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1. 发明申请

WO2011021772A2 KNEE BRACE WITH A RECIPROCAL HINGE 审中-公开
标题翻译： KNEE搭配搭配铰链
公开(公告)号：WO2011021772A2
公开(公告)日：2011-02-24
申请号：PCT/KR2010004345
申请日：2010-07-05
申请人： TRIPLE C MEDICAL CORP , KIM CHEOL WOONG , YOON JUNG HEUM , YANG YOUNG GYU , PARK MIN HYUNG , PARK HYE MIN
发明人： KIM CHEOL WOONG , YOON JUNG HEUM , YANG YOUNG GYU , PARK MIN HYUNG , PARK HYE MIN
IPC分类号： A61F5/04 , A61F5/01
CPC分类号： A61F5/0123 , A61F2005/0148 , A61F2005/0165
摘要： According to one embodiment of the present invention, a knee brace comprises: an upper brace positioned at a thigh region of a wearer when the knee brace is worn; a lower brace positioned at a shin region of the wearer when the knee brace is worn; and a reciprocal hinge connecting the upper brace to the lower brace such that the lower brace is rotatable with respect to the upper brace. The reciprocal hinge includes: a guide plate connected to either the upper brace or the lower brace, and having a first and a second guide hole intersecting one another and forming a preset angle; a first and a second moving body which move along the first and second guide holes, respectively; and a connecting bar, one end of which is connected to either the upper brace or the lower brace and the other end of which is rotatably coupled to the first and second moving bodies, such that the connecting bar is rotated with respect to the guide plate according to the movement of the first and second moving bodies along the first and second guide holes, respectively.
摘要翻译：根据本发明的一个实施例，膝盖支架包括：当膝盖支撑件磨损时位于穿戴者的大腿区域的上支架; 当膝盖支撑被佩戴时，位于穿着者的胫部区域的下支架; 以及将上支架连接到下支架的相互铰链，使得下支架能够相对于上支架旋转。所述往复铰链包括：连接到上支架或下支架的引导板，并且具有彼此相交并形成预设角度的第一和第二引导孔; 分别沿着第一和第二引导孔移动的第一和第二移动体; 以及连接杆，其一端连接到上支架或下支架，并且其另一端可旋转地联接到第一和第二移动体，使得连接杆相对于导板旋转根据第一和第二移动体分别沿着第一和第二引导孔的运动。

2. 发明申请

WO2013022306A3 APPARATUS FOR PLASMA GENERATION, METHOD FOR MANUFACTURING ROTATING ELECTRODES FOR PLASMA GENERATION APPARATUS, METHOD FOR PLASMA TREATMENT OF SUBSTRATE, AND METHOD FOR FORMING THIN FILM OF MIXED STRUCTURE USING PLASMA 审中-公开
标题翻译：等离子体发生装置，等离子体发生装置用旋转电极的制造方法，基板的等离子体处理方法以及使用等离子体形成混合结构的薄膜的方法
公开(公告)号：WO2013022306A3
公开(公告)日：2013-04-04
申请号：PCT/KR2012006384
申请日：2012-08-10
申请人： KOREA MACH & MATERIALS INST , NAM KEE-SEOK , KWON JUNG-DAE , JEONG YONG SOO , LEE GUN HWAN , YOON JUNG HEUM , LEE SUNG HUN , KIM DONG HO , KANG JAE WOOK , PARK SUNG GYU , KIM CHANG SU
发明人： NAM KEE-SEOK , KWON JUNG-DAE , JEONG YONG SOO , LEE GUN HWAN , YOON JUNG HEUM , LEE SUNG HUN , KIM DONG HO , KANG JAE WOOK , PARK SUNG GYU , KIM CHANG SU
IPC分类号： H05H1/34 , C23C16/50 , H01L21/205
CPC分类号： H01J37/32541 , C23C16/503 , C23C16/509 , H01J9/022 , H01J37/32559 , H01J37/32568 , H01J37/32825 , H01J2237/327 , H05H1/2406 , H05H2001/2431 , H05H2001/485 , H05H2001/486
摘要： According to one embodiment of the present invention, provided is an apparatus for plasma generation, comprising: a plate-like lower electrode for mounting a substrate to generate stable and high-density plasma near atmospheric pressure by suppressing a phenomenon in which plasma is transferred to an arc; a conductive body, which comprises a cylindrical rotating electrode on the plate-like lower electrode, wherein the cylindrical rotating electrode is connected to a power source unit, and a plurality of capillary units on an outer circumferential surface thereof; and other portions which are covered with insulators or dielectrics to expose the bottom of the plurality of capillary units.
摘要翻译：根据本发明的一个实施例，提供了一种用于等离子体产生的设备，包括：板状下电极，用于安装基板以通过抑制等离子体转移到其中的现象而在大气压附近产生稳定且高密度的等离子体弧线; 导电体，其包括在所述板状下电极上的圆柱形旋转电极，其中所述圆柱形旋转电极连接到电源单元，以及在其外周表面上的多个毛细管单元; 以及被绝缘体或电介质覆盖以暴露多个毛细管单元的底部的其他部分。

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