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    • 3. 发明申请
    • Method for applying resin film to face of semiconductor wafer
    • 将树脂膜施加到半导体晶片的面上的方法
    • US20070054498A1
    • 2007-03-08
    • US11514901
    • 2006-09-05
    • Kentaro IizukaTakashi SampeiNobuyasu KitaharaYohei Yamashita
    • Kentaro IizukaTakashi SampeiNobuyasu KitaharaYohei Yamashita
    • H01L21/31
    • H01L21/6715Y10S438/906
    • A method for applying a resin film to the face of a semiconductor wafer, comprising: an assembly holding step of holding an assembly on the surface of chuck means, with the back of the assembly being opposed to the surface of the chuck means, the assembly including a frame having a mounting opening formed in a central portion of the frame, and a semiconductor wafer mounted in the mounting opening of the frame by sticking a mounting tape to the back of the frame and the back of the semiconductor wafer; a liquid droplet supply step of supplying liquid droplets of a solution having a resin dissolved therein onto the face of the semiconductor wafer in the assembly after the assembly holding step; and a spreading step of rotating the chuck means subsequently to the liquid droplet supply step, thereby spreading the liquid droplets throughout the face of the semiconductor wafer. The method further comprises a cleaning step of rotating the chuck means and also supplying a cleaning fluid to the surface of the frame after the spreading step, thereby cleaning the solution which has adhered to the surface of the frame.
    • 一种将树脂膜施加到半导体晶片的表面的方法,包括:组件保持步骤,其将组件保持在卡盘装置的表面上,其中组件的背面与卡盘装置的表面相对,组件 包括具有形成在框架的中心部分中的安装开口的框架,以及通过将安装带粘贴到框架的后部和半导体晶片的背面而安装在框架的安装开口中的半导体晶片; 液滴供给步骤,在组装保持步骤之后,在组件中将溶解有树脂的溶液的液滴供给到半导体晶片的表面上; 以及随后在液滴供给步骤旋转卡盘装置的扩散步骤,从而使液滴在半导体晶片的整个表面上扩展。 该方法还包括一个清洁步骤,用于旋转卡盘装置,并且在扩展步骤之后还将清洁流体提供给框架的表面,从而清洁粘附到框架表面的溶液。
    • 5. 发明授权
    • Method for applying resin film to face of semiconductor wafer
    • 将树脂膜施加到半导体晶片的面上的方法
    • US07799700B2
    • 2010-09-21
    • US11514901
    • 2006-09-05
    • Kentaro IizukaTakashi SampeiNobuyasu KitaharaYohei Yamashita
    • Kentaro IizukaTakashi SampeiNobuyasu KitaharaYohei Yamashita
    • H01L21/31H01L21/00
    • H01L21/6715Y10S438/906
    • A method for applying a resin film to the face of a semiconductor wafer, comprising: an assembly holding step of holding an assembly on the surface of chuck means, with the back of the assembly being opposed to the surface of the chuck means, the assembly including a frame having a mounting opening formed in a central portion of the frame, and a semiconductor wafer mounted in the mounting opening of the frame by sticking a mounting tape to the back of the frame and the back of the semiconductor wafer; a liquid droplet supply step of supplying liquid droplets of a solution having a resin dissolved therein onto the face of the semiconductor wafer in the assembly after the assembly holding step; and a spreading step of rotating the chuck means subsequently to the liquid droplet supply step, thereby spreading the liquid droplets throughout the face of the semiconductor wafer. The method further comprises a cleaning step of rotating the chuck means and also supplying a cleaning fluid to the surface of the frame after the spreading step, thereby cleaning the solution which has adhered to the surface of the frame.
    • 一种将树脂膜施加到半导体晶片的表面的方法,包括:组件保持步骤,其将组件保持在卡盘装置的表面上,其中组件的背面与卡盘装置的表面相对,组件 包括具有形成在框架的中心部分中的安装开口的框架,以及通过将安装带粘贴到框架的后部和半导体晶片的背面而安装在框架的安装开口中的半导体晶片; 液滴供给步骤,在组装保持步骤之后,在组件中将溶解有树脂的溶液的液滴供给到半导体晶片的表面上; 以及随后在液滴供给步骤旋转卡盘装置的扩散步骤,从而使液滴在半导体晶片的整个表面上扩展。 该方法还包括一个清洁步骤,用于旋转卡盘装置,并且在扩展步骤之后还将清洁流体提供给框架的表面,从而清洁粘附到框架表面的溶液。