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    • 4. 发明申请
    • TOP PLATE FOR COOKING DEVICE
    • 烹饪设备的顶板
    • US20110117346A1
    • 2011-05-19
    • US13002989
    • 2009-06-13
    • Koji IkegamiToshimasa Kanai
    • Koji IkegamiToshimasa Kanai
    • B32B7/02B32B17/06
    • H05B6/1209B32B7/02C03C17/3435C03C17/3482F24C15/10Y10T428/24975
    • To provide a top plate for a cooking device which has low transmittance in a visible wavelength range and high transmittance in an infrared wavelength range of 3500 nm to 4000 nm. A top plate 1 for a cooking device includes: a glass substrate 10; and a layered coating 2 made of a Si film 11 and a silicon nitride film 12 which are formed on the glass substrate 10. Where t1 represents the thickness of the Si film 11 and t2 represents the thickness of the silicon nitride film 12, (t1, t2) in FIG. 1 showing the relation between the thickness t1 of the Si film and the thickness t2 of the silicon nitride film is within the bounds X defined by connecting Points A1 to A36 shown in TABLE 1 in this order with straight lines.
    • 提供一种用于烹饪装置的顶板,其在可见波长范围内具有低透射率,并且在3500nm至4000nm的红外波长范围内具有高透射率。 用于烹饪装置的顶板1包括:玻璃基板10; 以及形成在玻璃基板10上的由Si膜11和氮化硅膜12构成的层叠膜2,其中,t1表示Si膜11的厚度,t2表示氮化硅膜12的厚度,(t1 ,t2)。 图1示出了Si膜的厚度t1和氮化硅膜的厚度t2之间的关系在由表1所示的连接点A1至A36定义的范围X内,其顺序为直线。
    • 7. 发明授权
    • Top plate for cooking device
    • 烹饪设备顶板
    • US08834994B2
    • 2014-09-16
    • US13002989
    • 2009-06-13
    • Koji IkegamiToshimasa Kanai
    • Koji IkegamiToshimasa Kanai
    • B32B7/02B32B17/06H05B6/12C03C17/34
    • H05B6/1209B32B7/02C03C17/3435C03C17/3482F24C15/10Y10T428/24975
    • To provide a top plate for a cooking device which has low transmittance in a visible wavelength range and high transmittance in an infrared wavelength range of 3500 nm to 4000 nm. A top plate 1 for a cooking device includes: a glass substrate 10; and a layered coating 2 made of a Si film 11 and a silicon nitride film 12 which are formed on the glass substrate 10. Where t1 represents the thickness of the Si film 11 and t2 represents the thickness of the silicon nitride film 12, (t1, t2) in FIG. 1 showing the relation between the thickness t1 of the Si film and the thickness t2 of the silicon nitride film is within the bounds X defined by connecting Points A1 to A36 shown in TABLE 1 in this order with straight lines.
    • 提供一种用于烹饪装置的顶板,其在可见波长范围内具有低透射率,并且在3500nm至4000nm的红外波长范围内具有高透射率。 用于烹饪装置的顶板1包括:玻璃基板10; 以及形成在玻璃基板10上的由Si膜11和氮化硅膜12构成的层叠膜2,其中,t1表示Si膜11的厚度,t2表示氮化硅膜12的厚度,(t1 ,t2)。 图1示出了Si膜的厚度t1和氮化硅膜的厚度t2之间的关系在由表1所示的连接点A1至A36定义的范围X内,其顺序为直线。
    • 10. 发明申请
    • BROADBAND REFLECTING MIRROR
    • 宽带反光镜
    • US20110096391A1
    • 2011-04-28
    • US12997612
    • 2009-06-30
    • Toshimasa KanaiTakeshi Sakurai
    • Toshimasa KanaiTakeshi Sakurai
    • G02B5/28
    • G02B5/0825F24S23/77F24S23/79F24S23/82F24S2023/86Y02E10/40
    • To provide a broadband reflecting mirror having high reflectance within a wavelength band of 400 nm to 2500 nm and having excellent thermal resistance and damage resistance. A broadband reflecting mirror 1 for reflecting light within a wavelength band of 400 nm to 2500 nm includes: a first reflective layered coating 3 for reflecting light in a short wavelength side of the wavelength band of 400 nm to 2500 nm, the first reflective layered coating including first high-refractive index material and first low-refractive index material layers alternately stacked one on another; and a second reflective layered coating 4 for reflecting light in a long wavelength side of the wavelength band of 400 nm to 2500 nm, the second reflective layered coating including second high-refractive index material and second low-refractive index material layers alternately stacked one on another, wherein the first reflective layered coating 3 is disposed on the light-incident side of the broadband reflecting mirror and the second reflective layered coating 4 is disposed at a position where light having passed through the first reflective layered coating 3 can be reflected, and wherein the first high-refractive index material layer is formed of at least one material selected from the group consisting of niobium oxide, titanium oxide, zirconium oxide, tantalum oxide, hafnium oxide, silicon nitride, yttrium oxide and indium tin oxide, the first low-refractive index material layer is formed of at least one material selected from the group consisting of silicon oxide and magnesium fluoride, the second high-refractive index material layer is formed of at least one material selected from the group consisting of silicon and germanium, and the second low-refractive index material layer is formed of at least one material selected from the group consisting of silicon oxide and magnesium fluoride.
    • 提供在400nm至2500nm的波长带内具有高反射率的宽带反射镜并具有优异的耐热性和耐损伤性。 用于反射400nm至2500nm的波长带内的光的宽带反射镜1包括:用于反射400nm至2500nm的波长带的短波长侧的光的第一反射层叠膜3,第一反射层叠膜 包括彼此交替堆叠的第一高折射率材料和第一低折射率材料层; 以及第二反射分层涂层4,用于反射400nm至2500nm的波长带的长波长侧的光,第二反射层叠涂层包括第二高折射率材料和第二低折射率材料层, 另一方面,其中第一反射层叠涂层3设置在宽带反射镜的光入射侧,第二反射层叠涂层4设置在能够反射通过第一反射层叠涂层3的光的位置, 其中所述第一高折射率材料层由选自氧化铌,氧化钛,氧化锆,氧化钽,氧化铪,氮化硅,氧化钇和氧化铟锡中的至少一种材料形成,所述第一低折射率材料层 折射率材料层由选自氧化硅和镁流感的至少一种材料形成 所述第二高折射率材料层由选自硅和锗的至少一种材料形成,并且所述第二低折射率材料层由选自下列的至少一种材料形成:硅 氧化物和氟化镁。