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    • 6. 发明授权
    • Method of making a lithographic printing plate
    • 制作平版印刷版的方法
    • US4175964A
    • 1979-11-27
    • US804481
    • 1977-06-07
    • Toshio UchidaYorimiti YabutaTeppei Ikeda
    • Toshio UchidaYorimiti YabutaTeppei Ikeda
    • G03F7/00B41N3/03G03C11/12G03C1/94G03C5/00
    • B41N3/038
    • A light-sensitive lithographic printing plate element suitable for the formation of negative and positive images, simultaneously, comprising a hydrophilic support having, in succession, a light-sensitive composition layer and a transparent cover film in which images for printing are formed by imagewise exposing through the cover film and peeling apart to remove, together with the cover film, the areas having a stronger adhesion to the cover film in the light-sensitive composition layer by utilizing the difference in adhesion to the support and to the cover film between the exposed areas and the unexposed areas of the light-sensitive composition layer, whereby the areas of the light-sensitive composition layer having a stronger adhesion to the support remain on the support, wherein the surface of the support adjacent the light-sensitive composition layer is treated with an aqueous solution containing at least one water soluble oxygen acid or water soluble oxygen acid salt selected from the group consisting of boric acid, boric acid salts, molybdic acids, molybdic acids salts, phosphoric acids, phosphoric acid salts, vanadic acids, vanadic acid salts, tungstic acids, tungstic acid salts, chromic acid, chromic acid salts, silicic acids and silicic acid salts.
    • 一种适用于形成负像和正图像的感光平版印刷版元件,同时包含亲水性支持体,其依次具有感光组合物层和透明覆盖膜,其中通过图像曝光形成印刷图像 通过覆盖膜并剥离,通过利用与支撑体的粘合力差和曝光的覆盖膜与覆盖膜一起去除光敏组合物层中的覆盖膜更强的粘附性的区域 区域和感光组合物层的未曝光区域,由此对支持体具有更强粘附性的感光组合物层的区域保留在支撑体上,其中处理与感光组合物层相邻的支撑体的表面被处理 含有至少一种选自水溶性氧酸或水溶性氧酸盐的水溶液 由硼酸,硼酸盐,钼酸,钼酸盐,磷酸,磷酸盐,钒酸,钒酸盐,钨酸,钨酸盐,铬酸,铬酸盐,硅酸和硅酸组成的组 酸盐。
    • 10. 发明授权
    • Image forming process with photopolymer layers between a support and a
substrate
    • 在载体和基底之间的光聚合物层的成像方法
    • US4050936A
    • 1977-09-27
    • US645148
    • 1975-12-29
    • Keiji TakedaMasataka MurataTeppei Ikeda
    • Keiji TakedaMasataka MurataTeppei Ikeda
    • G03F7/004G03C1/00G03F7/095G03F7/26G03F7/34H05K3/00H05K3/06G03C11/12G03C5/00
    • G03F7/0955H05K3/0073H05K3/064
    • An image forming process which comprises image-wise exposing a photosensitive material to light, the photosensitive material comprising a support and a substrate with a photopolymerizable material therebetween, and stripping off the support to leave either exposed areas or non-exposed areas of the photopolymerizable material on the substrate, in which the photopolymerizable material is characterized by comprising at least two different photopolymerizable layers which each comprise one or more addition polymerizable monomers, one or more photopolymerization initiators and one or more binders, which photopolymerizable layers are placed adjacent the support and the substrate, wherein at least one of the ingredients or the ratio of the ingredients of the photopolymerizable layers is different in at least the two different photopolymerizable layers, and the photopolymerizable layers have the relationship of C>A>B and C'>B'>A' or C>B>A and C'>A'>B', wherein:A is the adhesive strength between the support and the photopolymerizable layer adjacent thereto;B is the adhesive strength between the substrate and the photopolymerizable layer adjacent thereto;C is the lowest adhesive strength of all the adhesive strengthes between any two photopolymerizable layers among the layers, A' is the adhesive strength between the support and the photopolymerizable layer adjacent thereto after exposure to light, B' is the adhesive strength between the substrate and the photopolymerizable layer adjacent thereto after exposure to light, and C' is the lowest adhesive strength of all the adhesive strengths between any two photopolymerizable layers among the photopolymerizable layers after exposure to light.
    • 一种图像形成方法,其包括将光敏材料成像地曝光,所述感光材料包括支撑体和在其间具有可光聚合材料的基材,并剥离所述载体以留下所述可光聚合材料的暴露区域或未曝光区域 其中光聚合材料的特征在于其中包含至少两个不同的可光聚合层,其各自包含一种或多种可加聚单体,一种或多种光聚合引发剂和一种或多种粘合剂,该可光聚合层邻近载体放置, 基材,其中至少两种不同的可光聚合层中的至少一种成分或可光聚合层的成分的比例不同,并且可光聚合层具有C> A> B和C'> B'>的关系, A'或C> B> A和C'> A'> B',其中: