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1. 发明授权

US07372645B2 Observation device 有权
标题翻译：观察装置
公开(公告)号：US07372645B2
公开(公告)日：2008-05-13
申请号：US10507118
申请日：2004-09-10
申请人： Sander Willem Van Schaik , Cornelis Johannes Janson
发明人： Sander Willem Van Schaik , Cornelis Johannes Janson
IPC分类号： G02B7/02
CPC分类号： G08B13/19619
摘要： An observation device includes a housing and an optical lens having a field of view. The housing includes an outer dome having at least one transparent portion and an inner dome. The optical lens is accommodated within the housing. The outer dome is transparent in the field of view of the lens and is configured to protect the lens. The observation device is resistant to impact by an object with a maximum impact energy of a first magnitude. A like observation device, but lacking an inner dome, is resistant to impact by the object with a maximum impact energy of a second magnitude. The ratio between the first magnitude and the second magnitude is at least 1.1.
摘要翻译：观察装置包括壳体和具有视野的光学透镜。壳体包括具有至少一个透明部分和内圆顶的外圆顶。光学透镜容纳在壳体内。外圆顶在透镜的视野中是透明的，并且被配置为保护透镜。观察装置耐受具有第一大小的最大冲击能量的物体的冲击。类似的观察装置，但缺乏内圆顶，抵抗物体的冲击，具有第二大的最大冲击能量。第一幅度与第二幅度之比至少为1.1。

2. 发明授权

US07115886B2 Lithographic projection apparatus, device manufacturing method and device manufactured thereby 有权
公开(公告)号：US07115886B2
公开(公告)日：2006-10-03
申请号：US10973250
申请日：2004-10-27
申请人： Willem Van Schaik , Bastiaan Matthias Mertens , Hans Meiling , Norbertus Benedictus Koster
发明人： Willem Van Schaik , Bastiaan Matthias Mertens , Hans Meiling , Norbertus Benedictus Koster
IPC分类号： G03F7/20
CPC分类号： G03F7/70925 , G03F7/70883 , G03F7/70933
摘要： In-situ cleaning of optical components for use in a lithographic projection apparatus can be carried out by irradiating a space within the apparatus containing the optical component with UV or EUV radiation having a wavelength of less than 250 nm, in the presence of molecular oxygen. Generally, the space will be purged with an ozoneless purge gas which contains a small amount of molecular oxygen in addition to the usual purge gas composition. The technique can also be used in an evacuated space by introducing a low pressure of molecular oxygen into the space.

3. 发明申请

US20050112508A1 Lithographic projection apparatus, device manufacturing method and device manufactured thereby 有权
标题翻译：平版印刷设备，装置制造方法和由此制造的装置
公开(公告)号：US20050112508A1
公开(公告)日：2005-05-26
申请号：US10973250
申请日：2004-10-27
申请人： Willem Van Schaik , Bastiaan Mertens , Hans Meiling , Norbertus Koster
发明人： Willem Van Schaik , Bastiaan Mertens , Hans Meiling , Norbertus Koster
IPC分类号： G02B17/00 , G03F7/20 , H01L21/027
CPC分类号： G03F7/70925 , G03F7/70883 , G03F7/70933
摘要： In-situ cleaning of optical components for use in a lithographic projection apparatus can be carried out by irradiating a space within the apparatus containing the optical component with UV or EUV radiation having a wavelength of less than 250 nm, in the presence of molecular oxygen. Generally, the space will be purged with an ozoneless purge gas which contains a small amount of molecular oxygen in addition to the usual purge gas composition. The technique can also be used in an evacuated space by introducing a low pressure of molecular oxygen into the space.
摘要翻译：用于光刻投影装置的光学部件的原位清洁可以通过在分子氧的存在下用包含波长小于250nm的UV或EUV辐射在含有光学部件的装置内照射空间来进行。通常，除了通常的清洗气体组合物之外，空间将被除去含有少量分子氧的无臭吹扫气体吹扫。该技术也可以通过将低分子氧引入该空间而在真空空间中使用。

4. 外观设计

USD476671S1 Observation/security camera 失效
公开(公告)号：USD476671S1
公开(公告)日：2003-07-01
申请号：US29153634
申请日：2002-01-11
申请人： Sander-Willem van Schaik , Peter John Doodson , Tom Philippe Jean Jacques Delaey
设计人： Sander-Willem van Schaik , Peter John Doodson , Tom Philippe Jean Jacques Delaey

5. 发明授权

US06538716B2 Lithographic apparatus, device manufacturing method, and device manufactured thereby 失效
公开(公告)号：US06538716B2
公开(公告)日：2003-03-25
申请号：US09866875
申请日：2001-05-30
申请人： Johannes Catharinus Hubertus Mulkens , Paul van der Veen , Willem van Schaik
发明人： Johannes Catharinus Hubertus Mulkens , Paul van der Veen , Willem van Schaik
IPC分类号： G03B2752
CPC分类号： G03F7/70933 , G03F7/70558 , G03F7/70883 , G03F7/70941
摘要： In a lithographic projection system using exposure radiation of 157 nm, compositions of gas, e.g. levels of oxygen and water vapor, are measured in regions traversed by the projection beam. The attenuation caused by said gases is predicted and the dose of radiation accumulated during an exposure, the uniformity and angular distribution of radiation energy delivered by said projection beam to a substrate during an exposure is controlled accordingly. The control may comprise a controlled supply of O2 to a volume traversed by the projection beam so as to effect a controlled attenuation of the projection beam. The O2 distribution may be non-uniform, e.g. to selectively filter spatially separated diffraction orders or to eliminate non-uniformity's in the projection beam.

6. 发明申请

US20130226022A1 Measurement Device for Lung Function Measurement 审中-公开
标题翻译：肺功能测量测量装置
公开(公告)号：US20130226022A1
公开(公告)日：2013-08-29
申请号：US13821501
申请日：2011-09-12
申请人： Roland Erwin John Marges , Sander Willem Van Schaik , Gerard Rudolf Riemens
发明人： Roland Erwin John Marges , Sander Willem Van Schaik , Gerard Rudolf Riemens
IPC分类号： A61B5/085 , A61B5/087
CPC分类号： A61B5/085 , A61B5/087 , A61B8/06 , A61B2503/04 , A61B2503/045
摘要： The invention comprises a measurement device for lung function measurement comprising a flow tube forming an air-flow path, an actuator for closing and opening the flow tube and at least one sensor for measuring at least one lung function variable, wherein the actuator is arranged to force the flow tube to close the air-flow path by pressing the tube against a wall of the flow tube.
摘要翻译：本发明包括用于肺功能测量的测量装置，包括形成气流路径的流管，用于关闭和打开流管的致动器和用于测量至少一个肺功能变量的至少一个传感器，其中致动器被布置成迫使流动管通过将管压靠在流管的壁上来封闭气流路径。

7. 发明授权

US07872666B2 Automatic polarizer for CCTV applications 有权
标题翻译：自动偏光片用于闭路电视应用
公开(公告)号：US07872666B2
公开(公告)日：2011-01-18
申请号：US11914797
申请日：2005-12-22
申请人： Sander-Willem Van Schaik , Jan Klijn , Peter Opmeer
发明人： Sander-Willem Van Schaik , Jan Klijn , Peter Opmeer
IPC分类号： H04N13/04 , G02B5/30 , G01J3/447
CPC分类号： G03B11/00 , G02B27/281 , G02B27/286 , H04N5/2254 , H04N5/33
摘要： The invention is related to a camera device (10) for CCTV applications. The camera device (10) comprises a sensor (12) comprising a lens (14) for monitoring the scene in front of the camera device (10). At least one polarizer element (16) is assigned to said sensor (12), the at least one polarizer element (16) being rotatably mounted with respect to said sensor (12), or said polarizer element (16) uses opto-electric effects.
摘要翻译：本发明涉及用于闭路电视应用的照相机装置（10）。相机装置（10）包括传感器（12），其包括用于监视相机装置（10）前面的场景的透镜（14）。至少一个偏振器元件（16）被分配给所述传感器（12），所述至少一个偏振器元件（16）相对于所述传感器（12）可旋转地安装，或者所述偏振器元件（16）使用光电效应。

8. 发明授权

US06924492B2 Lithographic apparatus, device manufacturing method, and device manufactured thereby 失效
标题翻译：平版印刷设备，器件制造方法和由此制造的器件
公开(公告)号：US06924492B2
公开(公告)日：2005-08-02
申请号：US10021296
申请日：2001-12-19
申请人： Willem Van Schaik
发明人： Willem Van Schaik
IPC分类号： G03F7/20 , H01L21/027 , A61N5/00 , G21G5/00 , G21K5/10
CPC分类号： G03F7/70925
摘要： Pre-cleaning or in situ cleaning of optical components for use in a lithographic projection apparatus can be carried out by irradiating the optical component with microwave and/or infra-red radiation, preferably infra-red radiation having a wavelength or a range of wavelengths in the range of from 1000 cm−1 to 4600 cm−1. This technique may be suitable for cleaning a mask. By monitoring the absorption of microwave and/or infra-red radiation directed at a contaminated optical component, the degree of contamination of said component can be qualified. This method may also be suitable for reducing the partial pressure of water in EUV apparatus.
摘要翻译：用于光刻投影装置的光学部件的预清洗或原位清洁可以通过用微波和/或红外辐射照射光学部件来进行，优选地是具有波长或波长范围的红外辐射范围从1000厘米-1到4600厘米-1之间。这种技术可能适合于清洁面罩。通过监测针对污染的光学部件的微波和/或红外辐射的吸收，所述部件的污染程度可以被限定。该方法也适用于降低EUV装置中的水分压。

9. 发明授权

US06828569B2 Lithographic projection apparatus, device manufacturing method and device manufactured thereby 有权
标题翻译：平版印刷设备，装置制造方法和由此制造的装置
公开(公告)号：US06828569B2
公开(公告)日：2004-12-07
申请号：US09988391
申请日：2001-11-19
申请人： Willem Van Schaik , Bastiaan Matthias Mertens , Hans Meiling , Norbertus Benedictus Koster
发明人： Willem Van Schaik , Bastiaan Matthias Mertens , Hans Meiling , Norbertus Benedictus Koster
IPC分类号： G21G500
CPC分类号： G03F7/70925 , G03F7/70883 , G03F7/70933
摘要： Cleaning of optical components for use in a lithographic projection apparatus can be carried out by irradiating a space within the apparatus containing the optical component with UV or EUV radiation having a wavelength of less than 250 nm, in the presence of an oxygen-containing species selected from water, nitrogen oxide and oxygen-containing hydrocarbons. Generally, the space will be purged with an ozone-less purge gas which contains a small amount of the oxygen-containing species in addition to the usual purge gas composition. The technique can also be used in an evacuated space by introducing a low pressure of the oxygen-containing species into the space.
摘要翻译：用于光刻投影装置的光学部件的清洁可以通过在选择的含氧物质的存在下，用波长小于250nm的UV或EUV辐射照射包含光学部件的装置内的空间来进行来自水，氮氧化物和含氧烃。通常，除了通常的吹扫气体组合物之外，空间将被含有少量含氧物质的无臭氧净化气体吹扫。该技术也可以通过将含氧物质的低压引入空间而用于抽空空间。

10. 发明授权

US06825914B2 System for flushing at least one internal space of an objective 失效
标题翻译：用于冲洗物镜的至少一个内部空间的系统
公开(公告)号：US06825914B2
公开(公告)日：2004-11-30
申请号：US10020561
申请日：2001-12-07
申请人： Joachim Schroeder , Gerald Richter , Dieter Schmerek , Uwe Schubert , Maria Johanna Agnes Rubingh , Willem van Schaik , Siebe Landheer
发明人： Joachim Schroeder , Gerald Richter , Dieter Schmerek , Uwe Schubert , Maria Johanna Agnes Rubingh , Willem van Schaik , Siebe Landheer
IPC分类号： G03B2752
CPC分类号： G03F7/70933 , G02B27/0006 , G03F7/70883
摘要： In a system for flushing at least one internal space of an objective, in particular an exposure projection objective for semiconductor lithography, flushing is performed by mixing at least two inert gasses in such a way that the refractive index resulting therefrom corresponds at least approximately to the refractive index of air.
摘要翻译：在用于冲洗物镜的至少一个内部空间的系统中，特别是用于半导体光刻的曝光投影物镜，通过混合至少两种惰性气体来进行冲洗，使得由其产生的折射率至少约为空气的折射率。

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