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    • 1. 发明授权
    • Method for creating charged-particle-beam exposure data, method for manufacturing semiconductor device, and program
    • 用于产生带电粒子束曝光数据的方法,用于制造半导体器件的方法和程序
    • US07076761B2
    • 2006-07-11
    • US10642680
    • 2003-08-19
    • Ryouichi InanamiAtsushi AndoKazuhiro NakaiYoshikazu Ichioka
    • Ryouichi InanamiAtsushi AndoKazuhiro NakaiYoshikazu Ichioka
    • G06F17/50
    • B82Y10/00B82Y40/00G03F1/20H01J37/3174
    • A method for creating charged-particle-beam exposure data containing a description of an exposure sequence of character patterns to perform exposure of a charged-particle-beam according to a character projection technique, comprising selecting first or second values as a parameter to transfer one character pattern and then transferring a subsequent character pattern, the first value regarding performance of a shaping deflector which deflects the charged particle beam so that the charged particle beam is applied to an arbitrarily character aperture formed in a CP aperture mask and a character beam having the shape of the character aperture is thereby created, and the second value regarding performance of an objective deflector which deflects the character beam so that the character beam is applied to an arbitrarily position of the deflection region of the specimen, and determining the exposure sequence of the character patterns in the deflection region in accordance with the selected parameter.
    • 一种用于产生包含字符图案的曝光序列的描述的带电粒子束曝光数据的方法,用于根据字符投影技术执行带电粒子束的曝光,包括选择第一或第二值作为参数以传送一个 字符图案,然后传送后续字符图案,关于使带电粒子束偏转的成形偏转器的性能的第一值,使得带电粒子束被施加到形成在CP孔径掩模中的任意字符孔径和具有 由此产生字符孔径的形状,以及关于使字符光束偏转的目标偏转器的性能的第二值,使得字符光束被施加到样本的偏转区域的任意位置,并且确定 根据所选择的偏转区域中的字符图案 直径