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1. 发明专利

DE29706852U1 未知
公开(公告)号：DE29706852U1
公开(公告)日：1997-07-17
申请号：DE29706852
申请日：1997-04-16
申请人： WEBER ACHIM
IPC分类号： B65D1/22 , B67B7/16

2. 发明申请

WO2004104707A3 METHOD AND DEVICE FOR CLEANING AT LEAST ONE OPTICAL COMPONENT 审中-公开
标题翻译：方法和设备清洁至少光学元件
公开(公告)号：WO2004104707A3
公开(公告)日：2005-05-12
申请号：PCT/IB2004050734
申请日：2004-05-18
申请人： PHILIPS INTELLECTUAL PROPERTY , KONINKL PHILIPS ELECTRONICS NV , ZINK PETER , PANKERT JOSEPH , DERRA GUENTHER , WEBER ACHIM
发明人： ZINK PETER , PANKERT JOSEPH , DERRA GUENTHER , WEBER ACHIM
IPC分类号： B08B7/00 , G03F7/20 , G21K1/06 , G01N23/22
CPC分类号： G21K1/06 , B08B7/00 , B08B7/0057 , B82Y10/00 , G03F7/70166 , G03F7/70925 , G03F7/70941
摘要： The invention relates to a method for cleaning at least one optical component of at least one irradiation system comprising a vacuum chamber which contains at least one radiation source generating, in particular, far ultraviolet radiation and/or soft x-rays of which the rays are guided through said optical component and onto a workpiece. The optical component is at least partially soiled with an inorganic substance introduced by the radiation source. In said method, at least one reagent (124) substantially translucent or transparent to the rays (118) is added through a supply system (126), depending on the prevailing reaction conditions. The reagent chemically reacts with the soiling deposits (128) to remove them from the optical component (110).
摘要翻译：有清洁至少一个照射中的至少一个光学部件的方法，是指包含在真空室中的至少一个特定的极紫外和/或辐射，其光束通过光学部件到工件被定向到被加工，其中，所述的软X射线发生源光学部件是至少部分地由于由辐射源引入一个脏的，无机物质进行说明。为了这个目的，它提出了至少一个相对于所述光束（118）是经由进料装置采取基本上半透明的或透明的反应物（124）中时的普遍反应条件的依赖性（126），其中所述污染沉积物（128）为它们的去除的目的从光学部件（110）的化学反应。

3. 发明申请

WO2010004481A1 EXTREME UV RADIATION GENERATING DEVICE COMPRISING A CORROSION-RESISTANT MATERIAL 审中-公开
标题翻译：包含耐腐蚀材料的极紫外辐射发生装置
公开(公告)号：WO2010004481A1
公开(公告)日：2010-01-14
申请号：PCT/IB2009/052853
申请日：2009-07-01
申请人： PHILIPS INTELLECTUAL PROPERTY & STANDARDS GMBH , KONINKLIJKE PHILIPS ELECTRONICS N. V. , METZMACHER, Christof , WEBER, Achim
发明人： METZMACHER, Christof , WEBER, Achim
IPC分类号： H05G2/00
CPC分类号： H01J35/20 , H05G2/003 , H05G2/005
摘要： The invention relates to an improved EUV generating device having coated supply pipes for the liquid tin, in order to provide an extreme UV radiation generating device which is capable of providing a less contaminated flow of tin to and from a plasma generating part.
摘要翻译：本发明涉及一种改进的EUV产生装置，其具有用于液体锡的涂覆的供应管，以便提供极端的UV辐射产生装置，其能够提供较少的污染的来自等离子体产生部分的锡的流动。

4. 发明申请

WO2006136967A3 METHOD OF CLEANING OPTICAL SURFACES OF AN IRRADIATION UNIT IN A TWO-STEP PROCESS 审中-公开
标题翻译：在两步过程中清洁辐照单元的光学表面的方法
公开(公告)号：WO2006136967A3
公开(公告)日：2007-08-09
申请号：PCT/IB2006051814
申请日：2006-06-07
申请人： PHILIPS INTELLECTUAL PROPERTY , KONINKL PHILIPS ELECTRONICS NV , DERRA GUENTHER HANS , KRUECKEN THOMAS , METZMACHER CHRISTOF , WEBER ACHIM , ZINK PETER
发明人： DERRA GUENTHER HANS , KRUECKEN THOMAS , METZMACHER CHRISTOF , WEBER ACHIM , ZINK PETER
IPC分类号： G03F7/20
CPC分类号： B82Y10/00 , G03F7/70166 , G03F7/70916 , G03F7/70925
摘要： The present invention provides a method of cleaning optical surfaces in an irradiation unit in order to remove contaminations deposited on said optical surfaces. The method includes a cleaning step in which a first gas or gas mixture is brought into contact with said optical surfaces thereby forming a volatile compound with a first portion of said contaminations. In an operation pause of the irradiation unit prior to the cleaning step, a pretreatment step is performed, in which a second gas or gas mixture is brought into contact with said optical surfaces. Said second gas or gas mixture is selected to react with a second portion of said contaminations different from said first portion to form a reaction product, which is able to form a volatile compound with said first gas or gas mixture.
摘要翻译：本发明提供一种清洗照射单元中的光学表面以消除沉积在所述光学表面上的污染物的方法。该方法包括清洗步骤，其中第一气体或气体混合物与所述光学表面接触，从而形成具有所述污染物的第一部分的挥发性化合物。在清洁步骤之前的照射单元的操作暂停中，执行预处理步骤，其中第二气体或气体混合物与所述光学表面接触。选择所述第二气体或气体混合物与不同于所述第一部分的所述污染物的第二部分反应以形成能够与所述第一气体或气体混合物形成挥发性化合物的反应产物。

5. 发明申请

WO2003056336A2 VERBESSERTE STRUKTURIERT-FUNKTIONALE BINDEMATRICES FÜR BIOMOLEKÜLE 审中-公开
标题翻译：用于生物分子的改进的结构化功能性结合矩阵
公开(公告)号：WO2003056336A2
公开(公告)日：2003-07-10
申请号：PCT/EP2002/014769
申请日：2002-12-27
申请人： FRAUNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DER ANGEWANDTEN FORSCHUNG E.V. , WEBER, Achim , SCHIESTEL, Thomas , TOVAR, Günter , BRUNNER, Herwig , RUPP, Steffen , HAUSER, Nicole
发明人： WEBER, Achim , SCHIESTEL, Thomas , TOVAR, Günter , BRUNNER, Herwig , RUPP, Steffen , HAUSER, Nicole
IPC分类号： G01N33/543
CPC分类号： G01N33/54346 , B01J19/0046 , B01J2219/00382 , B01J2219/00427 , B01J2219/00466 , B01J2219/00527 , B01J2219/00605 , B01J2219/0061 , B01J2219/00612 , B01J2219/00617 , B01J2219/00626 , B01J2219/0063 , B01J2219/00635 , B01J2219/00637 , B01J2219/00644 , B01J2219/00648 , B01J2219/00659 , B82Y30/00 , C40B60/14 , G01N33/54393
摘要： Die vorliegende Erfindung betrifft Funktionselemente, die auf einem Träger angeordnete, biofunktionalisierten Nanopartikeln enthaltende Mikrostrukturen umfassen, Verfahren zur Herstellung dieser Funktionselemente sowie die Verwendung derselben.
摘要翻译：本发明涉及一种设置在载体上的功能元件，其包含含有生物官能化的微结构，从而使这些功能元件的方法，以及其用途的纳米颗粒。

6. 发明申请

WO2010007569A1 EXTREME UV RADIATION GENERATING DEVICE COMPRISING A CONTAMINATION CAPTOR 审中-公开
标题翻译：包含污染载体的极紫外辐射发生装置
公开(公告)号：WO2010007569A1
公开(公告)日：2010-01-21
申请号：PCT/IB2009/053009
申请日：2009-07-10
申请人： PHILIPS INTELLECTUAL PROPERTY & STANDARDS GMBH , KONINKLIJKE PHILIPS ELECTRONICS N. V. , METZMACHER, Christof , WEBER, Achim
发明人： METZMACHER, Christof , WEBER, Achim
IPC分类号： G03F7/20 , H05G2/00
CPC分类号： G03F7/70916 , G03F7/70033 , H05G2/003 , H05G2/005
摘要： The invention relates to an improved EUV generating device having a contamination captor for "catching" contamination and/or debris caused by corrosion or otherwise unwanted reactions of the tin bath.
摘要翻译：本发明涉及一种改进的EUV产生装置，其具有用于“捕获”由锡槽的腐蚀或其它不希望的反应引起的污染和/或碎屑的污染捕集器。

7. 发明申请

WO2009031094A1 LASER SCANNING PROJECTION DEVICE WITH EYE DETECTION UNIT 审中-公开
标题翻译：具有眼睛检测单元的激光扫描投影设备
公开(公告)号：WO2009031094A1
公开(公告)日：2009-03-12
申请号：PCT/IB2008/053538
申请日：2008-09-02
申请人： PHILIPS INTELLECTUAL PROPERTY & STANDARDS GMBH , KONINKLIJKE PHILIPS ELECTRONICS N.V. , RITZ, Arnd , WEBER, Achim , MOENCH, Holger , HOVING, Willem
发明人： RITZ, Arnd , WEBER, Achim , MOENCH, Holger , HOVING, Willem
IPC分类号： H04N9/31
CPC分类号： H04N9/3194 , H04N9/3129
摘要： The present invention relates to a projection device comprising at least one laser light source (2) and a scanning unit (7) arranged for scanning an external projection area (12) within a projection cone (11) with a laser beam (10) emitted from said laser light source (2). The projection device further comprises a detection unit (13) designed to detect the presence of an eye (23) in the projection cone (11) and a control unit (21) designed to lower a projection intensity of the laser beam (10) when an eye (23) is detected. The control unit (21) lowers the intensity only as long as the laser beam (10) scans over a limited region (24) around a detected position of the eye (23) and maintains the projection intensity of the laser beam (10) outside of said limited region (24) in said projection cone (11). The projection device allows a reliable protection of the eye of a person looking directly into the laser beam while the projected image is not significantly disturbed in such a case.
摘要翻译：本发明涉及一种投影装置，其包括至少一个激光光源（2）和扫描单元（7），扫描单元（7）被布置成用发射的激光束（10）扫描投影锥体（11）内的外部投影区域（12）来自所述激光光源（2）。投影装置还包括设计成检测投影锥体（11）中的眼睛（23）的存在的检测单元（13）和设计成降低激光束（10）的投影强度的控制单元（21）检测到眼睛（23）。只要激光束（10）围绕眼睛（23）的检测位置在有限区域（24）上扫描，控制单元（21）就降低强度，并将激光束（10）的投射强度保持在外在所述突出锥体（11）中的所述限制区域（24）。在这种情况下，投影装置允许可靠地保护直接进入激光束的人的眼睛，同时投影图像不被显着地干扰。

8. 发明申请

WO2008029315A2 METHOD OF CLEANING A SURFACE REGION COVERED WITH CONTAMINANT OR UNDESIRABLE MATERIAL 审中-公开
标题翻译：清洁覆盖有污染物或不可消耗材料的表面区域的方法
公开(公告)号：WO2008029315A2
公开(公告)日：2008-03-13
申请号：PCT/IB2007053410
申请日：2007-08-27
申请人： PHILIPS INTELLECTUAL PROPERTY , KONINKL PHILIPS ELECTRONICS NV , METZMACHER CHRISTOF , WEBER ACHIM
发明人： METZMACHER CHRISTOF , WEBER ACHIM
IPC分类号： B08B7/00 , G03F7/20
CPC分类号： G03F7/70933 , G03F7/70916 , G03F7/70925
摘要： The present invention relates to a method of cleaning a surface at least partly covered with contaminant or undesired material by applying atomic hydrogen. The invention also proposes an irradiation unit adapted to perform the cleaning method. In the present method the atomic hydrogen is generated by dissociation of molecular hydrogen directed to a surface containing catalytic material, which causes the dissociation of at least a part of the molecular hydrogen to atomic hydrogen. The surface with the catalytic material is arranged close to the surface to be cleaned and is dimensioned such that its total surface area is at least twice the surface area of the to be cleaned surface region. The method allows for the cleaning of the surface region in a constructive simple and efficient manner.
摘要翻译：本发明涉及通过施加原子氢来清洁至少部分被污染物或不期望的材料覆盖的表面的方法。本发明还提出了适于执行清洁方法的照射单元。在本方法中，通过分子氢的解离产生原子氢，所述分子氢指向含有催化材料的表面，这导致至少一部分分子氢离解成原子氢。具有催化材料的表面布置成靠近待清洁的表面，其尺寸使其总表面积至少要被清洁表面区域的表面积的两倍。该方法允许以建设性的简单和有效的方式清洁表面区域。

9. 发明申请

WO2006136967A2 METHOD OF CLEANING OPTICAL SURFACES OF AN IRRADIATION UNIT IN A TWO-STEP PROCESS 审中-公开
标题翻译：在两步过程中清洁辐照单元的光学表面的方法
公开(公告)号：WO2006136967A2
公开(公告)日：2006-12-28
申请号：PCT/IB2006/051814
申请日：2006-06-07
申请人： PHILIPS INTELLECTUAL PROPERTY & STANDARDS GMBH , KONINKLIJKE PHILIPS ELECTRONICS N. V. , DERRA, Guenther Hans , KRUECKEN, Thomas , METZMACHER, Christof , WEBER, Achim , ZINK, Peter
发明人： DERRA, Guenther Hans , KRUECKEN, Thomas , METZMACHER, Christof , WEBER, Achim , ZINK, Peter
CPC分类号： B82Y10/00 , G03F7/70166 , G03F7/70916 , G03F7/70925
摘要： The present invention provides a method of cleaning optical surfaces in an irradiation unit in order to remove contaminations deposited on said optical surfaces. The method includes a cleaning step in which a first gas or gas mixture is brought into contact with said optical surfaces thereby forming a volatile compound with a first portion of said contaminations. In an operation pause of the irradiation unit prior to the cleaning step, a pretreatment step is performed, in which a second gas or gas mixture is brought into contact with said optical surfaces. Said second gas or gas mixture is selected to react with a second portion of said contaminations different from said first portion to form a reaction product, which is able to form a volatile compound with said first gas or gas mixture.
摘要翻译：本发明提供一种清洗照射单元中的光学表面以消除沉积在所述光学表面上的污染物的方法。该方法包括清洗步骤，其中第一气体或气体混合物与所述光学表面接触，从而形成具有所述污染物的第一部分的挥发性化合物。在清洁步骤之前的照射单元的操作暂停中，执行预处理步骤，其中第二气体或气体混合物与所述光学表面接触。选择所述第二气体或气体混合物与不同于所述第一部分的所述污染物的第二部分反应以形成能够与所述第一气体或气体混合物形成挥发性化合物的反应产物。

10. 发明申请

WO2006072306A8 THREE-DIMENSIONAL NANOSTRUCTURED AND MICROSTRUCTURED SUPPORTS 审中-公开
标题翻译：三维纳米和微结构载体
公开(公告)号：WO2006072306A8
公开(公告)日：2006-11-30
申请号：PCT/EP2005012972
申请日：2005-12-03
申请人： FRAUNHOFER GES FORSCHUNG , UNIV STUTTGART , TOVAR GUENTER , BRUNNER HERWIG , WEBER ACHIM , BORCHERS KIRSTEN
发明人： TOVAR GUENTER , BRUNNER HERWIG , WEBER ACHIM , BORCHERS KIRSTEN
IPC分类号： G01N33/543
CPC分类号： G01N33/54346 , G01N33/54386
摘要： The invention relates to functional elements that comprise microstructures which are arranged on a support and contain bifunctionalized nanoparticles. The invention also relates to a method for producing the same and to the use thereof.
摘要翻译：本发明涉及包含微结构的功能元件，所述微结构包含载体上的含生物功能化纳米粒子的微结构，涉及用于生产这些功能元件的方法及其用途。

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