxide particles having an average primary particle diameter of 10 to 200 nm; (b) a metal compound; (c) an ionizing radiation curable resin; (d) an organosilicon compound having a prescribed structure, a hydrolyzed compound of the organosilicon compound, a decomposed compound of the organosilicon compound or a polycondensed compound of the organosilicon compound; and (e) hollow silica particles each having an outer shell, and a void or a porous portion in the inside.
    • 1.一种防反射膜,其特征在于,具备透明基材膜,其上具有硬质被膜,高折射率层和低折射率层,其中:(i)通过将含有下列(a)的涂布溶液 (C); (ii)通过涂布含有下述(d)和(e)的涂布溶液来形成低折射率层; (iii)对所述抗反射膜进行热处理,其中(a)平均一次粒径为10〜200nm的金属氧化物粒子; (b)金属化合物; (c)电离辐射固化树脂; (d)具有规定结构的有机硅化合物,有机硅化合物的水解化合物,有机硅化合物的分解化合物或有机硅化合物的缩聚化合物; 和(e)中空二氧化硅颗粒,每个中空二氧化硅颗粒具有外壳,内部为空隙或多孔部分。
    • 6. 发明申请
    • Antireflection film, production method of the same, polarizing plate and display
    • 防反射膜,其制作方法,偏光板及显示屏
    • US20100304020A1
    • 2010-12-02
    • US12661441
    • 2010-03-17
    • Yoshikazu OjimaKatsumi MaejimaToshiyuki Ikeda
    • Yoshikazu OjimaKatsumi MaejimaToshiyuki Ikeda
    • B05D5/06
    • G02B1/111
    • An antireflection film comprising a transparent substrate film having thereon a hard coat, a high refractive index layer and a low refractive index layer, wherein: (i) the high refractive index layer is formed by applying a coating solution containing the following (a) to (c); (ii) the low refractive index layer is formed by applying a coating solution containing the following (d) and (e); (iii) the antireflection film is heat treated, wherein (a) metal oxide particles having an average primary particle diameter of 10 to 200 nm; (b) a metal compound; (c) an ionizing radiation curable resin; (d) an organosilicon compound having a prescribed structure, a hydrolyzed compound of the organosilicon compound, a decomposed compound of the organosilicon compound or a polycondensed compound of the organosilicon compound; and (e) hollow silica particles each having an outer shell, and a void or a porous portion in the inside.
    • 1.一种防反射膜,其特征在于,具备透明基材膜,其上具有硬质被膜,高折射率层和低折射率层,其中:(i)通过将含有下列(a)的涂布溶液 (C); (ii)通过涂布含有下述(d)和(e)的涂布溶液来形成低折射率层; (iii)对所述抗反射膜进行热处理,其中(a)平均一次粒径为10〜200nm的金属氧化物粒子; (b)金属化合物; (c)电离辐射固化树脂; (d)具有规定结构的有机硅化合物,有机硅化合物的水解化合物,有机硅化合物的分解化合物或有机硅化合物的缩聚化合物; 和(e)中空二氧化硅颗粒,每个中空二氧化硅颗粒具有外壳,内部为空隙或多孔部分。