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    • 2. 发明授权
    • Apparatus for forming nano-grating device
    • 用于形成纳米光栅装置的装置
    • US07023593B2
    • 2006-04-04
    • US10801526
    • 2004-03-17
    • Yung-Hsin ChenWann-Ding TyanPong LaiYing-Tsung Lu
    • Yung-Hsin ChenWann-Ding TyanPong LaiYing-Tsung Lu
    • G03H1/04
    • B01D39/1692B01D39/12G02B5/1809G03F7/70408G03H2001/0497
    • An apparatus for forming a nano grating device to film nano-scale interference fringes by holography in order to makes a nano-scale meshed structure is disclosed. A beam emitted form a light source passes subsequently through a beam splitter and two reflectors to reach at symmetrically mounted light emitting modules. The light emitting modules generate two beams passing along the same optical paths and then projecting on a photosensitive substrate that is attached on a hemi-sphere lens. Thus, a first set of interference fringes are formed. Then, the substrate rotates with an angle and then is subjected to exposure to form a second set of interference fringes crossing the first set of interference fringes. Thereby, a nano-scale meshed structure is obtained.
    • 公开了一种用于形成纳米光栅装置以通过全息术来纳米尺度干涉条纹以形成纳米级网状结构的装置。 从光源发射的光束随后通过分束器和两个反射器,以到达对称安装的发光模块。 发光模块产生沿着相同光路通过的两束,然后在附着在半球透镜上的感光基底上投影。 因此,形成第一组干涉条纹。 然后,基板以一定角度旋转,然后进行曝光以形成与第一组干涉条纹交叉的第二组干涉条纹。 由此,得到纳米级网状结构体。