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    • 3. 发明申请
    • WATER-BASED INKS FOR INK-JET PRINTING
    • 喷墨打印机用水墨水
    • US20110152442A1
    • 2011-06-23
    • US13036366
    • 2011-02-28
    • Yasuhiro DoiYasushi ItoNobuyuki TakizawaShigeki Nagashima
    • Yasuhiro DoiYasushi ItoNobuyuki TakizawaShigeki Nagashima
    • C08L31/02
    • C09D11/32
    • The present invention relates to a water-based ink for ink-jet printing which not only satisfies a high optical density but also exhibits an excellent high lighter-fastness; a water dispersion used for the water-based ink; and a method for producing a print using the water-based ink. There are provided a water dispersion for ink-jet printing comprising (i) (A-1) polymer particles containing a colorant, (B) polymer particles and (C) the water-insoluble organic compound, or (ii) (A-2) self-dispersible pigment, (B) polymer particles and (C) the water-insoluble organic compound; a water-based ink containing the water dispersion; and a method for producing a print using the water-based ink.
    • 本发明涉及一种喷墨印刷用水性油墨,其不仅满足高的光密度,而且还表现出优异的耐光牢度; 用于水性油墨的水分散体; 以及使用该水性油墨制造印刷品的方法。 提供一种用于喷墨印刷的水分散体,其包含(i)(A-1)含有着色剂的聚合物颗粒,(B)聚合物颗粒和(C)水不溶性有机化合物,或(ii)(A-2) )自分散颜料,(B)聚合物颗粒和(C)水不溶性有机化合物; 含有水分散体的水性油墨; 以及使用该水性油墨制造印刷品的方法。
    • 4. 发明申请
    • Composition for cleaning semiconductor device
    • 半导体器件清洗组合物
    • US20080296767A1
    • 2008-12-04
    • US12216212
    • 2008-07-01
    • Atsushi TamuraYasuhiro Doi
    • Atsushi TamuraYasuhiro Doi
    • H01L23/52C11D7/34
    • G03F7/423C11D3/042C11D3/2082C11D3/361C11D7/08C11D7/265C11D7/36C11D11/0047H01L21/02071
    • A sulfur-containing detergent composition for cleaning a semiconductor device having an aluminum wire, wherein the sulfur-containing detergent composition is capable of forming a protective film containing a sulfur atom on a surface of an aluminum film in a protective film-forming test; a semiconductor device comprising a protective film containing a sulfur atom on a surface of an aluminum wire, wherein sulfur atom is contained within a region of at least 5 nm in its thickness direction from the surface of the protective film; and method for manufacturing a semiconductor device, comprising the step of contacting an aluminum wire of the semiconductor device with the sulfur-containing detergent composition as defined above, thereby forming a sulfur-containing protective film on the surface of the aluminum wire. The semiconductor device can be suitably used in the manufacture of electronic parts such as LCD, memory and CPU. Especially, the semiconductor device is suitably used in the manufacture of a highly integrated semiconductor with advanced scale-down.
    • 一种用于清洗具有铝线的半导体器件的含硫洗涤剂组合物,其中所述含硫洗涤剂组合物能够在保护膜形成试验中在铝膜的表面上形成含有硫原子的保护膜; 包含在铝线表面含有硫原子的保护膜的半导体器件,其中硫原子包含在距保护膜表面厚度方向至少5nm的区域内; 以及半导体装置的制造方法,其特征在于,包括使所述半导体装置的铝线与如上所述的含硫洗涤剂组合物接触的步骤,从而在所述铝线的表面上形成含硫保护膜。 半导体器件可以适用于LCD,存储器和CPU等电子零件的制造。 特别地,半导体器件适用于制造具有先进的缩小的高度集成的半导体。
    • 7. 发明申请
    • Lens sheet for screen
    • 镜头片用于屏幕
    • US20060187545A1
    • 2006-08-24
    • US10566523
    • 2004-07-29
    • Yasuhiro Doi
    • Yasuhiro Doi
    • G03B21/60
    • G02B3/0068G02B3/0031G02B3/08G03B21/625Y10T428/31909
    • There are provided a lens sheet for a screen, which is highly stable by virtue of a reduced tendency toward warping, lifting and the like of the lens caused by external humidity and, at the same time, has a suppressed tendency toward friction between lenses during transport as a screen, and a resin composition for constituting the lens sheet. The lens sheet is used in combination with other lens sheet and comprises one or at least two layers. When the layer in contact with the above other lens is formed of a thermoplastic resin, the universal hardness of the thermoplastic resin composition is brought to a range of 31.0 to 42.0 N/mm2.
    • 提供了一种用于屏幕的透镜片,其由于外部湿度导致的透镜的翘曲,提升等倾向而具有高度稳定性,并且同时具有抑制透镜之间的摩擦的倾向 作为筛网的输送,以及用于构成透镜片的树脂组合物。 透镜片与其他透镜片组合使用,并且包括一个或至少两个层。 当与上述其他透镜接触的层由热塑性树脂形成时,热塑性树脂组合物的通用硬度达到31.0至42.0N / mm 2的范围。
    • 9. 发明申请
    • Resin composition and optical element
    • 树脂组合物和光学元件
    • US20050148676A1
    • 2005-07-07
    • US10508072
    • 2003-03-18
    • Yasuhiro DoiToshiyuki TanimuraNobuaki Nakao
    • Yasuhiro DoiToshiyuki TanimuraNobuaki Nakao
    • C08F283/00C08F290/06C08G18/62C08G18/67G02B1/04C08C1/00
    • G02B1/04C08F283/006C08F290/06C08G18/6254C08G18/672C08L51/00C08G18/48
    • There are provided a resin composition, which has optical properties such as a high refractive index, has excellent restorability and scratch resistance, and has good adhesion to a substrate, and, when utilized as an optical member (lens) used, for example, in screens for projection televisions or the like, can satisfy various property requirements, and a cured product of the resin composition. The resin composition comprises: an oligomer component comprising urethane (meth)acrylate, produced by reacting a bisphenol A polyalkoxydiol, an organic diisocyanate and a hydroxyl-containing mono(meth)acrylate, and a bisphenol A epoxy (meth) acrylate; a monomer component comprising a phenoxy polyethylene glycol (meth)acrylate and a bisphenol A polyethoxydiol di(meth)acrylate; and a photopolymerization initiator. The resin composition has a refractive index of not less than 1.55 after resin curing.
    • 提供了具有高折射率等光学性能,耐恢复性和耐刮擦性优异,且对基材的粘合性良好的树脂组合物,作为光学部件(透镜)用于例如 用于投影电视机等的屏幕可以满足各种性能要求,以及树脂组合物的固化产物。 树脂组合物包括:通过使双酚A聚烷氧基二醇,有机二异氰酸酯和含羟基的单(甲基)丙烯酸酯和双酚A环氧(甲基)丙烯酸酯反应制备的聚氨酯(甲基)丙烯酸酯的低聚物组分; 包含苯氧基聚乙二醇(甲基)丙烯酸酯和双酚A聚乙氧基二醇二(甲基)丙烯酸酯的单体组分; 和光聚合引发剂。 树脂组合物在树脂固化后的折射率不小于1.55。
    • 10. 发明申请
    • Composition for cleaning semiconductor device
    • 用于清洁半导体器件的组合物
    • US20050143271A1
    • 2005-06-30
    • US11017824
    • 2004-12-22
    • Atsushi TamuraYasuhiro Doi
    • Atsushi TamuraYasuhiro Doi
    • H01L21/304C11D3/02C11D3/20C11D3/36C11D7/08C11D7/26C11D7/36C11D11/00G03F7/42H01L21/02H01L21/3213C11D1/00
    • G03F7/423C11D3/042C11D3/2082C11D3/361C11D7/08C11D7/265C11D7/36C11D11/0047H01L21/02071
    • A sulfur-containing detergent composition for cleaning a semiconductor device having an aluminum wire, wherein the sulfur-containing detergent composition is capable of forming a protective film containing a sulfur atom on a surface of an aluminum film in a protective film-forming test; a semiconductor device comprising a protective film containing a sulfur atom on a surface of an aluminum wire, wherein sulfur atom is contained within a region of at least 5 nm in its thickness direction from the surface of the protective film; and method for manufacturing a semiconductor device, comprising the step of contacting an aluminum wire of the semiconductor device with the sulfur-containing detergent composition as defined above, thereby forming a sulfur-containing protective film on the surface of the aluminum wire. The semiconductor device can be suitably used in the manufacture of electronic parts such as LCD, memory and CPU. Especially, the semiconductor device is suitably used in the manufacture of a highly integrated semiconductor with advanced scale-down.
    • 一种用于清洗具有铝线的半导体器件的含硫洗涤剂组合物,其中所述含硫洗涤剂组合物能够在保护膜形成试验中在铝膜的表面上形成含有硫原子的保护膜; 包含在铝线表面含有硫原子的保护膜的半导体器件,其中硫原子包含在距保护膜表面厚度方向至少5nm的区域内; 以及半导体装置的制造方法,其特征在于,包括使所述半导体装置的铝线与如上所述的含硫洗涤剂组合物接触的步骤,从而在所述铝线的表面上形成含硫保护膜。 半导体器件可以适用于LCD,存储器和CPU等电子零件的制造。 特别地,半导体器件适用于制造具有先进的缩小的高度集成的半导体。