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1. 发明申请

US20140262031A1 MULTI-MODE ETCH CHAMBER SOURCE ASSEMBLY 审中-公开
标题翻译：多模式蚀刻室源组件
公开(公告)号：US20140262031A1
公开(公告)日：2014-09-18
申请号：US13893199
申请日：2013-05-13
申请人： Sergey G. BELOSTOTSKIY , Alexander MARCACCI , Kartik RAMASWAMY , Srinivas D. NEMANI , Andrew NGUYEN , Yogananda SARODE
发明人： Sergey G. BELOSTOTSKIY , Alexander MARCACCI , Kartik RAMASWAMY , Srinivas D. NEMANI , Andrew NGUYEN , Yogananda SARODE
IPC分类号： H01J37/32
CPC分类号： H01J37/3244 , H01J37/32091
摘要： A multi-chambered processing platform includes one or more multi-mode plasma processing systems. In embodiments, a multi-mode plasma processing system includes a multi-mode source assembly having a primary source to drive an RF signal on a showerhead electrode within the process chamber and a secondary source to generate a plasma with by driving an RF signal on an electrode downstream of the process chamber. In embodiments, the primary 7 source utilizes RF energy of a first frequency, while the secondary source utilizes RF energy of second, different frequency. The showerhead electrode is coupled to ground through a frequency dependent filter that adequately discriminates between the first and second frequencies for the showerhead electrode to be RF powered during operation of the primary source, yet adequately grounded during operation of the secondary plasma source without electrical contact switching or reliance on physically moving parts.
摘要翻译：多室处理平台包括一个或多个多模式等离子体处理系统。在实施例中，多模式等离子体处理系统包括多模式源组件，该多模式源组件具有用于驱动处理室内的喷头电极上的RF信号的主要源，以及辅助源以通过在其上驱动RF信号来产生等离子体电极在处理室的下游。在实施例中，主7源使用第一频率的RF能量，而次级源利用第二频率的RF能量。淋浴头电极通过频率相关的滤波器耦合到地面，该滤波器在初级源的操作期间充分地辨别喷头电极的第一和第二频率以进行RF供电，而在没有电接触切换的二级等离子体源的操作期间充分地接地或依赖物理移动部件。

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