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    • 2. 发明授权
    • Antibacterial compositions
    • 抗菌组合物
    • US06429220B1
    • 2002-08-06
    • US09786291
    • 2001-03-01
    • Minoru YagiUrara Usui
    • Minoru YagiUrara Usui
    • A01N4380
    • A01N43/80A01N43/50A01N37/46A01N37/44A01N25/32A01N25/22A01N2300/00
    • An antimicrobial composition which comprises an isothiazolone compound, suppresses decomposition of the isothiazolone compound and reduces irritation of skin caused by the isothiazolone compound is provided. The antimicrobial composition comprises an isothiazolone compound of the following formula [1] or formula [2] and an aminocarboxylic acid of the following formula [3] or a derivative thereof: wherein R1 is hydrogen, alkyl, alkenyl, alkynyl or aralkyl; X and Y are each hydrogen, halogen or form a benzene ring with the carbon atoms at the 4- and 5-positions of the isothiazolone compound; M is a cation of an alkali metal, alkaline earth metal, heavy metal or amine; Z is an anion; a is 1 or 2; n is an integer; R2 is hydrogen or alkyl; R3 is C1-C5 alkylene; R4 is hydrogen or C1-C5 alkyl; R2 and R4 form a heterocyclic group; and b is 0 or 1.
    • 提供了包含异噻唑酮化合物的抗微生物组合物,抑制异噻唑酮化合物的分解并减少由异噻唑酮化合物引起的皮肤刺激。 抗微生物组合物包含下式[1]或式[2]的异噻唑酮化合物和下式[3]的氨基羧酸或其衍生物:其中R1是氢,烷基,烯基,炔基或芳烷基; X和Y各自为氢,卤素或与异噻唑酮化合物的4-和5-位碳原子形成苯环; M是碱金属,碱土金属,重金属或胺的阳离子; Z是阴离子; a是1或2; n是整数; R2是氢或烷基; R3是C1-C5亚烷基; R4是氢或C1-C5烷基; R2和R4形成杂环基; b为0或1。