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    • 5. 发明申请
    • ANTIREFLECTIVE LAYER FOR USE IN MICROLITHOGRAPHY
    • 用于微结构的抗反射层
    • WO0244816A3
    • 2003-09-12
    • PCT/US0143437
    • 2001-11-21
    • DU PONTBERGER LARRY LCRAWFORD MICHAEL KARLFRENCH ROGER HARQUAILWHELAND ROBERT CLAYTONZUMSTEG FREDERICK CLAUS JR
    • BERGER LARRY LCRAWFORD MICHAEL KARLFRENCH ROGER HARQUAILWHELAND ROBERT CLAYTONZUMSTEG FREDERICK CLAUS JR
    • G03F7/11G03F7/004G03F7/09H01L21/027
    • G03F7/091G03F7/0046
    • An element having a support, and at least an antireflective layer; wherein the antireflective layer is prepared from a composition having a polymer selected from the group consisting of (a) a fluorine-containing copolymer comprising a repeat unit derived from at least one ethylenically unsaturated compound characterized in that at least one ethylenically unsaturated compound is polycyclic; (b) a branched polymer containing protected acid groups, said polymer comprising one or more branch segment(s) chemically linked along a linear backbone segment; (c) fluoropolymers having at least one fluoroalcohol group having the structure:-C(Rf)(Rf')OHwherein Rf and Rf' are the same or different fluoroalkyl groups of from 1 to about 10 carbon atoms or taken together are (CF2)n wherein n is 2 to 10; (d) amorphous vinyl homopolymers of perfluoro-2,2-dimethyl-1,3-dioxole or CX2=CY2, where X is -F, or -CF3 and Y is H, or amorphous vinyl copolymers of perfluoro-2,2-dimethyl-1,3-dioxole and CX2=CY2; (e) nitrile/fluoroalcohol-containing polymers prepared from substituted or unsubstituted vinyl ethers; and mixtures thereof.
    • 一种具有支撑体的元件和至少一个抗反射层; 其中所述抗反射层由具有选自以下的聚合物的组合物制备:(a)包含衍生自至少一种烯属不饱和化合物的重复单元的含氟共聚物,其特征在于至少一种烯属不饱和化合物是多环的; (b)含有保护的酸基团的支化聚合物,所述聚合物包含一个或多个沿着线性主链部分化学连接的支链段; (c)具有至少一个具有以下结构的氟代醇的含氟聚合物:具有以下结构的-C(R f)(R f')OH其中R f和R f'为相同或不同的具有1至约10个碳原子的氟代烷基或一起为(CF 2) n其中n为2至10; (d)全氟-2,2-二甲基-1,3-二氧杂环戊烯或CX2 = CY2的无定形乙烯基均聚物,其中X为-F或-CF 3且Y为H,或全氟-2,2-二甲基-1,3-二氧杂环戊烯的无定形乙烯基共聚物, 二甲基-1,3-二氧杂环戊烯和CX2 = CY2; (e)由取代或未取代的乙烯基醚制备的含腈/氟代醇的聚合物; 及其混合物。