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1. 发明申请

US20130126733A1 Charged Particle Beam Microscope 有权
标题翻译：带电粒子束显微镜
公开(公告)号：US20130126733A1
公开(公告)日：2013-05-23
申请号：US13812899
申请日：2011-08-08
申请人： Muneyuki Fukuda , Naomasa Suzuki , Tomoyasu Shojo , Noritsugu Takahashi , Hiroshi Suzuki , Hiroshi Makino
发明人： Muneyuki Fukuda , Naomasa Suzuki , Tomoyasu Shojo , Noritsugu Takahashi , Hiroshi Suzuki , Hiroshi Makino
IPC分类号： H01J37/26
CPC分类号： H01J37/263 , G01N23/22 , H01J37/222 , H01J37/28
摘要： This charged particle beam microscope is characterized by being provided with selection means (153, 155) for a measurement processing method for detected particles (118) and by this means selecting a different measurement processing method for a scanning region with a large number of secondary electrons (115) emitted from a sample (114) and for a region with a small number of secondary electrons. Thus, in sample scanning using a charged particle beam microscope, an image in which the contrast of bottom holes and channel bottoms with few emitted secondary electrons is emphasized and images that emphasize shadow contrast can be acquired in a short period of time.
摘要翻译：该带电粒子束显微镜的特征在于设置有用于检测粒子（118）的测量处理方法的选择装置（153,155），并且通过这种方式为具有大量二次电子的扫描区域选择不同的测量处理方法（114）和二次电子数量少的区域（115）。因此，在使用带电粒子束显微镜的样本扫描中，强调了具有较少发射的二次电子的底部孔和通道底部的对比度的图像，并且可以在短时间内获取强调阴影对比度的图像。

2. 发明授权

US08207498B2 Electron beam apparatus and electron beam inspection method 失效
标题翻译：电子束装置和电子束检查方法
公开(公告)号：US08207498B2
公开(公告)日：2012-06-26
申请号：US12985633
申请日：2011-01-06
申请人： Muneyuki Fukuda , Tomoyasu Shojo , Mitsugu Sato , Atsuko Fukada , Naomasa Suzuki , Ichiro Tachibana
发明人： Muneyuki Fukuda , Tomoyasu Shojo , Mitsugu Sato , Atsuko Fukada , Naomasa Suzuki , Ichiro Tachibana
IPC分类号： H01J37/28
CPC分类号： H01J37/28 , H01J37/244 , H01J2237/221 , H01J2237/2444 , H01J2237/2448 , H01J2237/24485 , H01J2237/2449 , H01J2237/24495
摘要： An electron beam apparatus which includes a sample stage on which a sample is placed, and an electron optical system. The electron optical system includes an electron gun that generates a primary electron beam, an immersion objective lens that converges the primary electron beam on the sample, an ExB deflector that separates a secondary particle, which is generated from irradiation of the primary beam to the sample, from an optical axis of the primary beam, a reflecting member to which the secondary particle collides, an assist electrode which is located under the reflecting member, a plurality of incidental particle detectors that selectively detect a velocity component and an azimuth component of a ternary particle which is generated by the secondary particle colliding to the reflecting member, and a center detector that is located above the reflecting member.
摘要翻译：一种电子束装置，包括放置样品的样品台和电子光学系统。电子光学系统包括产生一次电子束的电子枪，将一次电子束收敛在样品上的浸没物镜，将一次束照射产生的二次粒子分离为样品的ExB偏转器从一次光束的光轴，二次粒子碰撞的反射部件，位于反射部件下方的辅助电极，多个附带的粒子检测器，其选择性地检测三元的速度分量和方位分量由二次粒子与反射部件碰撞而产生的粒子和位于反射部件上方的中心检测器。

3. 发明申请

US20080099673A1 Electron Beam Apparatus and Electron Beam Inspection Method 有权
标题翻译：电子束设备和电子束检测方法
公开(公告)号：US20080099673A1
公开(公告)日：2008-05-01
申请号：US11877715
申请日：2007-10-24
申请人： Muneyuki Fukuda , Tomoyasu Shojo , Mitsugu Sato , Atsuko Fukada , Naomasa Suzuki , Ichiro Tachibana
发明人： Muneyuki Fukuda , Tomoyasu Shojo , Mitsugu Sato , Atsuko Fukada , Naomasa Suzuki , Ichiro Tachibana
IPC分类号： G21K5/10
CPC分类号： H01J37/28 , H01J37/244 , H01J2237/221 , H01J2237/2444 , H01J2237/2448 , H01J2237/24485 , H01J2237/2449 , H01J2237/24495
摘要： The present invention provides a charged-particle beam inspection technology that enables to acquire a shadow contrast enhanced image, and to detect a shallow roughness with sufficient sensitively, which is caused by a micro-scale or nano-scale foreign matter in an inspection of a semiconductor device having a circuit pattern or the like. Immersion objective lens is employed as an objective lens for the high-resolution observation. A converged electron beam is obtained due to the objective lens. An assist electrode, a right detector and a left detector are provided in the objective lens. A velocity component of a secondary electron caused by the irradiation of the sample with an electron beam is discriminated. An azimuth component is further discriminated.
摘要翻译：本发明提供了一种带电粒子束检查技术，其能够获得阴影对比度增强图像，并且在检查中由微尺度或纳米级异物引起的足够敏感地检测浅的粗糙度具有电路图案等的半导体器件。浸入式物镜被用作用于高分辨率观察的物镜。由于物镜得到会聚的电子束。辅助电极，右检测器和左检测器设置在物镜中。鉴别由电子束照射样品引起的二次电子的速度分量。进一步鉴别方位分量。

4. 发明授权

US08405026B2 Charged particle beam apparatus 有权
标题翻译：带电粒子束装置
公开(公告)号：US08405026B2
公开(公告)日：2013-03-26
申请号：US12554275
申请日：2009-09-04
申请人： Tomoyasu Shojo , Muneyuki Fukuda , Naomasa Suzuki , Noritsugu Takahashi
发明人： Tomoyasu Shojo , Muneyuki Fukuda , Naomasa Suzuki , Noritsugu Takahashi
IPC分类号： H01J3/14 , G01N23/00
CPC分类号： H01J37/153 , H01J37/04 , H01J37/28
摘要： Disclosed herewith is a charged particle beam apparatus capable of controlling each of the probe current and the objective divergence angle to obtain a desired probe current and a desired objective divergence angle in accordance with the diameter of the subject objective aperture. The apparatus is configured to include an objective aperture between first and second condenser lenses to calculate and set a control value of a first condenser lens in accordance with the diameter of the hole of the objective aperture so as to obtain a desired probe current and calculate a control value of a second condenser lens setting device in accordance with the diameter of the hole of the objective divergence angle and the control value of the second condenser lens setting device, thereby setting the calculated control value for the second condenser lens setting device to control the objective divergence angle.
摘要翻译：本文公开了一种带电粒子束装置，其能够根据目标物镜孔径来控制探针电流和物镜发散角度，以获得所需的探针电流和期望的物体发散角。该装置被配置为在第一和第二聚光透镜之间包括物镜孔，以根据物镜孔的直径来计算和设置第一聚光透镜的控制值，以获得所需的探针电流，并计算根据目标发散角的孔的直径和第二聚光透镜设定装置的控制值的第二聚光透镜设定装置的控制值，由此设定计算出的第二聚光透镜设定装置的控制值，客观发散角。

5. 发明申请

US20120261574A1 Electron Beam Apparatus and Electron Beam Inspection Method 有权
标题翻译：电子束设备和电子束检测方法
公开(公告)号：US20120261574A1
公开(公告)日：2012-10-18
申请号：US13530797
申请日：2012-06-22
申请人： Muneyuki Fukuda , Tomoyasu Shojo , Mitsugu Sato , Atsuko Fukada , Naomasa Suzuki , Ichiro Tachibana
发明人： Muneyuki Fukuda , Tomoyasu Shojo , Mitsugu Sato , Atsuko Fukada , Naomasa Suzuki , Ichiro Tachibana
IPC分类号： H01J37/26
CPC分类号： H01J37/28 , H01J37/244 , H01J2237/221 , H01J2237/2444 , H01J2237/2448 , H01J2237/24485 , H01J2237/2449 , H01J2237/24495
摘要： An electron beam apparatus which includes a sample stage on which a sample is placed, and an electron optical system. The electron optical system includes an electron gun that generates a primary electron beam, an immersion objective lens that converges the primary electron beam on the sample, an E×B deflector that separates a secondary particle, which is generated from irradiation of the primary beam to the sample, from an optical axis of the primary beam, a reflecting member to which the secondary particle collides, an assist electrode which is located under the reflecting member, a plurality of incidental particle detectors that selectively detect a velocity component and an azimuth component of a ternary particle which is generated by the secondary particle colliding to the reflecting member, and a center detector that is located above the reflecting member.
摘要翻译：一种电子束装置，包括放置样品的样品台和电子光学系统。电子光学系统包括：电子枪，其产生一次电子束，将一次电子束收敛在样品上的浸没物镜;将主光束照射产生的二次粒子分离的E×B偏转器; 来自主光束的光轴的样品，二次粒子碰撞的反射部件，位于反射部件下方的辅助电极，多个附带的粒子检测器，其选择性地检测速度分量和方位分量由二次粒子与反射部件碰撞产生的三元粒子，以及位于反射部件上方的中心检测器。

6. 发明授权

US07557347B2 Charged particle beam apparatus, scanning electron microscope, and sample observation method using the same 有权
标题翻译：带电粒子束装置，扫描电子显微镜和使用其的样品观察方法
公开(公告)号：US07557347B2
公开(公告)日：2009-07-07
申请号：US11882701
申请日：2007-08-03
申请人： Tomoyasu Shojo , Muneyuki Fukuda , Naomasa Suzuki
发明人： Tomoyasu Shojo , Muneyuki Fukuda , Naomasa Suzuki
IPC分类号： G01N23/00 , G21K7/00
CPC分类号： H01J37/244 , H01J37/153 , H01J37/28 , H01J2237/057 , H01J2237/2448 , H01J2237/24485 , H01J2237/2449 , H01J2237/24592
摘要： A charged particle beam apparatus for acquiring high-definition and highly contrasted observation images by detecting efficiently secondary signals without increasing aberration of the primary electron beam, detecting defects from observation images and thus increasing the inspection speed and enhancing the sensitivity of inspection. The desired area of the sample is scanned with a primary charged particle beam, and the secondary charged particles generated secondarily from the area by the irradiation of the primary charged particle beam are led to collide with the secondary electron conversing electrode, and then the secondary electrons generated by the first E×B deflector 31 arranged through an insulator on the surface of the secondary electron conversing electrode on the side of the sample is absorbed by the detector. At the same time, the deflection chromatic aberration that had been generated in the primary charged particle beam by the first E×B deflector is reduced by the second E×B deflector arranged on the first E×B deflector, to obtain high-definition and highly contrasted observation images free of shading.
摘要翻译：一种带电粒子束装置，用于通过高效检测二次信号而不增加一次电子束的像差，从观察图像中检测缺陷，从而提高检查速度，提高检查灵敏度，从而获取高分辨率和高对比度的观察图像。用初级带电粒子束扫描样品的期望面积，并且通过初级带电粒子束的照射从该区域二次生成的二次带电粒子被引导与二次电子转换电极碰撞，然后二次电子由通过检测器侧面上的二次电子转换电极的表面上的绝缘体布置的第一ExB偏转器31产生的。同时，通过布置在第一ExB偏转器上的第二ExB偏转器减少由第一ExB偏转器在一次带电粒子束中产生的偏转色差，以获得高清晰度和高对比度的观察图像，阴影。

7. 发明授权

US08841612B2 Charged particle beam microscope 有权
标题翻译：带电粒子束显微镜
公开(公告)号：US08841612B2
公开(公告)日：2014-09-23
申请号：US13812899
申请日：2011-08-08
申请人： Muneyuki Fukuda , Naomasa Suzuki , Tomoyasu Shojo , Noritsugu Takahashi , Hiroshi Suzuki , Hiroshi Makino
发明人： Muneyuki Fukuda , Naomasa Suzuki , Tomoyasu Shojo , Noritsugu Takahashi , Hiroshi Suzuki , Hiroshi Makino
IPC分类号： G01N23/00 , H01J23/00 , H01J37/26 , H01J37/22 , H01J37/28 , G01K7/00 , G01N23/22
CPC分类号： H01J37/263 , G01N23/22 , H01J37/222 , H01J37/28
摘要： This charged particle beam microscope is characterized by being provided with selection means (153, 155) for a measurement processing method for detected particles (118) and by this means selecting a different measurement processing method for a scanning region with a large number of secondary electrons (115) emitted from a sample (114) and for a region with a small number of secondary electrons. Thus, in sample scanning using a charged particle beam microscope, an image in which the contrast of bottom holes and channel bottoms with few emitted secondary electrons is emphasized and images that emphasize shadow contrast can be acquired in a short period of time.
摘要翻译：该带电粒子束显微镜的特征在于设置有用于检测粒子（118）的测量处理方法的选择装置（153,155），并且通过这种方式为具有大量二次电子的扫描区域选择不同的测量处理方法（114）和二次电子数量少的区域（115）。因此，在使用带电粒子束显微镜的样本扫描中，强调了具有较少发射的二次电子的底部孔和通道底部的对比度的图像，并且可以在短时间内获取强调阴影对比度的图像。

8. 发明授权

US08467595B2 Defect review system and method, and program 有权
标题翻译：缺陷审查制度和方法，程序
公开(公告)号：US08467595B2
公开(公告)日：2013-06-18
申请号：US13056353
申请日：2009-07-27
申请人： Noritsugu Takahashi , Muneyuki Fukuda , Tomoyasu Shojo , Naomasa Suzuki , Kenji Obara
发明人： Noritsugu Takahashi , Muneyuki Fukuda , Tomoyasu Shojo , Naomasa Suzuki , Kenji Obara
IPC分类号： G06K9/00
CPC分类号： G06T7/0004 , G06T2207/10061 , G06T2207/30148 , H01J37/265 , H01J37/28 , H01J2237/2811 , H01J2237/2817 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： A system is provided that realizes both reduction in coordinate error and improvement in throughput and allows observation of a micro-defect. The system includes: a function of measuring an amount of displacement between preliminarily calculated coordinates and an actual specimen position; a function of optimizing a coordinate correction formula so as to minimize the amount of displacement from the measured amount of displacement; and a function of calculating variation of displacement between the preliminarily calculated coordinates and the actual specimen position by statistical processing. When a value of coordinate variation is sufficiently small with respect to the field of view of an image for observation, which is to be a defect observation image, the system acquires only the image for observation without performing acquisition of an image for search, which is to be a defect search image.
摘要翻译：提供一种系统，其实现了坐标误差的降低和吞吐量的提高，并且允许观察微缺陷。该系统包括：测量预先计算的坐标与实际样本位置之间的位移量的功能; 优化坐标校正公式的功能，以使从所测量的位移量中的位移量最小化; 以及通过统计处理来计算预先计算的坐标与实际样本位置之间的位移变化的功能。当相对于作为缺陷观察图像的观察用图像的视场的坐标变化量足够小时，系统仅获取用于观察的图像，而不进行用于搜索的图像的获取，其是成为缺陷搜索图像。

9. 发明申请

US20120119087A1 CHARGED-PARTICLE MICROSCOPE 审中-公开
标题翻译：充电颗粒显微镜
公开(公告)号：US20120119087A1
公开(公告)日：2012-05-17
申请号：US13386717
申请日：2010-07-13
申请人： Noritsugu Takahashi , Muneyuki Fukuda , Manabu Yano , Hirohiko Kitsuki , Kazunari Asao , Tomoyasu Shojo
发明人： Noritsugu Takahashi , Muneyuki Fukuda , Manabu Yano , Hirohiko Kitsuki , Kazunari Asao , Tomoyasu Shojo
IPC分类号： H01J37/28
CPC分类号： H01J37/28 , H01J37/10 , H01J37/145 , H01J37/21 , H01J2237/2817
摘要： A charged-particle-beam device is characterized in having a control value for an aligner coil (29) being determined by: a coil current and an electrode applied-voltage at a control value for objectives (30, 31), which is an electromagnetic-field superposition lens; a control value for image-shift coils (27, 28); and the acceleration voltage of the charged-particle-beam. By doing this, it has become possible to avoid image disturbances that occur on images to be displayed at boundaries between charged areas and non-charged areas, and provide a charged-particle-beam device that obtains clear images without any unevenness in brightness.
摘要翻译：带电粒子束装置的特征在于具有对准线圈（29）的控制值，通过以下方式确定：线圈电流和用于物镜（30,31）的控制值的电极施加电压，其为电磁场叠加透镜; 图像转换线圈（27,28）的控制值; 和带电粒子束的加速电压。通过这样做，可以避免在充电区域和非充电区域之间的边界处显示图像上出现的图像干扰，并且提供获得清晰图像而没有任何亮度不均匀的带电粒子束装置。

10. 发明申请

US20110101223A1 Electron Beam Apparatus And Electron Beam Inspection Method 失效
标题翻译：电子束和电子束检测方法
公开(公告)号：US20110101223A1
公开(公告)日：2011-05-05
申请号：US12985633
申请日：2011-01-06
申请人： Muneyuki Fukuda , Tomoyasu Shojo , Mitsugu Sato , Atsuko Fukada , Naomasa Suzuki , Ichiro Tachibana
发明人： Muneyuki Fukuda , Tomoyasu Shojo , Mitsugu Sato , Atsuko Fukada , Naomasa Suzuki , Ichiro Tachibana
IPC分类号： G01N23/00 , G01N23/22
CPC分类号： H01J37/28 , H01J37/244 , H01J2237/221 , H01J2237/2444 , H01J2237/2448 , H01J2237/24485 , H01J2237/2449 , H01J2237/24495
摘要： An electron beam apparatus which includes a sample stage on which a sample is placed, and an electron optical system. The electron optical system includes an electron gun that generates a primary electron beam, an immersion objective lens that converges the primary electron beam on the sample, an ExB deflector that separates a secondary particle, which is generated from irradiation of the primary beam to the sample, from an optical axis of the primary beam, a reflecting member to which the secondary particle collides, an assist electrode which is located under the reflecting member, a plurality of incidental particle detectors that selectively detect a velocity component and an azimuth component of a ternary particle which is generated by the secondary particle colliding to the reflecting member, and a center detector that is located above the reflecting member.
摘要翻译：一种电子束装置，包括放置样品的样品台和电子光学系统。电子光学系统包括产生一次电子束的电子枪，将一次电子束收敛在样品上的浸没物镜，将一次束照射产生的二次粒子分离为样品的ExB偏转器从一次光束的光轴，二次粒子碰撞的反射部件，位于反射部件下方的辅助电极，多个附带的粒子检测器，其选择性地检测三元的速度分量和方位分量由二次粒子与反射部件碰撞而产生的粒子和位于反射部件上方的中心检测器。

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