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1. 发明申请

US20100173573A1 POLISHING PAD AND METHOD OF MANUFACTURING THE SAME 有权
标题翻译：抛光垫及其制造方法
公开(公告)号：US20100173573A1
公开(公告)日：2010-07-08
申请号：US12663155
申请日：2008-06-28
申请人： Won-Joon Kim , Yeong-Nam Hwang
发明人： Won-Joon Kim , Yeong-Nam Hwang
IPC分类号： B24D3/20 , B05D3/12
CPC分类号： B24B37/24
摘要： Disclosed are a polishing pad used in a CMP process of a planar material such as a silicon wafer, plate glass for a display, etc. and a method for manufacturing the same. The polishing pad comprises a non-woven fabric consisting of ultrafine fibers and elastomeric polymer impregnated into the fabric, on which the ultrafine fibers are raised and arranged to simultaneously satisfy the following conditions (I) to (III) such that the ultrafine fibers are oriented in a longitudinal direction to a central axis:The polishing pad of the present invention includes ultrafine fibers, which are arranged at a relatively wide orientation angle and have pores formed therebetween without requiring alternative processes for forming the pores, thus, exhibits excellent polishing performance and low occurrence of scratches during a polishing process.
摘要翻译：公开了用于诸如硅晶片，用于显示器的平板玻璃等的平面材料的CMP工艺中的抛光垫及其制造方法。抛光垫包括由超细纤维和浸渍到织物中的弹性体聚合物组成的无纺织物，超细纤维在其上升起并布置成同时满足以下条件（I）至（III），使得超细纤维取向在中心轴的纵向上：本发明的抛光垫包括超细纤维，其以相对宽的取向角度布置并且在其间形成孔，而不需要形成孔的替代方法，因此显示出优异的抛光性能和抛光过程中出现划痕少。

2. 发明授权

US5395693A Conjugated filament 失效
标题翻译：共轭长丝
公开(公告)号：US5395693A
公开(公告)日：1995-03-07
申请号：US82726
申请日：1993-06-28
申请人： Dae-hyun Cho , Won-joon Kim
发明人： Dae-hyun Cho , Won-joon Kim
IPC分类号： D01F8/04 , D01D5/36 , D01F8/12 , D01F8/14 , D06M11/00 , D06M11/38 , D06M101/00 , D06M101/16 , D06M101/30 , D06M101/32 , D06M101/34 , D02G3/00
CPC分类号： D01D5/36 , D01F8/12 , D01F8/14 , Y10T428/2924 , Y10T428/2929 , Y10T428/2931 , Y10T428/2973
摘要： A binary conjugated filament comprising one polymer component (A) and a polymer component (B) which is more soluble than polymer (A), the cross-sectional configuration of the filament being such that the polymer component (A) is divided into not less than five segments by the polymer component (B) and one of these segments is disposed in the center of the other segments, the areal center of the central segment residing on the line (r) in the range of: R/300.ltoreq.r.ltoreq.R/2 wherein R is the radius of the circular cross-section of the conjugated filament and r is the length from the areal center of the cross-section of the conjugated filament to the areal center of the segment disposed in the center of the other segments. The filament may be made into a woven or knitted fabric which is treated to remove the more soluble polymer component (B) to provide a fabric product exhibiting good handle characteristics.
摘要翻译：包含一种聚合物组分（A）和比聚合物（A）更易溶的聚合物组分（B））的二元共轭长丝，所述长丝的横截面构型使得聚合物组分（A）不少于聚合物组分（B）的五个链段和其中一个区段设置在其它区段的中心，中心区段的面积中心位于线（r）上，范围为：R / 300 < r

3. 发明授权

US08308531B2 Polishing pad and method of manufacturing the same 有权
标题翻译：抛光垫及其制造方法
公开(公告)号：US08308531B2
公开(公告)日：2012-11-13
申请号：US12663155
申请日：2008-06-28
申请人： Won-Joon Kim , Yeong-Nam Hwang
发明人： Won-Joon Kim , Yeong-Nam Hwang
IPC分类号： B24D11/00
CPC分类号： B24B37/24
摘要： Disclosed are a polishing pad used in a CMP process of a planar material such as a silicon wafer, plate glass for a display, etc. and a method for manufacturing the same. The polishing pad comprises a non-woven fabric consisting of ultrafine fibers and elastomeric polymer impregnated into the fabric, on which the ultrafine fibers are raised and arranged to simultaneously satisfy the following conditions (I) to (III) such that the ultrafine fibers are oriented in a longitudinal direction to a central axis:The polishing pad of the present invention includes ultrafine fibers, which are arranged at a relatively wide orientation angle and have pores formed therebetween without requiring alternative processes for forming the pores, thus, exhibits excellent polishing performance and low occurrence of scratches during a polishing process.
摘要翻译：公开了用于诸如硅晶片，用于显示器的平板玻璃等的平面材料的CMP工艺中的抛光垫及其制造方法。抛光垫包括由超细纤维和浸渍到织物中的弹性体聚合物组成的无纺织物，超细纤维在其上升起并布置成同时满足以下条件（I）至（III），使得超细纤维取向在中心轴的纵向上：本发明的抛光垫包括超细纤维，其以相对宽的取向角度布置并且在其间形成孔，而不需要形成孔的替代方法，因此显示出优异的抛光性能和抛光过程中出现划痕少。

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