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    • 4. 发明申请
    • DIAMOND FILM DEPOSITION
    • 金刚石膜沉积
    • WO1993024676A1
    • 1993-12-09
    • PCT/GB1993001082
    • 1993-05-26
    • BRITISH TECHNOLOGY GROUP LTD.JOHN, PhillipWILSON, John, Ivor, BarrettDRUMMOND, Iain, Cameron
    • BRITISH TECHNOLOGY GROUP LTD.
    • C23C16/26
    • C23C16/274B24C3/32B24C5/08B24C11/00C23C16/0254
    • The invention provides an improved method and apparatus for pre-treating a substrate surface (19) to prepare it for subsequent deposition upon it of a film of diamond. The method of pre-treating a surface according to the invention comprises the steps of positioning a quantity of diamond dust (16) in relation to the surface, producing a shock wave in gas adjacent the dust, subjecting the dust to the shock wave, and thereby causing the diamond dust to impinge at high velocity on to the surface. The apparatus according to the invention comprises means for holding a charge of diamond dust (15), means for generating a shock wave in gas adjacent the charge of diamond dust (17), and means for directing the shock wave at the diamond dust (12) and causing the diamond dust to be expelled at high velocity for impingement on the substrate surface. The invention also provides a method depositing a diamond film on a substrate, including pre-treatment by the aforesaid method or apparatus.
    • 本发明提供了一种改进的方法和装置,用于预处理衬底表面(19)以准备其用于随后沉积在金刚石膜上。 根据本发明的预处理表面的方法包括以下步骤:相对于表面定位一定数量的金刚石粉尘(16),在靠近灰尘的气体中产生冲击波,使粉尘受到冲击波的影响;以及 从而使金刚石粉尘以高速撞击到表面。 根据本发明的装置包括用于保持金刚石粉尘(15)的装置的装置,用于在靠近金刚石粉尘(17)的充电的气体中产生冲击波的装置,以及用于将冲击波引导到金刚石粉尘(12) )并使金刚石粉尘以高速度排出以冲击衬底表面。 本发明还提供了一种在衬底上沉积金刚石膜的方法,包括通过前述方法或装置的预处理。