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1. 发明授权

US06245250B1 Process vessel 失效
标题翻译：加工容器
公开(公告)号：US06245250B1
公开(公告)日：2001-06-12
申请号：US09262991
申请日：1999-03-05
申请人： Tom Krawzak , Victor Mimken , Rod Fladwood , Wyland Atkins
发明人： Tom Krawzak , Victor Mimken , Rod Fladwood , Wyland Atkins
IPC分类号： C23G102
CPC分类号： H01L21/67253 , B08B3/048 , B08B3/12 , H01L21/67051 , H01L21/67057 , Y10S134/902
摘要： A process vessel which may be utilized in wet processing of semiconductor wafers includes a tank having one or more fluid displacers attachable to the tank. The one or more fluid displacer(s) have position in which they extend into the interior of the tank. The fluid displacers may be carried by a lid moveable into a closed position covering the opening in the tank. Movement of the lid into the closed position causes the fluid displacers to extend into the tank.
摘要翻译：可用于半导体晶片湿法处理的处理容器包括具有一个或多个可连接到罐的流体置换器的罐。一个或多个流体置换器具有它们延伸到罐的内部的位置。流体置换器可以由可移动到覆盖罐中的开口的关闭位置的盖子承载。盖子移动到关闭位置使得液体置换器延伸到罐中。

2. 发明授权

US5744716A Fluid displacement level, density and concentration measurement system 失效
标题翻译：流体位移水平，密度和浓度测量系统
公开(公告)号：US5744716A
公开(公告)日：1998-04-28
申请号：US660642
申请日：1996-06-07
申请人： Victor B. Mimken , Sergey A. Velichko , Tom Krawzak
发明人： Victor B. Mimken , Sergey A. Velichko , Tom Krawzak
IPC分类号： G01F23/00 , G01N9/20 , G01N9/12
CPC分类号： G01N9/20 , G01F23/0038 , G01F23/0053
摘要： A method and apparatus for monitoring characteristics of a fluid contained in a vessel includes a pair of triangular fluid displacers suspended in the vessel. The buoyant forces acting on the fluid displacers are measured using force transducers and used to calculate fluid characteristics such as the height of the fluid in the vessel, fluid density, solute concentration, and/or the presence of fluid cascading from one section of the vessel to another.
摘要翻译：用于监测容纳在容器中的流体的特性的方法和装置包括悬挂在容器中的一对三角形流体置换器。使用力传感器测量作用在流体置换器上的浮力，并用于计算流体特性，例如容器中的流体的高度，流体密度，溶质浓度和/或从容器的一个部分流出的流体的存在到另一个

3. 发明授权

US06286688B1 Compliant silicon wafer handling system 失效
标题翻译：符合硅晶片处理系统
公开(公告)号：US06286688B1
公开(公告)日：2001-09-11
申请号：US08825883
申请日：1997-04-02
申请人： Victor B. Mimken , Tom Krawzak
发明人： Victor B. Mimken , Tom Krawzak
IPC分类号： B65G4907
CPC分类号： H01L21/67259 , H01L21/67265 , H01L21/67313 , H01L21/67326 , Y10S414/137
摘要： A compliant wafer comb assembly for use in transferring semiconductor wafers between wafer cassettes, wafer carriers, or other wafer holding devices. The compliant wafer comb includes a plurality of slots in which wafer(s) can be held while being transported. The slots are parallel to each other and downward sloping from one end of the comb to the other. The sloped arrangement causes a single wafer at a time to become engaged with the comb when a batch of wafers is transferred from a cassette or wafer holding device to the comb, allowing the compliant features of the comb to compensate for the misalignment of each wafer individually. The comb is coupled to a static base structure by a set of independent column springs which permit motion of the comb slots in any direction necessary to compensate for a wafer's misalignment. This permits transfer of a misaligned wafer or wafers from a cassette or other carrier to the comb without damaging the wafer(s). The present invention is also directed to a wafer handling system which includes the compliant comb and sensor(s) for monitoring when a wafer is severely enough misaligned that transfer to the comb would damage the wafer. In such a situation, a feedback signal generated by the sensor to an attached controller is used to alter the position of a robotic arm or other mechanism used to align the comb with respect to the wafers, or to halt the motion of the robot.
摘要翻译：用于在晶片盒，晶片载体或其它晶片保持装置之间转移半导体晶片的柔性晶片梳组件。柔性晶片梳包括多个槽，其中晶片可以在被输送的同时被保持。槽彼此平行并且从梳子的一端向另一端向下倾斜。当一批晶片从盒或晶片保持装置转移到梳子时，倾斜的布置导致单个晶片一次与梳状物接合，从而允许梳子的柔顺特征单独地补偿每个晶片的未对准。梳子通过一组独立的柱形弹簧耦合到静态基座结构，这些弹簧允许梳状槽的运动在补偿晶片的未对准所需的任何方向上。这允许将未对准的晶片或晶片从盒或其它载体转移到梳而不损坏晶片。本发明还涉及一种晶片处理系统，其包括柔性梳状物和传感器，用于在晶片严重足够不对准时进行监测，转移到梳子将损坏晶片。在这种情况下，由传感器产生的附加控制器的反馈信号用于改变用于将梳子相对于晶片对准的机器人臂或其它机构的位置，或者停止机器人的运动。

4. 发明授权

US5847276A Fluid displacement level, density and concentration measurement system 失效
标题翻译：流体位移水平，密度和浓度测量系统
公开(公告)号：US5847276A
公开(公告)日：1998-12-08
申请号：US962126
申请日：1997-10-31
申请人： Victor B. Mimken , Sergey A. Velichko , Tom Krawzak
发明人： Victor B. Mimken , Sergey A. Velichko , Tom Krawzak
IPC分类号： G01F23/00 , G01N9/20 , G01N9/12
CPC分类号： G01N9/20 , G01F23/0038 , G01F23/0053
摘要： A method and apparatus for monitoring characteristics of a fluid contained in a vessel includes a fluid displacer suspended in the vessel. The buoyant force acting on the fluid displacer is measured using a pair of force transducers and used to calculate fluid characteristics such as the height of the fluid in the vessel, fluid density, solute concentration, and/or the presence of fluid cascading from one section of the vessel to another.
摘要翻译：用于监测容纳在容器中的流体的特性的方法和装置包括悬浮在容器中的流体置换器。使用一对力换能器测量作用在流体置换器上的浮力，并用于计算流体特性，例如容器中流体的高度，流体密度，溶质浓度和/或从一个部分流出的流体的存在的船只到另一个。

5. 发明授权

US6136724A Multiple stage wet processing chamber 失效
标题翻译：多级湿处理室
公开(公告)号：US6136724A
公开(公告)日：2000-10-24
申请号：US25612
申请日：1998-02-18
申请人： Eric T. Hansen , William Warren Becia , Thomas Wayne Ives , Victor B. Mimken , Randy Mark Hall , Tom Krawzak
发明人： Eric T. Hansen , William Warren Becia , Thomas Wayne Ives , Victor B. Mimken , Randy Mark Hall , Tom Krawzak
IPC分类号： B08B3/04 , B08B3/10 , B08B15/02 , H01L21/00 , H01L21/302
CPC分类号： H01L21/67057 , B08B15/02 , B08B3/04 , B08B3/10
摘要： An apparatus and method for performing multiple wet processing steps on objects placed within a sealed chamber. The apparatus include a sealable chamber, at least one processing tank within the chamber, and preferably also includes an intrachamber robot configured to move objects to be treated within the chamber. Preferred embodiments utilize at least two processing tanks within the chamber. During use of these exemplary embodiments, objects to be treated are placed within the sealed chamber and the chamber is sealed to create a sealed interior environment. The objects are immersed in a first treatment fluid which is in a first one of the tanks, and then carried by the intrachamber robot from the first to the second tank where there are immersed in a second treatment fluid in the second tank. The objects may be moved back and forth between the tanks as needed in order to complete the process being performed. After processing is complete, the chamber is unsealed and the objects are removed from the chamber. In a preferred method, processing fluids are drained from the tanks at some point prior to the unsealing of the chamber in order to substantially prevent passage of fumes to the outside environment or contaminants from the exterior environment.
摘要翻译：对放置在密封室内的物体进行多个湿法处理步骤的装置和方法。该装置包括可密封的腔室，腔室内的至少一个处理槽，并且优选地还包括构造成移动待处理腔室内的物体的腔内机器人。优选实施例在腔室内利用至少两个处理罐。在这些示例性实施例的使用期间，要处理的物体被放置在密封室内，并且将腔室密封以产生密封的内部环境。将物体浸入位于第一罐中的第一处理流体中，然后由腔室内机器人从第一罐至第二罐中携带，在第二槽中浸入第二处理流体。物体可以根据需要在罐之间来回移动，以便完成正在执行的过程。处理完成后，腔室被开封，物体从腔室中取出。在优选的方法中，处理流体在腔室开封之前的某个时间从罐中排出，以便基本上防止烟雾通向外部环境或来自外部环境的污染物。

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