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1. 发明授权

US08993214B2 Positive photosensitive siloxane composition 有权
标题翻译：正光敏硅氧烷组合物
公开(公告)号：US08993214B2
公开(公告)日：2015-03-31
申请号：US14117433
申请日：2012-05-15
申请人： Daishi Yokoyama , Takashi Fuke , Yuji Tashiro , Takashi Sekito , Toshiaki Nonaka
发明人： Daishi Yokoyama , Takashi Fuke , Yuji Tashiro , Takashi Sekito , Toshiaki Nonaka
IPC分类号： G03F7/075 , G03F7/039 , G03F7/022
CPC分类号： G03F7/0757 , C08G77/18 , C08K5/235 , C08L83/00 , C08L83/04 , G03F7/0233
摘要： A positive photosensitive siloxane composition comprising at least three types of following polysiloxanes (A), (B) and (C) obtained by hydrolyzing and condensing a silane compound represented by general formula (1) R1nSi (OR2)4-n, a diazonaphthoquinone derivative, and a solvent: a polysiloxane (A) such that if pre-baked the film thereof will be soluble in a 5 weight % TMAH aqueous solution and the solution rate of said film will be 1,000 Å/sec or less; a polysiloxane (B) such that if pre-baked the solution rate of the film thereof will be 4,000 Å/sec or more relative to a 2.38 weight % TMAH aqueous solution; and a polysiloxane (C) such that if pre-baked the solution rate of the film thereof will be between 200 and 3,000 Å/sec relative to a 2.38 weight % TMAH aqueous solution. (In the formula, R1 represents a C1-20 linear or branched cyclic alkyl group, in which any methylene may be substituted by oxygen, or a C6-20 aryl group, in which any hydrogen may be substituted by fluorine; n represents a 0 or a 1; and R2 represents a C1-5 alkyl group.)
摘要翻译：包含通过水解和缩合由通式（1）表示的硅烷化合物R1nSi（OR2）4-n，重氮萘醌衍生物（A），（C））所得到的至少三种以下聚硅氧烷（A），（B）和溶剂：聚硅氧烷（A），使得如果其预烘烤，则其膜可溶于5重量％的TMAH水溶液中，并且所述膜的溶液速率将为1000埃/秒或更小; 聚硅氧烷（B），使得如果预烘焙，则相对于2.38重量％的TMAH水溶液，其膜的溶液速率将为4,000 /秒或更多; 和聚硅氧烷（C），使得如果预烘烤，则相对于2.38重量％的TMAH水溶液，其膜的溶液速率将在200和3000埃之间。（式中，R 1表示可以被氧取代的任意亚甲基的C 1-20直链状或支链状的烷基或可被氟取代的氢原子的碳原子数为6〜20的芳基，n表示0以上或1;且R 2表示C 1-5烷基。

2. 发明授权

US08883397B2 Positive photosensitive siloxane composition 有权
标题翻译：正光敏硅氧烷组合物
公开(公告)号：US08883397B2
公开(公告)日：2014-11-11
申请号：US13814686
申请日：2011-08-19
申请人： Daishi Yokoyama , Takashi Fuke , Yuji Tashiro , Takashi Sekito , Toshiaki Nonaka
发明人： Daishi Yokoyama , Takashi Fuke , Yuji Tashiro , Takashi Sekito , Toshiaki Nonaka
IPC分类号： G03F7/075 , G03F7/039 , G03F7/022
CPC分类号： G03F7/0757 , G03F7/022
摘要： A positive photosensitive siloxane composition containing: a polysiloxane (Ia), which is obtained by hydrolyzing and condensing the silane compound represented by RSi(OR1)3 in general formula (1) and the silane compound represented by Si(OR1)4 in general formula (2) in the presence of a basic catalyst, and a pre-baked film of which has a dissolution rate of 1,000 Å/second or less in a 5 wt % TMAH aqueous solution; a polysiloxane (Ib), which is obtained by hydrolyzing and condensing at least the silane compound represented by general formula (1) in the presence of an acid or basic catalyst, and a pre-baked film of which has a dissolution rate of 100 Å/second or more in a 2.38 wt % TMAH aqueous solution; and a diazonaphthoquinone derivative and solvent. (In the formula: R represents a linear, branched or cyclic alkyl group having 1 to 20 carbon atoms, in which any methylene may be replaced by oxygen, or represents an aryl group having 6 to 20 carbon atoms, in which any hydrogen may be replaced by fluorine; and R1 is an alkyl group having 1 to 5 carbon atoms.)
摘要翻译：一种正型感光性硅氧烷组合物，其含有：将通式（1）中的RSi（OR 1）3表示的硅烷化合物和通式（1）中的Si（OR 1）4）表示的硅烷化合物水解缩合得到的聚硅氧烷（Ia）（2）在碱性催化剂存在下，其预烘膜在5重量％TMAH水溶液中的溶解速率为1000埃/秒以下; 通过在酸或碱性催化剂的存在下至少使通式（1）表示的硅烷化合物水解和缩合得到的聚硅氧烷（Ib），其预烘膜的溶解速率为在2.38重量％TMAH水溶液中的/秒以上; 和重氮萘醌衍生物和溶剂。（式中，R表示碳原子数1〜20的直链状，支链状或环状的烷基，其中任意亚甲基可被氧代替，或表示碳原子数为6〜20的芳基，被氟取代; R1是具有1至5个碳原子的烷基）

3. 发明授权

US09091920B2 Photosensitive siloxane resin composition 有权
标题翻译：感光硅氧烷树脂组合物
公开(公告)号：US09091920B2
公开(公告)日：2015-07-28
申请号：US14117449
申请日：2012-05-17
申请人： Takashi Sekito , Daishi Yokoyama , Takashi Fuke , Yuki Tashiro , Toshiaki Nonaka , Yasuaki Tanaka
发明人： Takashi Sekito , Daishi Yokoyama , Takashi Fuke , Yuki Tashiro , Toshiaki Nonaka , Yasuaki Tanaka
IPC分类号： G03F7/075 , H01L21/02 , H01L21/311 , G03F7/20
CPC分类号： G03F7/0757 , C08G77/045 , C08G77/18 , C08G77/80 , C09D183/04 , G03F7/023 , G03F7/20 , H01L21/02126 , H01L21/02216 , H01L21/02282 , H01L21/311 , C08K5/159
摘要： [Object]To provide a photosensitive siloxane resin composition excellent in alkali-solubility and in sensitivity, and also to provide a pattern-formation method employing that.[Means]The present invention provides a photosensitive siloxane resin composition comprising: a siloxane resin having silanol groups or alkoxysilyl groups, a crown ether, a photosensitive material, and an organic solvent. This photosensitive composition is cast on a substrate, subjected to imagewise exposure, treated with an alkali aqueous solution, and cured to form a pattern.
摘要翻译：本发明提供碱溶性和灵敏度优异的感光性硅氧烷树脂组合物，并提供使用该感光性硅氧烷树脂组合物的图案形成方法。本发明提供一种光敏性硅氧烷树脂组合物，其包含：具有硅烷醇基或烷氧基甲硅烷基的硅氧烷树脂，冠醚，感光材料和有机溶剂。将该感光性组合物浇铸在基材上，进行成像曝光，用碱水溶液处理，固化形成图案。

4. 发明授权

US08906993B2 Coating composition containing siloxane resin 有权
标题翻译：含硅氧烷树脂的涂料组合物
公开(公告)号：US08906993B2
公开(公告)日：2014-12-09
申请号：US14110322
申请日：2012-04-11
申请人： Takashi Sekito , Daishi Yokoyama , Takashi Fuke , Yuji Tashiro , Toshiaki Nonaka , Yasuaki Tanaka
发明人： Takashi Sekito , Daishi Yokoyama , Takashi Fuke , Yuji Tashiro , Toshiaki Nonaka , Yasuaki Tanaka
IPC分类号： C08K5/06 , C08K5/053 , C09D183/06 , G02B1/10 , G02B1/11 , C09D7/00 , C09D7/12 , C09D183/04 , C08G77/04
CPC分类号： C09D183/06 , C08G77/045 , C08G77/16 , C09D7/20 , C09D7/65 , C09D183/04 , G02B1/105 , G02B1/111 , G02B1/14 , C08K5/053
摘要： [Object]To provide a coating composition excellent in coatability and free from viscosity increase caused by degradation over time, and also to provide a hardened film-formation method employing that.[Means]The present invention provides a coating composition comprising: a siloxane resin having silanol groups or alkoxysilyl groups, and a polyol having hydroxyl groups at both ends of a straight 2 to 5 carbon atom hydrocarbon chain. This coating composition enables to form a hardened film of high transparency, of high insulation and of low dielectricity.
摘要翻译：本发明提供一种涂布性优异且不随着时间的劣化而引起的粘度增加的涂料组合物，并提供使用该涂料组合物的硬化成膜方法。本发明提供一种涂料组合物，其包含：具有硅烷醇基或烷氧基甲硅烷基的硅氧烷树脂，以及在直链2〜5个碳原子的烃链的两端具有羟基的多元醇。该涂料组合物能够形成高透明度，高绝缘性和低介电性的硬化膜。

5. 发明申请

US20130216952A1 POSITIVE PHOTOSENSITIVE SILOXANE COMPOSITION 有权
标题翻译：正性感光性硅氧烷组合物
公开(公告)号：US20130216952A1
公开(公告)日：2013-08-22
申请号：US13814686
申请日：2011-08-19
申请人： Daishi Yokoyama , Takashi Fuke , Yuji Tashiro , Takashi Sekito , Toshiaki Nonaka
发明人： Daishi Yokoyama , Takashi Fuke , Yuji Tashiro , Takashi Sekito , Toshiaki Nonaka
IPC分类号： G03F7/075
CPC分类号： G03F7/0757 , G03F7/022
摘要： A positive photosensitive siloxane composition containing: a polysiloxane (Ia), which is obtained by hydrolyzing and condensing the silane compound represented by RSi(OR1)3 in general formula (1) and the silane compound represented by Si(OR1)4 in general formula (2) in the presence of a basic catalyst, and a pre-baked film of which has a dissolution rate of 1,000 Å/second or less in a 5 wt % TMAH aqueous solution; a polysiloxane (Ib), which is obtained by hydrolyzing and condensing at least the silane compound represented by general formula (1) in the presence of an acid or basic catalyst, and a pre-baked film of which has a dissolution rate of 100 Å/second or more in a 2.38 wt % TMAH aqueous solution; and a diazonaphthoquinone derivative and solvent. (In the formula: R represents a linear, branched or cyclic alkyl group having 1 to 20 carbon atoms, in which any methylene may be replaced by oxygen, or represents an aryl group having 6 to 20 carbon atoms, in which any hydrogen may be replaced by fluorine; and R1 is an alkyl group having 1 to 5 carbon atoms.)
摘要翻译：一种正型感光性硅氧烷组合物，其含有聚硅氧烷（Ia），其通过使通式（1）中的RSi（OR 1）3表示的硅烷化合物和通式（1）中的Si（OR 1）4表示的硅烷化合物）通式（2）在碱性催化剂存在下，其预烘膜在5重量％TMAH水溶液中的溶解速率为1000埃/秒以下。通过在酸或碱性催化剂的存在下至少使通式（1）表示的硅烷化合物水解和缩合得到的聚硅氧烷（Ib），其预烘膜的溶解速率为在2.38重量％TMAH水溶液中的/秒以上; 和重氮萘醌衍生物和溶剂。（式中，R表示碳原子数1〜20的直链状，支链状或环状的烷基，其中任意亚甲基可被氧代替，或表示碳原子数为6〜20的芳基，被氟取代; R1是具有1至5个碳原子的烷基）

6. 发明申请

US20140335452A1 POSITIVE PHOTOSENSITIVE SILOXANE COMPOSITION 有权
标题翻译：正性感光性硅氧烷组合物
公开(公告)号：US20140335452A1
公开(公告)日：2014-11-13
申请号：US14117433
申请日：2012-05-15
申请人： Daishi Yokoyama , Takashi Fuke , Yuji Tashiro , Takashi Sekito , Toshiaki Nonaka
发明人： Daishi Yokoyama , Takashi Fuke , Yuji Tashiro , Takashi Sekito , Toshiaki Nonaka
IPC分类号： G03F7/075
CPC分类号： G03F7/0757 , C08G77/18 , C08K5/235 , C08L83/00 , C08L83/04 , G03F7/0233
摘要： A positive photosensitive siloxane composition comprising at least three types of following polysiloxanes (A), (B) and (C) obtained by hydrolyzing and condensing a silane compound represented by general formula (1) R1nSi (OR2)4-n, a diazonaphthoquinone derivative, and a solvent: a polysiloxane (A) such that if pre-baked the film thereof will be soluble in a 5 weight % TMAH aqueous solution and the solution rate of said film will be 1,000 Å/sec or less; a polysiloxane (B) such that if pre-baked the solution rate of the film thereof will be 4,000 Å/sec or more relative to a 2.38 weight % TMAH aqueous solution; and a polysiloxane (C) such that if pre-baked the solution rate of the film thereof will be between 200 and 3,000 Å/sec relative to a 2.38 weight % TMAH aqueous solution. (In the formula, R1 represents a C1-20 linear or branched cyclic alkyl group, in which any methylene may be substituted by oxygen, or a C6-20 aryl group, in which any hydrogen may be substituted by fluorine; n represents a 0 or a 1; and R2 represents a C1-5 alkyl group.)
摘要翻译：包含通过水解和缩合由通式（1）表示的硅烷化合物R1nSi（OR2）4-n，重氮萘醌衍生物（A），（C））所得到的至少三种以下聚硅氧烷（A），（B）和溶剂：聚硅氧烷（A），使得如果其预烘烤，则其膜可溶于5重量％的TMAH水溶液中，并且所述膜的溶液速率将为1000埃/秒或更小; 聚硅氧烷（B），使得如果预烘焙，则相对于2.38重量％的TMAH水溶液，其膜的溶液速率将为4,000 /秒或更多; 和聚硅氧烷（C），使得如果预烘烤，则相对于2.38重量％的TMAH水溶液，其膜的溶液速率将在200和3000埃之间。（式中，R 1表示可以被氧取代的任意亚甲基的C 1-20直链状或支链状的烷基或可被氟取代的氢原子的碳原子数为6〜20的芳基，n表示0以上或1;且R 2表示C 1-5烷基。

7. 发明申请

US20140024758A1 COATING COMPOSITION CONTAINING SILOXANE RESIN 有权
标题翻译：包含硅氧烷树脂的涂料组合物
公开(公告)号：US20140024758A1
公开(公告)日：2014-01-23
申请号：US14110322
申请日：2012-04-11
申请人： Takashi Sekito , Daishi Yokoyama , Takashi Fuke , Yuji Tashiro , Toshiaki Nonaka , Yasuaki Tanaka
发明人： Takashi Sekito , Daishi Yokoyama , Takashi Fuke , Yuji Tashiro , Toshiaki Nonaka , Yasuaki Tanaka
IPC分类号： C09D183/06
CPC分类号： C09D183/06 , C08G77/045 , C08G77/16 , C09D7/20 , C09D7/65 , C09D183/04 , G02B1/105 , G02B1/111 , G02B1/14 , C08K5/053
摘要： [Object]To provide a coating composition excellent in coatability and free from viscosity increase caused by degradation over time, and also to provide a hardened film-formation method employing that.[Means]The present invention provides a coating composition comprising: a siloxane resin having silanol groups or alkoxysilyl groups, and a polyol having hydroxyl groups at both ends of a straight 2 to 5 carbon atom hydrocarbon chain. This coating composition enables to form a hardened film of high transparency, of high insulation and of low dielectricity.
摘要翻译：本发明提供一种涂布性优异且不随着时间的劣化而引起的粘度增加的涂料组合物，并提供使用该涂料组合物的硬化成膜方法。本发明提供一种涂料组合物，其包含：具有硅烷醇基或烷氧基甲硅烷基的硅氧烷树脂，以及在直链2〜5个碳原子的烃链的两端具有羟基的多元醇。该涂料组合物能够形成高透明度，高绝缘性和低介电性的硬化膜。

8. 发明申请

US20140335448A1 PHOTOSENSITIVE SILOXANE RESIN COMPOSITION 有权
标题翻译：感光性硅氧烷树脂组合物
公开(公告)号：US20140335448A1
公开(公告)日：2014-11-13
申请号：US14117449
申请日：2012-05-17
申请人： Takashi Sekito , Daishi Yokoyama , Takashi Fuke , Yuki Tashiro , Toshiaki Nonaka , Yasuaki Tanaka
发明人： Takashi Sekito , Daishi Yokoyama , Takashi Fuke , Yuki Tashiro , Toshiaki Nonaka , Yasuaki Tanaka
IPC分类号： G03F7/075 , G03F7/20
CPC分类号： G03F7/0757 , C08G77/045 , C08G77/18 , C08G77/80 , C09D183/04 , G03F7/023 , G03F7/20 , H01L21/02126 , H01L21/02216 , H01L21/02282 , H01L21/311 , C08K5/159
摘要： [Object] To provide a photosensitive siloxane resin composition excellent in alkali-solubility and in sensitivity, and also to provide a pattern-formation method employing that.[Means] The present invention provides a photosensitive siloxane resin composition comprising: a siloxane resin having silanol groups or alkoxysilyl groups, a crown ether, a photosensitive material, and an organic solvent. This photosensitive composition is cast on a substrate, subjected to imagewise exposure, treated with an alkali aqueous solution, and cured to form a pattern.
摘要翻译：本发明提供碱溶性和灵敏度优异的感光性硅氧烷树脂组合物，并提供使用该感光性硅氧烷树脂组合物的图案形成方法。本发明提供一种光敏性硅氧烷树脂组合物，其包含：具有硅烷醇基或烷氧基甲硅烷基的硅氧烷树脂，冠醚，感光材料和有机溶剂。将该感光性组合物浇铸在基材上，进行成像曝光，用碱水溶液处理，固化形成图案。

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