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    • 3. 发明申请
    • METHOD FOR PRODUCING METAL THIN FILM
    • 生产金属薄膜的方法
    • US20120103222A1
    • 2012-05-03
    • US13346051
    • 2012-01-09
    • Masanobu TanakaHirotsugu IshiharaToshiki ShimamuraTakahiro Kamei
    • Masanobu TanakaHirotsugu IshiharaToshiki ShimamuraTakahiro Kamei
    • B41F1/16
    • H05K3/207H05K3/046H05K3/182H05K2203/0108H05K2203/0709H05K2203/074
    • A method for producing a metal thin film on a substrate includes: a step of applying an ink to a flat blanket; a first transfer step of bringing the first blanket and a letterpress having a predetermined pattern of projections into contact by a pressure compression while the flat blanked and the letterpress being disposed opposite each other, to selectively transfer a portion of the ink on the flat blanket corresponding to the projections to the letterpress; a second transfer step of bringing the flat blanket obtained after the first transfer step and the substrate into contact by pressure compression while the flat blanket and the substrate being disposed opposite each other, to transfer the ink remaining on the flat blanket to the substrate; and a step of subjecting the substrate obtained after the second transfer step to electroless plating to deposit a metal thin film on the substrate.
    • 在基板上制造金属薄膜的方法包括:将油墨涂敷到平铺毯上的步骤; 第一转印步骤,当平面冲裁和凸版相互相对地设置时,使第一层毯和具有预定图案的凸起的凸版通过压力压缩接触,以选择性地将平均毯上的一部分油墨对应 对凸版的预测; 第二转印步骤,其中使第一转印步骤后得到的平铺毯和基板通过压力压缩接触,同时平铺橡皮布和基板彼此相对地设置,以将残留在平板上的墨转移到基板上; 以及将在第二转印步骤之后获得的基板进行无电镀以在基板上沉积金属薄膜的步骤。