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    • 1. 发明申请
    • SIMPLE ROUTE FOR ALKALI METAL INCORPORATION IN SOLUTION-PROCESSED CRYSTALLINE SEMICONDUCTORS
    • 解决方案处理晶体半导体中碱金属的简单路径
    • US20120280362A1
    • 2012-11-08
    • US13516997
    • 2010-12-20
    • Yang YangWei-Jen HouSheng-Han LiChun-Chih Tung
    • Yang YangWei-Jen HouSheng-Han LiChun-Chih Tung
    • H01B1/10H01L29/12H01L21/20
    • H01L21/02551H01L21/02568H01L21/02628H01L31/0322H01L31/0725H01L31/0749H01L31/18Y02E10/541
    • A precursor solution for producing a semiconductor includes at least one of an alkali metal or an alkali metal compound dissolved in a solvent, and a metal chalcogenide dissolved in the solvent. A method of producing a precursor solution for a semiconductor includes preparing a first precursor solution that has at least one of an alkali metal or an alkali metal compound dissolved in a first solvent, preparing a second precursor solution that has a metal chalcogenide dissolved in a second solvent, and combining the first and second precursor solutions to obtain the precursor solution for producing the semiconductor. A method of producing a semiconductor device includes providing a precursor solution for producing a semiconductor layer on a substructure, and forming a layer of the precursor solution on the substructure. The precursor solution includes at least one of an alkali metal or an alkali metal compound dissolved in a solvent, and a metal chalcogenide dissolved in the solvent.
    • 用于制造半导体的前体溶液包括溶解在溶剂中的碱金属或碱金属化合物和溶解在溶剂中的金属硫族化物中的至少一种。 制备半导体前体溶液的方法包括制备具有溶解在第一溶剂中的碱金属或碱金属化合物中的至少一种的第一前体溶液,制备在第二溶剂中溶解有金属硫族化物的第二前体溶液 溶剂,并且将第一和第二前体溶液组合以获得用于制备半导体的前体溶液。 制造半导体器件的方法包括提供用于在子结构上制造半导体层的前体溶液,以及在子结构上形成前体溶液层。 前体溶液包括溶解在溶剂中的碱金属或碱金属化合物和溶解在溶剂中的金属硫族化物中的至少一种。