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1. 发明申请

WO1997022098A1 REFLECTIVE SHEET 审中-公开
标题翻译：反思片
公开(公告)号：WO1997022098A1
公开(公告)日：1997-06-19
申请号：PCT/JP1995002538
申请日：1995-12-12
申请人： NIPPON CARBIDE KOGYO KABUSHIKI KAISHA , OCHI, Katsura , TANAKA, Osamu , YOSHIZAWA, Masaki
发明人： NIPPON CARBIDE KOGYO KABUSHIKI KAISHA
IPC分类号： G09F13/16
CPC分类号： G09F13/16 , Y10T428/263 , Y10T428/264 , Y10T428/265 , Y10T428/2891 , Y10T428/3154 , Y10T428/31935
摘要： A reflective sheet having a smooth surface layer where light is incident, which includes a fluororesin film having a total transmittance of 80 % or greater on the surface layer. Even when this reflective sheet is used in a cold place, the surface thereof is substantially free from icing and the deposition of snow, and it can be easily cleaned if it has scribbles in paint and ink.
摘要翻译：具有入射光的光滑表面层的反射片，其包括表面层上总透射率为80％以上的氟树脂膜。即使将该反射片用于寒冷的地方，其表面基本上没有结冰和雪的沉积，并且如果它在油漆和油墨中涂上涂层，则可以容易地清洁。

2. 发明申请

WO1994010591A1 RETROREFLECTIVE SHEET MANUFACTURING METHOD 审中-公开
标题翻译：回归表制造方法
公开(公告)号：WO1994010591A1
公开(公告)日：1994-05-11
申请号：PCT/JP1992001407
申请日：1992-10-30
申请人： NIPPON CARBIDE KOGYO KABUSHIKI KAISHA , OCHI, Katsura , YOSHIZAWA, Masaki , TANAKA, Osamu
发明人： NIPPON CARBIDE KOGYO KABUSHIKI KAISHA
IPC分类号： G02B05/128
CPC分类号： G09F13/16 , B60R13/10 , E01F9/512 , E01F9/524 , E01F9/619 , G02B5/128
摘要： A retroreflective sheet manufacturing method having the steps of placing a light-permeable protective film on glass beads in a support sheet which consists of a binder layer and a reinforcing layer, and which is provided with retroreflective glass beads buried in the binder layer, and thermally deforming parts of the support sheet under heating and pressure so as to partially bond the binder layer of the support sheet to the protective film, characterized in that the reinforcing layer of the support sheet consists of a crosslinked resin having shearing stress S in the range of 6x10 -1.2x10 dyne/cm before the thermal deformation of the support sheet has been carried out. A retroreflective sheet manufactured by this method has a high uniformity of the joint portions of the support sheet and protective film. Even when this retroflective sheet is used outdoors for a long period of time, troubles including the separation of the protective film do not substantially occur. This retroreflective sheet can be utilized extensively as a road sign board, a license plate for a vehicle, a sign board for construction work and an advertisement board.
摘要翻译：一种逆反射片的制造方法，其具有以下步骤：将玻璃珠上的透光性保护膜放置在由粘合剂层和增强层构成的支撑片中，并且设置有埋在粘合剂层中的回射玻璃珠，并且热在加热和压力下使支撑片的部分变形，以将支撑片的粘合剂层部分地粘合到保护膜上，其特征在于，支撑片的增强层由剪切应力S在以下范围内的交联树脂 6×10 -6〜1.2×10 7达因/ cm 2之前，已经进行了支撑片的热变形。通过该方法制造的逆反射片具有支撑片和保护膜的接合部分的高均匀性。即使这种逆反射片长时间在室外使用，也不会发生包括分离保护膜的麻烦。这种逆反射片可以广泛用作道路标志牌，车辆牌照，建筑工作标志牌和广告牌。

3. 发明授权

US06473162B1 Method of computing defocus amount in lithography and lithographic process using the method 失效
标题翻译：使用该方法计算光刻和光刻过程中散焦量的方法
公开(公告)号：US06473162B1
公开(公告)日：2002-10-29
申请号：US09664448
申请日：2000-09-18
申请人： Yoshizawa Masaki , Shigeru Moriya
发明人： Yoshizawa Masaki , Shigeru Moriya
IPC分类号： G03B2752
CPC分类号： G03F7/70625 , G03F7/70641
摘要： The present invention relates to a method of computing a defocus amount in lithography and lithographic process using the method. A first step executes plural double-exposure operations each including a pattern exposure for forming a pattern of a predetermined line width and a full-area exposure over an area covering the pattern, employing different dosages employed in the full-area exposures for different double-exposure operations. A developing operation is performed. subsequent to the double-exposure, whereby a plurality of resist patterns are obtained. In a second step, the edge roughness and the line width are measured on each resist pattern. In a third step, a Gaussian function is fitted to the edge roughnesses and the line widths. The distribution width of the Gaussian curve is determined as the defocus amount of a pseudo-profile of the beam which indicates a change in lithographic factors that affect the accuracy of lithography.
摘要翻译：本发明涉及使用该方法计算光刻和光刻处理中的散焦量的方法。第一步执行多个双重曝光操作，每个曝光包括在覆盖图案的区域上形成预定线宽和全面曝光图案的图案曝光，采用在不同双面曝光的全区域曝光中采用的不同剂量，曝光操作。进行显影操作。在双曝光之后，由此获得多个抗蚀剂图案。在第二步骤中，在每个抗蚀剂图案上测量边缘粗糙度和线宽度。在第三步中，高斯函数拟合到边缘粗糙度和线宽。高斯曲线的分布宽度被确定为光束的伪轮廓的散焦量，其指示影响光刻精度的光刻因子的变化。

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