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    • 3. 发明授权
    • Transferring apparatus, carrying apparatus, and transferring method
    • 转运装置,运送装置和转运方法
    • US07051863B2
    • 2006-05-30
    • US10798975
    • 2004-03-11
    • Hisashi FujimuraShuji TanakaYoshitake KobayashiYasutsugu Aoki
    • Hisashi FujimuraShuji TanakaYoshitake KobayashiYasutsugu Aoki
    • B65G43/10
    • H01L21/67736B65G37/02H01L21/67766
    • A transferring apparatus is provided between a plurality of carrying apparatuses, each carrying apparatus comprising support means for supporting carried products Wf, guide means for controlling the moving direction of the support means, the guide means being provided along processing apparatuses for processing the carried products Wf, and moving means for moving the support means along the guide means. The transferring apparatus includes synchronization control means for synchronizing the moving means of the one carrying apparatus with the moving means of the other carrying apparatus; and at least one hand-over means for receiving the carried products Wf from the support means of the one carrying apparatus and handing over the carried products Wf to the support means of the other carrying apparatus.
    • 传送装置设置在多个搬运装置之间,每个搬运装置包括用于支撑被携带物品Wf的支撑装置,用于控制支撑装置的移动方向的引导装置,沿着处理装置设置的引导装置,用于处理被承载物品Wf 以及用于沿着引导装置移动支撑装置的移动装置。 传送装置包括同步控制装置,用于使一个传送装置的移动装置与另一个传送装置的移动装置同步; 以及至少一个切换装置,用于从所述一个运送装置的支撑装置接收所携带的产品Wf,并将所携带的产品Wf移交到另一个运送装置的支撑装置。
    • 8. 发明授权
    • Transferring apparatus, carrying apparatus, and transferring method
    • 转运装置,运送装置和转运方法
    • US07222721B2
    • 2007-05-29
    • US11368061
    • 2006-03-03
    • Hisashi FujimuraShuji TanakaYoshitake KobayashiYasutsugu Aoki
    • Hisashi FujimuraShuji TanakaYoshitake KobayashiYasutsugu Aoki
    • B65G43/10
    • H01L21/67736B65G37/02H01L21/67766
    • A transferring apparatus is provided between a plurality of carrying apparatuses, each carrying apparatus comprising support means for supporting carried products Wf, guide means for controlling the moving direction of the support means, the guide means being provided along processing apparatuses for processing the carried products Wf, and moving means for moving the support means along the guide means. The transferring apparatus includes synchronization control means for synchronizing the moving means of the one carrying apparatus with the moving means of the other carrying apparatus; and at least one hand-over means for receiving the carried products Wf from the support means of the one carrying apparatus and handing over the carried products Wf to the support means of the other carrying apparatus.
    • 传送装置设置在多个搬运装置之间,每个搬运装置包括用于支撑被携带物品Wf的支撑装置,用于控制支撑装置的移动方向的引导装置,沿着处理装置设置的引导装置,用于处理被承载物品Wf 以及用于沿着引导装置移动支撑装置的移动装置。 传送装置包括同步控制装置,用于使一个传送装置的移动装置与另一个传送装置的移动装置同步; 以及至少一个切换装置,用于从所述一个运送装置的支撑装置接收所携带的产品Wf,并将所携带的产品Wf移交到另一个运送装置的支撑装置。
    • 10. 发明授权
    • Plasma treatment apparatus and method
    • 等离子体处理装置及方法
    • US5753886A
    • 1998-05-19
    • US598082
    • 1996-02-07
    • Naoyuki IwamuraYasutsugu Aoki
    • Naoyuki IwamuraYasutsugu Aoki
    • H05H1/46B08B7/00C23F4/00H01J37/32H01L21/027H01L21/302H01L21/3065B23K10/00
    • H01J37/32357B08B7/0042
    • A plasma treatment and apparatus which enables improved uniform plasma treatment over the entire surface of an object to be treated, improved yield, and higher treatment speed is provided. In a gas introduction passage, the gas capable of plasma discharge is preexcited to raise its level of excitation. A first pair of plasma generation electrodes downstream along the gas flow passage use the preexcited gas to generate a plasma in a first plasma generation position. Further downstream, a second pair of plasma generation electrodes positioned in a second plasma generation position, where the activated state of the gas activated in the first plasma region is maintained, activates the gas to generate a plasma containing activated gas species. The object to be treated is treated by the activated gas species in the second plasma region.
    • 提供了能够改善待处理物体的整个表面上的均匀等离子体处理,提高产量和更高处理速度的等离子体处理和设备。 在气体导入通道中,能够等离子体放电的气体预先激发以提高其激发水平。 沿着气体流动通道下游的第一对等离子体产生电极使用预激发气体在第一等离子体产生位置中产生等离子体。 进一步下游,位于第二等离子体产生位置的第二对等离子体产生电极,其中维持在第一等离子体区域中激活的气体的激活状态,激活气体以产生含有活性气体物质的等离子体。 待处理的物体由第二等离子体区域中的活化气体物质处理。