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    • 3. 发明申请
    • TECHNOLOGIES FOR PRE-ACTION EXECUTION
    • 预防行动技术
    • WO2016041175A1
    • 2016-03-24
    • PCT/CN2014/086845
    • 2014-09-18
    • INTEL CORPORATIONDENG, PangDING, JunyongXU, Shu
    • DENG, PangDING, JunyongXU, Shu
    • H04L29/08
    • H04L67/22H04L47/808H04L67/02H04L67/306H04L67/42
    • Technologies for pre-action execution include a client computing device to request a resource from a server and receive content from the server including the requested resource and one or more pre-action hints. Each of the one or more pre-action hints identifies a suggested pre-action to be taken by the client computing device prior to receipt of a corresponding user request to perform the corresponding suggested pre-action. The client computing device determines a likelihood of success of one or more pre-actions based on historical behavior data of a user of the client computing device, wherein each pre-action corresponds to at least one of the one or more pre-action hints. The client computing device selects a pre-action to execute based on the determined likelihood of success of the one or more pre-actions.
    • 用于预执行执行的技术包括客户端计算设备,用于从服务器请求资源并从服务器接收包括所请求资源的内容和一个或多个动作前提示。 所述一个或多个预动作提示中的每一个标识在接收到对应的用户请求以执行相应的建议的预动作之前由客户端计算设备采取的建议的预处理。 客户端计算设备基于客户端计算设备的用户的历史行为数据来确定一个或多个预处理成功的可能性,其中每个预作用对应于所述一个或多个预动作提示中的至少一个。 客户端计算设备基于所确定的一个或多个前置动作成功的可能性来选择要执行的动作。
    • 6. 发明申请
    • UNIVERSAL INTERFACE FOR SENSOR DEVICES
    • 传感器设备的通用接口
    • WO2017107123A1
    • 2017-06-29
    • PCT/CN2015/098653
    • 2015-12-24
    • INTEL CORPORATIONLI, TianyouELFORD, ChristopherZHANG, QiDING, JunyongXU, ShuSHEN, GangMOUSTAFA, Hassnaa
    • LI, TianyouELFORD, ChristopherZHANG, QiDING, JunyongXU, ShuSHEN, GangMOUSTAFA, Hassnaa
    • G06F3/00H04W88/16H04L12/28
    • G06F9/44526G06F9/451
    • This application is directed to a universal interface (114) for sensor devices (106A, 106B, 106C, 106D,..., 106n). Applications (110) executed in a device (200) may interact with sensor devices (106A, 106B, 106C, 106D,..., 106n) via a universal interface (114). For example, the device (200) may act as a gateway allowing Internet of Things (IoT) devices to interact with at least one resource external to the environment in which the IoT devices operate. The device (200) may comprise at least memory circuitry (206) to store at least a virtual file system (402) and at least one application (110). The virtual file system (402) may provide a programmatic interface through which at least one sensor device (106A, 106B, 106C, 106D,..., 106n) may be accessible to the at least one application (110). Processing circuitry (204) in the device (200) may execute an application (110) from those stored within the memory circuitry (206). The application (110), when executed, may cause interconnect circuitry also in the device (200) to at least one of transmit instructions to, or receive data from, a sensor device (106A, 106B, 106C, 106D,..., 106n) utilizing the virtual file system (402).
    • 本申请针对用于传感器装置(106A,106B,106C,106D,...,106n)的通用接口(114)。 在设备(200)中执行的应用(110)可以经由通用接口(114)与传感器设备(106A,106B,106C,106D,...,106n)交互。 例如,设备(200)可以充当允许物联网(IoT)设备与IoT设备操作的环境外部的至少一个资源进行交互的网关。 设备(200)可至少包括存储器电路(206)以存储至少一个虚拟文件系统(402)和至少一个应用(110)。 虚拟文件系统(402)可以提供编程接口,至少一个传感器设备(106A,106B,106C,106D,...,106n)可以通过该编程接口被至少一个应用(110)访问。 设备(200)中的处理电路(204)可以从存储在存储器电路(206)内的应用程序(110)执行应用程序(110)。 应用程序(110)在被执行时还可以使得设备(200)中的互连电路还用于向传感器设备(106A,106B,106C,106D,...,...)发送指令或从其接收数据中的至少一个, 106n)利用虚拟文件系统(402)。
    • 7. 发明申请
    • AN APPARATUS AND METHOD FOR GENERATING UNIFORM PLASMAS
    • 用于产生均匀等离子体的装置和方法
    • WO2005010917A1
    • 2005-02-03
    • PCT/SG2004/000210
    • 2004-07-13
    • NANYANG TECHNOLOGICAL UNIVERSITYXU, Shu, YanOSTRIKOV, KostyantynTSAKADZE, Erekle
    • XU, Shu, YanOSTRIKOV, KostyantynTSAKADZE, Erekle
    • H01J37/04
    • H01J37/321H01J37/32165
    • Disclosed is an apparatus for generating high-density, highly uniform plasmas for plasma processing and synthesis of advanced materials. The apparatus includes a reactor chamber and a chamber top, the chamber top housing two mutually perpendicular sets of equally spaced current carrying conductors (25, 26) coupled in series to a low frequency, radiofrequency generator. Two initially mutually perpendicular unidirectional oscillating current sheets and a time-varying electric field that is azimuthally shifted on 45° with respect to the directions of both current sheets are generated. The plasma produced features high density, low electron temperature, and improved as compared with conventional sources of inductively coupled plasmas with external flat spiral coils, uniformity of plasma density, electron temperature, and plasma potential over large areas and volumes. The proposed method of highly uniform plasma production does not rely on expensive additional magnetic dipolar/multipolar confinement. The apparatus can be up-scaled towards larger dimensions without compromising the production and uniformity of the plasma.
    • 公开了一种用于产生用于等离子体处理和先进材料的合成的高密度,高度均匀的等离子体的装置。 所述设备包括反应室和室顶部,所述室顶部容纳两个相互垂直的等间隔的载流导体组合,其耦合到低频射频发生器。 产生两个初始相互垂直的单向振荡电流片和相对于两个电流片的方向在45°方位角偏移的时变电场。 产生的等离子体具有高密度,低电子温度,并且与具有外部扁平螺旋线圈的电感耦合等离子体的传统源相比,在大面积和体积上具有等离子体密度均匀性,电子温度和等离子体电位。 所提出的高度均匀等离子体生产的方法不依赖于昂贵的额外的磁偶极/多极限制。 该装置可以朝向更大的尺寸扩大,而不会影响等离子体的生产和均匀性。