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    • 3. 发明授权
    • Electrochemical thin-film transistor
    • 电化学薄膜晶体管
    • US07952090B2
    • 2011-05-31
    • US12155707
    • 2008-06-09
    • Thomas Kugler
    • Thomas Kugler
    • H01L51/30
    • G02F1/163G02F2001/1635G09G3/38H01L51/055
    • An electrochemical transistor comprising an electrolyte is disclosed. The electrolyte includes an ionic liquid. In a preferred embodiment, the transistor further comprises a source electrode, a drain electrode separated from the source electrode so as to form a gap between the source and drain electrodes, a semiconductor layer bridging the gap between the source and drain electrodes to form a transistor channel, and a gate electrode separated from the source electrode, the drain electrode and the semiconductor layer. In this embodiment, the electrolyte is disposed so as to contact at least a part of both the semiconductor layer and the gate electrode.
    • 公开了一种包含电解质的电化学晶体管。 电解质包括离子液体。 在优选实施例中,晶体管还包括源电极,与源电极分离的漏电极,以在源极和漏极之间形成间隙;桥接源电极和漏电极之间的间隙的半导体层,以形成晶体管 沟道,以及与源电极,漏电极和半导体层分离的栅电极。 在该实施例中,电解质被设置成与半导体层和栅电极的至少一部分接触。
    • 6. 发明授权
    • Method for fabricating a semiconductor element from a dispersion of semiconductor particles
    • 从半导体粒子的分散体制造半导体元件的方法
    • US07517719B2
    • 2009-04-14
    • US11125138
    • 2005-05-10
    • Thomas KuglerChristopher NewsomeDavid RusselShunpu Li
    • Thomas KuglerChristopher NewsomeDavid RusselShunpu Li
    • H01L51/40
    • H01L21/02568H01L21/0256H01L21/02576H01L21/02579H01L21/02601H01L21/02628H01L51/0003H01L51/0037H01L51/0053H01L51/007H01L51/0545
    • Provided is a method for forming a semiconductor element such as film. The method comprises the steps of: (i) depositing a suspension of particles of a first semiconductor and a solution of a second semiconductor or a precursor thereof on a surface of a substrate such that a mixture comprising the particles of the first semiconductor suspended in a liquid phase comprising the second semiconductor or precursor thereof results thereon; and (ii) solidifying the mixture to form the semiconductor element comprising particles of the first semiconductor in a matrix of the second semiconductor which electrically connects adjacent particles of the first semiconductor, the first and second semiconductors being of the same conductivity type and being formed from either the same or different materials. The method does not require any step of vacuum deposition or sintering.Also provided is a semiconductor element itself. The element comprises semiconductor particles in a matrix of a semiconductor binder that has the same conductivity type as the semiconductor particles and which is the same or a different material than that forming the particles, the semiconductor binder electrically connecting adjacent semiconductor particles.
    • 提供了一种形成诸如膜的半导体元件的方法。 该方法包括以下步骤:(i)将第一半导体和第二半导体或其前体的溶液的悬浮液沉积在基板的表面上,使得包含悬浮在基板中的第一半导体颗粒的混合物 在其上产生包含第二半导体或其前体的液相; 和(ii)固化所述混合物以形成所述半导体元件,所述半导体元件包括所述第二半导体的矩阵中的所述第一半导体的粒子,所述第二半导体的矩阵电连接所述第一半导体的相邻颗粒,所述第一和第二半导体具有相同的导电类型,并且由 相同或不同的材料。 该方法不需要真空沉积或烧结的任何步骤。 还提供了半导体元件本身。 该元件包括半导体粘合剂的基质中的半导体颗粒,其具有与半导体颗粒相同的导电类型,并且与形成颗粒的材料相同或不同,所述半导体粘结剂将相邻的半导体颗粒电连接。
    • 10. 发明授权
    • Patterning method for fabricating high resolution structures
    • 用于制造高分辨率结构的图案化方法
    • US07439193B2
    • 2008-10-21
    • US11320582
    • 2005-12-30
    • Shunpu LiChristopher NewsomeDavid RussellThomas Kugler
    • Shunpu LiChristopher NewsomeDavid RussellThomas Kugler
    • H01L21/00
    • H01L21/0338H01L21/0272H01L21/0331H01L21/0337H01L21/3086H01L21/3088H01L21/31144H01L27/1292H01L27/285H01L51/0021H01L51/0036H01L51/0516H01L51/0541H01L51/105
    • Provided is a patterning method capable of fabricating high resolution structures without using a high resolution patterning step. The method comprises the steps of: (i) pre-patterning a layer of material (12) on a substrate (10), (ii) spin-coating a solution of a film-forming substance over the pre-patterned substrate, (iii) drying the spin-coated solution to form a film (14) of the film-forming substance on the unpatterned areas of the substrate and on the surface and sides of the pre-patterned material, (iv) etching the dried film in such a way that it remains only around the sides of the pre-patterned material, and (v) removing the pre-patterned material to leave ridges (20) of the film-forming substance on the substrate, the pattern of the ridges corresponding to the outline of the pre-patterned material.A metal layer may then be deposited on the resulting patterned substrate followed by removal of the ridges leaving discrete areas of metal which form latent source and drain electrodes of a thin film transistor. An array of thin film transistors may then be formed by selectively depositing areas of semiconductor, insulator and conductor, the latter forming a gate electrode associated with each pair of source and drain electrodes.
    • 提供了一种能够在不使用高分辨率图案化步骤的情况下制造高分辨率结构的图案化方法。 该方法包括以下步骤:(i)在衬底(10)上预先图案化材料层(12),(ii)在预图案化衬底上旋涂成膜物质的溶液,(iii) )干燥旋转涂覆的溶液以在基底的未图案区域和预图案化材料的表面和侧面上形成成膜物质的膜(14),(iv)将这样的干燥膜蚀刻 它仅保留在预图案化材料的侧面周围,并且(v)去除预先图案化的材料以将成膜物质的脊(20)留在衬底上,对应于轮廓的脊的图案 的预图案材料。 然后可以在所得到的图案化衬底上沉积金属层,然后去除留下形成薄膜晶体管的潜在源极和漏极的离散的金属区域的脊。 然后可以通过选择性地沉积半导体,绝缘体和导体的区域来形成薄膜晶体管阵列,后者形成与每对源极和漏极电极相关联的栅电极。