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    • 2. 发明申请
    • SEMICONDUCTOR LASER
    • 半导体激光器
    • US20110128985A1
    • 2011-06-02
    • US12734665
    • 2008-10-17
    • Tsuguki NomaMiroru MurayamaSatoshi UchidaTsutomu Ishikawa
    • Tsuguki NomaMiroru MurayamaSatoshi UchidaTsutomu Ishikawa
    • H01S5/026
    • H01S5/223H01S5/221H01S5/2219H01S5/2227H01S5/2231H01S5/34326
    • Provided is a semiconductor laser which has a low operating current and stably oscillates even for high-temperature output. The semiconductor laser is provided with a substrate (10); an n-type clad layer (12) arranged on the substrate (10); an active layer (13) arranged on the n-type clad layer (12); a p-type clad layer (14), which is arranged on the active layer (13) and composed of a compound containing Al and has a stripe-shaped ridge structure to be a current channel; a current block layer (16), which is arranged on the surface of the p-clad layer (14) excluding an upper surface of the ridge structure and composed of a compound containing Al and has an Al composition ratio not more than that of the p-type clad layer (14); and a light absorption layer (17), which is arranged on the current block layer (16) and absorbs light at the laser oscillation wavelength.
    • 提供了即使对于高温输出也具有低工作电流并稳定地振荡的半导体激光器。 半导体激光器设置有基板(10); 布置在所述基板(10)上的n型覆盖层(12); 布置在所述n型覆层(12)上的有源层(13); p型覆盖层(14),其配置在有源层(13)上,由含有Al的化合物构成,具有条状的脊状结构成为电流通道; 布置在p包覆层(14)的表面上的电流阻挡层(16),除了脊结构的上表面,并且由含Al的化合物构成,Al组成比不大于 p型覆层(14); 以及布置在当前阻挡层(16)上并吸收激光振荡波长的光的光吸收层(17)。
    • 3. 发明申请
    • Semiconductor Laser Light Emitting Device and Method for Manufacturing Same
    • 半导体激光发光装置及其制造方法
    • US20090168824A1
    • 2009-07-02
    • US12083913
    • 2006-10-16
    • Tsuguki Noma
    • Tsuguki Noma
    • H01S5/00H01L21/00
    • H01S5/4025H01S5/4087
    • A semiconductor laser device 1 includes infrared and red laser elements 3, 4 provided on a substrate 2, where the infrared element 3 includes a laminate of a first lower clad layer 11, a first active layer 12 and a first upper clad layer 13, and the red element 4 includes a laminate of a second lower clad layer 21, a second active layer 22 and a second upper clad layer 23. The clad layer 11 includes a third lower clad layer 17 formed on the substrate 2, an etching stop layer 18 formed on the third lower clad layer 17, and a fourth lower clad layer 19 formed on the etching stop layer 18 at a region provided with the infrared element 3. The second lower clad layer 21 is formed on the etching stop layer 18 except at the region of the infrared element 3.
    • 半导体激光装置1包括设置在基板2上的红外线和红色激光元件3,4,其中红外线元件3包括第一下部包层11,第一有源层12和第一上部包层13的层叠体,以及 红色元件4包括第二下部包层21,第二有源层22和第二上部包层23的层叠体。包层11包括形成在基板2上的第三下部包层17,蚀刻停止层18 形成在第三下部包层17上的第四下部包覆层19以及在设置有红外线元件3的区域上形成在蚀刻停止层18上的第四下部包覆层19.第二下部包层21形成在蚀刻停止层18上, 红外元件3的区域。
    • 4. 发明授权
    • Semiconductor laser
    • 半导体激光器
    • US09099841B2
    • 2015-08-04
    • US12734665
    • 2008-10-17
    • Tsuguki NomaMiroru MurayamaSatoshi UchidaTsutomu Ishikawa
    • Tsuguki NomaMiroru MurayamaSatoshi UchidaTsutomu Ishikawa
    • H01S5/00H01S5/223H01S5/22
    • H01S5/223H01S5/221H01S5/2219H01S5/2227H01S5/2231H01S5/34326
    • Provided is a semiconductor laser which has a low operating current and stably oscillates even for high-temperature output. The semiconductor laser is provided with a substrate (10); an n-type clad layer (12) arranged on the substrate (10); an active layer (13) arranged on the n-type clad layer (12); a p-type clad layer (14), which is arranged on the active layer (13) and composed of a compound containing Al and has a stripe-shaped ridge structure to be a current channel; a current block layer (16), which is arranged on the surface of the p-clad layer (14) excluding an upper surface of the ridge structure and composed of a compound containing Al and has an Al composition ratio not more than that of the p-type clad layer (14); and a light absorption layer (17), which is arranged on the current block layer (16) and absorbs light at the laser oscillation wavelength.
    • 提供了即使对于高温输出也具有低工作电流并稳定地振荡的半导体激光器。 半导体激光器设置有基板(10); 布置在所述基板(10)上的n型覆盖层(12); 布置在所述n型覆层(12)上的有源层(13); p型覆盖层(14),其配置在有源层(13)上,由含有Al的化合物构成,具有条状的脊状结构成为电流通道; 布置在p包覆层(14)的表面上的电流阻挡层(16),除了脊结构的上表面,并且由含Al的化合物构成,Al组成比不大于 p型覆层(14); 以及布置在当前阻挡层(16)上并吸收激光振荡波长的光的光吸收层(17)。
    • 5. 发明授权
    • Semiconductor laser light emitting device and method for manufacturing same
    • 半导体激光发光器件及其制造方法
    • US07860138B2
    • 2010-12-28
    • US12083913
    • 2006-10-16
    • Tsuguki Noma
    • Tsuguki Noma
    • H01S5/00
    • H01S5/4025H01S5/4087
    • A semiconductor laser device 1 includes infrared and red laser elements 3, 4 provided on a substrate 2, where the infrared element 3 includes a laminate of a first lower clad layer 11, a first active layer 12 and a first upper clad layer 13, and the red element 4 includes a laminate of a second lower clad layer 21, a second active layer 22 and a second upper clad layer 23. The clad layer 11 includes a third lower clad layer 17 formed on the substrate 2, an etching stop layer 18 formed on the third lower clad layer 17, and a fourth lower clad layer 19 formed on the etching stop layer 18 at a region provided with the infrared element 3. The second lower clad layer 21 is formed on the etching stop layer 18 except at the region of the infrared element 3.
    • 半导体激光装置1包括设置在基板2上的红外线和红色激光元件3,4,其中红外线元件3包括第一下部包层11,第一有源层12和第一上部包层13的层叠体,以及 红色元件4包括第二下部包层21,第二有源层22和第二上部包层23的层叠体。包层11包括形成在基板2上的第三下部包层17,蚀刻停止层18 形成在第三下部包层17上的第四下部包覆层19以及在设置有红外线元件3的区域上形成在蚀刻停止层18上的第四下部包覆层19.第二下部包层21形成在蚀刻停止层18上,除了 红外元件3的区域。
    • 7. 发明申请
    • SEMICONDUCTOR LASER LIGHT EMITTING DEVIDE AND METHOD FOR MANUFACTURING SAME
    • 半导体激光发光器件及其制造方法
    • US20110064104A1
    • 2011-03-17
    • US12949327
    • 2010-11-18
    • Tsuguki NOMA
    • Tsuguki NOMA
    • H01S5/30H01S5/323
    • H01S5/4025H01S5/4087
    • A semiconductor laser device 1 includes infrared and red laser elements 3, 4 provided on a substrate 2, where the infrared element 3 includes a laminate of a first lower clad layer 11, a first active layer 12 and a first upper clad layer 13, and the red element 4 includes a laminate of a second lower clad layer 21, a second active layer 22 and a second upper clad layer 23. The clad layer 11 includes a third lower clad layer 17 formed on the substrate 2, an etching stop layer 18 formed on the third lower clad layer 17, and a fourth lower clad layer 19 formed on the etching stop layer 18 at a region provided with the infrared element 3. The second lower clad layer 21 is formed on the etching stop layer 18 except at the region of the infrared element 3.
    • 半导体激光装置1包括设置在基板2上的红外线和红色激光元件3,4,其中红外线元件3包括第一下部包层11,第一有源层12和第一上部包层13的层叠体,以及 红色元件4包括第二下部包层21,第二有源层22和第二上部包层23的层叠体。包层11包括形成在基板2上的第三下部包层17,蚀刻停止层18 形成在第三下部包层17上的第四下部包覆层19以及在设置有红外线元件3的区域上形成在蚀刻停止层18上的第四下部包覆层19.第二下部包层21形成在蚀刻停止层18上, 红外元件3的区域。
    • 9. 发明授权
    • Semiconductor laser device
    • 半导体激光器件
    • US08699536B2
    • 2014-04-15
    • US13323785
    • 2011-12-12
    • Tsuguki NomaMinoru AkutsuYoshito Nishioka
    • Tsuguki NomaMinoru AkutsuYoshito Nishioka
    • H01S5/00
    • H01S5/3434B82Y20/00H01S5/2031H01S5/22H01S5/3202H01S5/3213H01S5/3404H01S5/3436H01S2301/145H01S2301/173
    • A semiconductor laser device capable of high output is provided. A semiconductor laser diode includes: a substrate; and a semiconductor stacked structure, which is formed on the substrate through crystal growth. The semiconductor stacked structure includes: an n-type (Alx1Ga(1-x1))0.51In0.49P cladding layer and a p-type (Alx1Ga(1-x1))0.51In0.49P cladding layer; an n-side Alx2Ga(1-x2)As guiding layer and a p-side Alx2Ga(1-x2)As guiding layer, which are sandwiched between the cladding layers; and an active layer, which is sandwiched between the guiding layers. The active layer is formed of a quantum well layer including an AlyGa(1-y)As(1-x3)Px3 layer and a barrier layer including an Alx4Ga(1-x4)As layer that are alternatively repetitively stacked for a plurality of periods.
    • 提供能够高输出的半导体激光装置。 半导体激光二极管包括:基板; 以及通过晶体生长形成在基板上的半导体层叠结构。 半导体堆叠结构包括:n型(Al x Ga 1-x 1)0.51In0.49P包层和p型(Al x Ga 1-x 1)0.51 In 0.49P包层; 夹在包层之间的n侧Alx2Ga(1-x2)As导向层和p侧Alx2Ga(1-x2)As导向层; 以及夹在引导层之间的有源层。 活性层由包括Al y Ga(1-y)As(1-x 3)P x 3层和包含Al x 4 Ga(1-x 4)As层)的势垒层的量子阱层形成,该层的重叠堆叠多个周期 。