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    • 1. 发明申请
    • Aberration correcting optical system
    • 畸变校正光学系统
    • US20060056038A1
    • 2006-03-16
    • US11268697
    • 2005-11-08
    • Toshiyuki Yoshihara
    • Toshiyuki Yoshihara
    • G02B3/00
    • G03F7/70483G02B5/3083G02B27/0025G03F7/70308G03F7/706
    • A projection system for projecting a pattern of a mask onto a substrate. The projection system includes a projection optical system disposed between the mask and the substrate, and an optical element for correcting aberration produced in the projection optical system. The optical element has different refracting powers in two orthogonal directions or has a refracting power in one direction of two orthogonal directions and no refracting power in the other of the two orthogonal directions. The optical element is disposed between the mask and the substrate, in which an optical axis of the optical element is inclined with respect to an optical axis of the projection optical system.
    • 一种用于将掩模图案投影到基底上的投影系统。 投影系统包括设置在掩模和基板之间的投影光学系统和用于校正在投影光学系统中产生的像差的光学元件。 光学元件在两个正交方向上具有不同的折射能力,或者在两个正交方向的一个方向上具有折射能,而在两个正交方向上的折射能力不相同。 光学元件设置在掩模和基板之间,光学元件的光轴相对于投影光学系统的光轴倾斜。
    • 2. 发明授权
    • Aberration correction optical system
    • 畸变校正光学系统
    • US06987621B2
    • 2006-01-17
    • US10936797
    • 2004-09-09
    • Toshiyuki Yoshihara
    • Toshiyuki Yoshihara
    • G02B3/00G02B9/00G02B13/08
    • G03F7/70483G02B5/3083G02B27/0025G03F7/70308G03F7/706
    • A projection system for projecting a pattern of a mask onto a substrate. The projection system includes a projection optical system disposed between the mask and the substrate, and an optical element for correcting aberration produced in the projection optical system. The optical element has different refracting powers in two orthogonal directions or has a refracting power in one direction of two orthogonal directions and no refracting power in the other of the two orthogonal directions. The optical element is disposed between the mask and the substrate. An optical axis of the optical element is inclined with respect to an optical axis of the projection optical system.
    • 一种用于将掩模图案投影到基底上的投影系统。 投影系统包括设置在掩模和基板之间的投影光学系统和用于校正在投影光学系统中产生的像差的光学元件。 光学元件在两个正交方向上具有不同的折射能力,或者在两个正交方向的一个方向上具有折射能,而在两个正交方向上的折射能力不相同。 光学元件设置在掩模和基板之间。 光学元件的光轴相对于投影光学系统的光轴倾斜。