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    • 1. 发明专利
    • Forming method of polycrystalline silicon film
    • 多晶硅薄膜的形成方法
    • JP2005286067A
    • 2005-10-13
    • JP2004097093
    • 2004-03-29
    • Takashi FuyukiSanyo Electric Co Ltd三洋電機株式会社隆 冬木
    • MATSUMI SHINFUYUKI TAKASHI
    • H01L31/04
    • Y02E10/50
    • PROBLEM TO BE SOLVED: To provide a method for forming a polycrystalline silicon film having a BSF (Back Surface Field) structure on a substrate without performing fused recrystallization after film formation. SOLUTION: A silicon feedstock gas containing chlorine and a dopant gas under high concentration doping conditions are supplied; and vapor phase epitaxy is carried out at a temperature not lower than the decomposition temperature of the feedstock gas and lower than the optimum growth temperature to grow a p-type polycrystalline silicon film 21, until a columnar crystal is grown on the substrate 1 in the film thickness direction. Then, a same p-type polycrystalline silicon film 22 is continuously formed according to the vapor phase epitaxy at the optimum growth temperature. Thus, the first p-type polycrystalline silicon film 21 is formed on the substrate 1, and the second p-type polycrystalline silicon film 22 having a carrier concentration lower than that of the first p-type polycrystalline silicon film 21 is formed on this silicon film 21 to obtain the BSF structure. COPYRIGHT: (C)2006,JPO&NCIPI
    • 要解决的问题:提供一种在基板上形成具有BSF(背面场)结构的多晶硅膜的方法,而不在成膜后进行熔融重结晶。 提供了在高浓度掺杂条件下含有氯和掺杂气体的硅原料气体; 并且气相外延在不低于原料气体的分解温度的温度下进行,并且低于最佳生长温度以生长p型多晶硅膜21,直到柱状晶体在基板1上生长 膜厚度方向。 然后,根据气相外延在最佳生长温度下连续形成相同的p型多晶硅膜22。 因此,在基板1上形成第一p型多晶硅膜21,在该硅上形成载流子浓度低于第一p型多晶硅膜21的第二p型多晶硅膜22 电影21获得BSF结构。 版权所有(C)2006,JPO&NCIPI
    • 6. 发明授权
    • Method and apparatus for testing and evaluating performance of a solar cell
    • 用于测试和评估太阳能电池性能的方法和装置
    • US07847237B2
    • 2010-12-07
    • US12226820
    • 2007-04-25
    • Takashi Fuyuki
    • Takashi Fuyuki
    • H01J7/24G01J1/44G01R31/00
    • H02S50/10
    • A method for evaluating performance of a solar cell, comprising: a current passing step (S1) of passing, in a forward direction, a direct current with respect to a solar cell element constituting the solar cell; a temperature control step (S2) of heating the solar cell element and controlling a heating temperature of the solar cell element; and a light emission detecting step (S3) of detecting light emission characteristics of light generated from the solar cell element due to the passing of the direct current in the current passing step and the heating of the solar cell element in the temperature control step (S2).
    • 一种用于评估太阳能电池的性能的方法,包括:电流通过步骤(S1),其相对于构成所述太阳能电池的太阳能电池元件沿正向通过直流电; 加热太阳能电池元件并控制太阳能电池元件的加热温度的温度控制步骤(S2); 以及在温度控制步骤(S2)中检测由于电流通过步骤中的直流电流和太阳能电池元件的加热而产生的太阳能电池元件产生的光的发光特性的发光检测步骤(S3) )。
    • 7. 发明申请
    • Method and Device for Evaluating Solar Cell and Use Thereof
    • 用于评估太阳能电池的方法和装置及其用途
    • US20090127448A1
    • 2009-05-21
    • US12226820
    • 2007-04-25
    • Takashi Fuyuki
    • Takashi Fuyuki
    • H01J40/14
    • H02S50/10
    • A method for evaluating performance of a solar cell, comprising: a current passing step (S1) of passing, in a forward direction, a direct current with respect to a solar cell element constituting the solar cell; a temperature control step (S2) of heating the solar cell element and controlling a heating temperature of the solar cell element; and a light emission detecting step (S3) of detecting light emission characteristics of light generated from the solar cell element due to the passing of the direct current in the current passing step and the heating of the solar cell element in the temperature control step (S2).
    • 一种用于评估太阳能电池的性能的方法,包括:电流通过步骤(S1),其相对于构成所述太阳能电池的太阳能电池元件沿正向通过直流电; 加热太阳能电池元件并控制太阳能电池元件的加热温度的温度控制步骤(S2); 以及在温度控制步骤(S2)中检测由于电流通过步骤中的直流电流和太阳能电池元件的加热而产生的太阳能电池元件产生的光的发光特性的发光检测步骤(S3) )。
    • 10. 发明申请
    • Method of Fabricating Thin-Film Transistor
    • 制造薄膜晶体管的方法
    • US20090050880A1
    • 2009-02-26
    • US11918245
    • 2006-03-28
    • Yukiharu UraokaTakashi FuyukiHiroya Kirimura
    • Yukiharu UraokaTakashi FuyukiHiroya Kirimura
    • H01L35/24H01L51/40
    • H01L29/78672C30B29/58H01L21/02532H01L21/02672H01L27/1277H01L29/1029
    • The core metal of a protein such as ferritin is used as a nucleus for crystallizing a silicone thin film and then the thus crystallized film is employed in the channel part of a thin-film transistor. By aligning the protein on the surface of amorphous silicone and heating, the crystallinity is controlled. In the case of ferritin, the core diameter of the protein is 7 mm. That is, this protein is highly even in size (i.e., the metal content). Thus, the amount of the protein to be deposited on the amorphous silicone surface can be accurately controlled by controlling the protein core density. Furthermore, the type of the core metal can be altered by chemical reactions and the above method is applicable not only to amorphous silicone but also to amorphous films of various types such as germanium. Thus, the amount of nickel required in crystallization is controlled by using a protein. Moreover, the distribution density of the nickel core is controlled to thereby conduct crystallization at a desired crystal size.
    • 蛋白质如铁蛋白的核心金属用作结晶硅氧烷薄膜的核,然后将这样结晶的膜用于薄膜晶体管的沟道部分。 通过将无定形硅氧烷表面上的蛋白质对准并加热,控制结晶度。 在铁蛋白的情况下,蛋白质的核心直径为7mm。 也就是说,该蛋白质的大小(即,金属含量)高度均匀。 因此,可以通过控制蛋白质核心密度来精确地控制沉积在非晶硅表面上的蛋白质的量。 此外,核心金属的种类可以通过化学反应而改变,并且上述方法不仅适用于无定形硅氧烷,而且也适用于各种类型的非晶态锗如锗。 因此,通过使用蛋白质来控制结晶所需的镍的量。 此外,控制镍芯的分布密度,从而以期望的晶体尺寸进行结晶。