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    • 1. 发明授权
    • Position aligning apparatus, position aligning method, and semiconductor device manufacturing method
    • 位置对位装置,位置对准方法以及半导体装置制造方法
    • US08092961B2
    • 2012-01-10
    • US12385991
    • 2009-04-27
    • Yoshiaki YanagawaYuki Okada
    • Yoshiaki YanagawaYuki Okada
    • G03F9/00
    • G01B11/002G03B27/52G03F9/7003G03F9/7011G03F9/7019
    • A position aligning apparatus performs position alignment of a pattern in a current process of a pattern exposure process by using a pattern formed before the current process. The position aligning apparatus includes: a correction calculating section configured to calculate a correction value set of a current lot about each of misalignments in scale and rotation of a pattern in a chip in the current process based on a correction value set in an immediately-preceding lot in the current process, a completeness value set in the immediately-preceding lot in the current process, a summation of completeness value sets in the immediately-preceding lot to a process immediately-preceding to the current process, and a summation of completeness value sets in the current lot to the immediately-preceding process; and a correction control unit configured to control correction of the scale and the rotation of the pattern in the chip by using the correction value sets.
    • 位置对位装置通过使用在当前处理之前形成的图案,在图案曝光处理的当前处理中执行图案的位置对准。 位置对位装置包括:校正计算部,被配置为基于在前一处设定的校正值,计算当前处理中的芯片中的图案的比例和旋转中的每个不对准的当前批次的校正值集 在当前流程中,在当前流程中紧接在前的批次中设置的完整性值,将紧接在前的批次中的完整性值集合的总和与当前流程之前的流程相加,以及完整性值的总和 将当前批次设置为紧接在前的过程; 以及校正控制单元,其被配置为通过使用所述校正值集来控制所述刻度的所述图案的校正和所述图案的旋转。
    • 3. 发明申请
    • Position aligning apparatus, position aligning method, and semiconductor device manufacturing method
    • 位置对位装置,位置对准方法以及半导体装置制造方法
    • US20090269685A1
    • 2009-10-29
    • US12385991
    • 2009-04-27
    • Yoshiaki YanagawaYuki Okada
    • Yoshiaki YanagawaYuki Okada
    • G03F7/20G06F19/00G01B11/00G03B27/52
    • G01B11/002G03B27/52G03F9/7003G03F9/7011G03F9/7019
    • A position aligning apparatus performs position alignment of a pattern in a current process of a pattern exposure process by using a pattern formed before the current process. The position aligning apparatus includes: a correction calculating section configured to calculate a correction value set of a current lot about each of misalignments in scale and rotation of a pattern in a chip in the current process based on a correction value set in an immediately-preceding lot in the current process, a completeness value set in the immediately-preceding lot in the current process, a summation of completeness value sets in the immediately-preceding lot to a process immediately-preceding to the current process, and a summation of completeness value sets in the current lot to the immediately-preceding process; and a correction control unit configured to control correction of the scale and the rotation of the pattern in the chip by using the correction value sets.
    • 位置对位装置通过使用在当前处理之前形成的图案,在图案曝光处理的当前处理中执行图案的位置对准。 位置对位装置包括:校正计算部,被配置为基于在前一处设定的校正值,计算当前处理中的芯片中的图案的比例和旋转中的每个不对准的当前批次的校正值集 在当前流程中,在当前流程中紧接在前的批次中设置的完整性值,将紧接在前的批次中的完整性值集合的总和与当前流程之前的流程相加,以及完整性值的总和 将当前批次设置为紧接在前的过程; 以及校正控制单元,其被配置为通过使用所述校正值集来控制所述刻度的所述图案的校正和所述图案的旋转。