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1. 发明申请

US20120188536A1 IMPRINT APPARATUS, DETECTION METHOD, ARTICLE MANUFACTURING METHOD, AND FOREIGN PARTICLE DETECTION APPARATUS 有权
标题翻译：印刷装置，检测方法，制品制造方法和外来颗粒检测装置
公开(公告)号：US20120188536A1
公开(公告)日：2012-07-26
申请号：US13354430
申请日：2012-01-20
申请人： Hiroshi SATO , Takanori UEMURA
发明人： Hiroshi SATO , Takanori UEMURA
IPC分类号： G01N21/00 , B05C11/00 , C23C16/52 , B05C13/02
CPC分类号： G01N21/94
摘要： The present invention provides an imprint apparatus for performing an imprint process of transferring a pattern onto a substrate by curing a resin on the substrate while the resin is in contact with a mold, and removing the mold from the cured resin, including a detection unit configured to detect a foreign particle existing on the substrate, wherein the detection unit includes an obtaining unit configured to irradiate a surface of the substrate with light, and obtain light from the surface of the substrate, and a specification unit configured to specify a shot region where a foreign particle existing on the substrate is positioned, based on the light obtained by the obtaining unit.
摘要翻译：本发明提供了一种压印装置，用于通过在树脂与模具接触的同时固化基板上的树脂并将模具从固化树脂上除去而将图案转印到基板上，压印工艺包括检测单元配置检测存在于基板上的异物，其中，所述检测单元包括：获取单元，被配置为用光照射所述基板的表面，并从所述基板的表面获得光;以及规格单元，其被配置为指定所述拍摄区域，基于获得单元获得的光来定位存在于基板上的异物。

2. 发明申请

US20110117503A1 EXPOSURE APPARATUS AND DEVICE FABRICATION METHOD 审中-公开
标题翻译：曝光装置和装置制造方法
公开(公告)号：US20110117503A1
公开(公告)日：2011-05-19
申请号：US12948647
申请日：2010-11-17
申请人： Takanori UEMURA
发明人： Takanori UEMURA
IPC分类号： G03F7/20 , G03B27/54
CPC分类号： G03F7/70116
摘要： The present invention provides an exposure apparatus including an illumination optical system, the illumination optical system includes a mirror array optical element including a plurality of mirror elements having reflecting surfaces which reflect light from a light source, the plurality of mirror elements having angles that can be independently controlled with respect to the light from the light source, a first optical system configured to guide the light from the light source to the mirror array optical element, and receive light reflected by a predetermined mirror element, an angle of which is controlled to guide the light reflected by the reflecting surface to the reticle, a second optical system which is present on a side of the light source with respect to the first optical system, and a third optical system which is present on a side of the reticle with respect to the first optical system.
摘要翻译：本发明提供了一种包括照明光学系统的曝光装置，所述照明光学系统包括具有反射表面的多个反射镜元件的反射镜阵列光学元件，所述反射面反射来自光源的光，所述多个反射镜元件具有能够相对于来自光源的光被独立地控制;第一光学系统，被配置为将来自光源的光引导到反射镜阵列光学元件，并且接收由预定的镜元件反射的光，其角度被控制为引导由反射面反射到掩模版的光，相对于第一光学系统存在于光源侧的第二光学系统和相对于第一光学系统存在于光掩模的一侧的第三光学系统第一个光学系统。

3. 发明申请

US20090135393A1 ILLUMINATION OPTICAL APPARATUS, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD 有权
标题翻译：照明光学装置，曝光装置和装置制造方法
公开(公告)号：US20090135393A1
公开(公告)日：2009-05-28
申请号：US12273822
申请日：2008-11-19
申请人： Takanori Uemura
发明人： Takanori Uemura
IPC分类号： G03B27/54 , G03B27/32
CPC分类号： G03B27/32 , G03B27/54 , G03F7/70108
摘要： An illumination optical apparatus is configured to irradiate a light beam from a light source onto a surface to be irradiated. The illumination optical apparatus includes a first group of prisms which has a plurality of prisms, a second group of prisms which has a plurality of prisms, and a switch of a group of prisms which is capable of switching the first and the second groups of prisms so as to position one of the first and the second groups of prisms in an optical path. An annular ratio of the light beam emitted from one of the first and the second groups of prisms is changed by moving at least one of a plurality of prisms included in one of the first and the second groups of prisms positioned in the optical path in an optical axis direction, and an upper limit of the annular ratio of the light beam emitted from the first group of prisms is equal to or higher than a lower limit of the annular ratio of the light beam emitted from the second group of prisms and is lower than the upper limit of the annular ratio of the light beam emitted from the second group of prisms.
摘要翻译：照明光学装置被配置为将来自光源的光束照射到待照射的表面上。照明光学装置包括具有多个棱镜的第一组棱镜，具有多个棱镜的第二组棱镜以及能够切换第一和第二组棱镜的一组棱镜的开关以将第一和第二组棱镜中的一个定位在光路中。通过将位于光路中的第一和第二组棱镜中的一个中包括的多个棱镜中的至少一个棱镜移动到第一和第二组棱镜中的一个中发射的光束的环形比例，光轴方向，并且从第一组棱镜发射的光束的环形比的上限等于或高于从第二组棱镜发射的光束的环形比的下限，并且低于比从第二组棱镜发射的光束的环形比的上限高。

4. 发明申请

US20080062509A1 DIFFRACTIVE OPTICAL ELEMENT, EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：衍射光学元件，曝光装置和器件制造方法
公开(公告)号：US20080062509A1
公开(公告)日：2008-03-13
申请号：US11849770
申请日：2007-09-04
申请人： Takanori Uemura
发明人： Takanori Uemura
IPC分类号： G02B3/00 , G02B5/18 , G02B5/30
CPC分类号： G03F7/70158 , G02B5/1809 , G02B5/1814 , G02B27/286 , G03F7/70108
摘要： A diffractive optical element is disclosed. The diffractive optical element is used in an illumination optical system of an exposure apparatus which exposes a substrate, and used for forming the intensity distribution of light at a pupil plane of the illumination optical system. The diffractive optical element comprises a first diffractive element and a second diffractive element which have different diffraction actions from each other, wherein each of the first diffractive element and the second diffractive element has point symmetry in a irradiated region where light is irradiated and common center of the point symmetry.
摘要翻译：公开了一种衍射光学元件。衍射光学元件用于曝光基板的曝光装置的照明光学系统中，用于形成照明光学系统的光瞳面处的光的强度分布。衍射光学元件包括彼此具有不同衍射作用的第一衍射元件和第二衍射元件，其中第一衍射元件和第二衍射元件中的每一个在照射光的照射区域中具有点对称性，并且共同的中心点对称。

5. 发明授权

US07773197B2 Illumination optical apparatus, exposure apparatus, and device manufacturing method 有权
标题翻译：照明光学装置，曝光装置和装置的制造方法
公开(公告)号：US07773197B2
公开(公告)日：2010-08-10
申请号：US12273822
申请日：2008-11-19
申请人： Takanori Uemura
发明人： Takanori Uemura
IPC分类号： G03B27/54 , G03B27/42
CPC分类号： G03B27/32 , G03B27/54 , G03F7/70108
摘要： An illumination optical apparatus is configured to irradiate a light beam from a light source onto a surface to be irradiated. The illumination optical apparatus includes a first group of prisms which has a plurality of prisms, a second group of prisms which has a plurality of prisms, and a switch of a group of prisms which is capable of switching the first and the second groups of prisms so as to position one of the first and the second groups of prisms in an optical path. An annular ratio of the light beam emitted from one of the first and the second groups of prisms is changed by moving at least one of a plurality of prisms included in one of the first and the second groups of prisms positioned in the optical path in an optical axis direction, and an upper limit of the annular ratio of the light beam emitted from the first group of prisms is equal to or higher than a lower limit of the annular ratio of the light beam emitted from the second group of prisms and is lower than the upper limit of the annular ratio of the light beam emitted from the second group of prisms.
摘要翻译：照明光学装置被配置为将来自光源的光束照射到待照射的表面上。照明光学装置包括具有多个棱镜的第一组棱镜，具有多个棱镜的第二组棱镜以及能够切换第一和第二组棱镜的一组棱镜的开关以将第一和第二组棱镜中的一个定位在光路中。通过将位于光路中的第一和第二组棱镜中的一个中包括的多个棱镜中的至少一个棱镜移动到第一和第二组棱镜中的一个中发射的光束的环形比例，光轴方向，并且从第一组棱镜发射的光束的环形比的上限等于或高于从第二组棱镜发射的光束的环形比的下限，并且低于比从第二组棱镜发射的光束的环形比的上限高。

6. 发明申请

US20100328640A1 POLARIZATION STATE MEASUREMENT APPARATUS AND EXPOSURE APPARATUS 审中-公开
标题翻译：极化状态测量装置和曝光装置
公开(公告)号：US20100328640A1
公开(公告)日：2010-12-30
申请号：US12827339
申请日：2010-06-30
申请人： Takanori UEMURA
发明人： Takanori UEMURA
IPC分类号： G03B27/72 , G01J4/00
CPC分类号： G03B27/72 , G01J4/00 , G03F7/70566
摘要： A measurement apparatus for measuring the polarization state of a light beam Fourier-transforms changes in intensity of a plurality of light beams with different polarization states, which are detected while changing a relative rotation angle θ between the waveplate and the polarizer about the optical axis, to calculate the values of first Fourier coefficients of respective components oscillating with waveforms described by cos 4θ, sin 4θ, sin 2θ, and cos 2θ, approximately calculates, using the values of the first Fourier coefficients, third coefficients that define the relationship between the first Fourier coefficients and second Fourier coefficients of the respective components oscillating with waveforms described by cos 4θ, sin 4θ, and sin 2θ assuming that the detection result contains no measurement error attributed to the optical system, and calculates a measurement error attributed to the optical system using the third coefficients.
摘要翻译：用于测量光束的偏振态的傅立叶变换的测量装置改变具有不同极化状态的多个光束的强度的变化，这些光束在改变相对旋转角度的同时被检测; 在波片和偏振器之间围绕光轴，计算用cos 4＆amp; t s; sin 4＆amp; t s i，sin 2＆amp; t s i和cos 2＆amp; t s i描述的波形振荡的各个分量的第一傅里叶系数的值，使用值第三系数，其定义了由cos 4＆amp; sas; sin 4＆thetas;和sin 2＆thetas描述的波形振荡的各个分量的第一傅立叶系数和第二傅里叶系数之间的关系; 假设检测结果不包含归因于光学系统的测量误差，并且使用第三系数计算归因于光学系统的测量误差。

7. 发明申请

US20080062541A1 ILLUMINATION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD 有权
标题翻译：照明光学系统，曝光装置和装置制造方法
公开(公告)号：US20080062541A1
公开(公告)日：2008-03-13
申请号：US11847194
申请日：2007-08-29
申请人： Takanori Uemura
发明人： Takanori Uemura
IPC分类号： G02B5/04
CPC分类号： G03F7/70108 , G02B5/04
摘要： In an illumination optical system arranged to illuminate an illumination target plane by using light from a light source, the illumination optical system includes a prism unit arranged to refract the light, an optical integrator arranged to form a plurality of light sources with light emerging from the prism unit, and an optical system arranged to introduce light emerging from the optical integrator to the illumination target plane. The prism unit includes a pair of conical refractive surface having a conical concave refractive surface and a conical convex refractive surface, and a pair of pyramidal refractive surface having a pyramidal concave refractive surface and a pyramidal convex refractive surface. At least one of the concave refractive surface and the convex refractive surface of the one pair is disposed between the concave refractive surface of the other pair and the convex refractive surface of the other pair.
摘要翻译：在照明光学系统中，所述照明光学系统通过使用来自光源的光照射照明目标平面，所述照明光学系统包括布置成折射光的棱镜单元，布置成形成多个光源的光学积分器，棱镜单元和布置成将从光学积分器出射的光引入照明目标平面的光学系统。棱镜单元包括具有圆锥形凹折射表面和圆锥形凸折射表面的一对锥形折射表面，以及一对锥形折射表面，其具有锥形凹面折射表面和锥形凸折射表面。一对的凹折射面和凸折射面中的至少一个被设置在另一对的凹折射面和另一对的凸折射面之间。

8. 发明授权

US08687183B2 Imprint apparatus, detection method, article manufacturing method, and foreign particle detection apparatus 有权
标题翻译：印刷装置，检测方法，制品制造方法和异物检测装置
公开(公告)号：US08687183B2
公开(公告)日：2014-04-01
申请号：US13354430
申请日：2012-01-20
申请人： Hiroshi Sato , Takanori Uemura
发明人： Hiroshi Sato , Takanori Uemura
IPC分类号： G01N21/00
CPC分类号： G01N21/94
摘要： The present invention provides an imprint apparatus for performing an imprint process of transferring a pattern onto a substrate by curing a resin on the substrate while the resin is in contact with a mold, and removing the mold from the cured resin, including a detection unit configured to detect a foreign particle existing on the substrate, wherein the detection unit includes an obtaining unit configured to irradiate a surface of the substrate with light, and obtain light from the surface of the substrate, and a specification unit configured to specify a shot region where a foreign particle existing on the substrate is positioned, based on the light obtained by the obtaining unit.
摘要翻译：本发明提供了一种压印装置，用于通过在树脂与模具接触的同时固化基板上的树脂并将模具从固化树脂上除去而将图案转印到基板上，压印工艺包括检测单元配置检测存在于基板上的异物，其中，所述检测单元包括：获取单元，被配置为用光照射所述基板的表面，并从所述基板的表面获得光;以及规格单元，其被配置为指定所述拍摄区域，基于获得单元获得的光来定位存在于基板上的异物。

9. 发明授权

US08164738B2 Illumination optical system, exposure apparatus, and device manufacturing method 有权
标题翻译：照明光学系统，曝光装置和装置制造方法
公开(公告)号：US08164738B2
公开(公告)日：2012-04-24
申请号：US11847194
申请日：2007-08-29
申请人： Takanori Uemura
发明人： Takanori Uemura
IPC分类号： G03B27/54
CPC分类号： G03F7/70108 , G02B5/04
摘要： In an illumination optical system arranged to illuminate an illumination target plane by using light from a light source, the illumination optical system includes a prism unit arranged to refract the light, an optical integrator arranged to form a plurality of light sources with light emerging from the prism unit, and an optical system arranged to introduce light emerging from the optical integrator to the illumination target plane. The prism unit includes a pair of conical refractive surface having a conical concave refractive surface and a conical convex refractive surface, and a pair of pyramidal refractive surface having a pyramidal concave refractive surface and a pyramidal convex refractive surface. At least one of the concave refractive surface and the convex refractive surface of the one pair is disposed between the concave refractive surface of the other pair and the convex refractive surface of the other pair.
摘要翻译：在照明光学系统中，所述照明光学系统通过使用来自光源的光照射照明目标平面，所述照明光学系统包括布置成折射光的棱镜单元，布置成形成多个光源的光学积分器，棱镜单元和布置成将从光学积分器出射的光引入照明目标平面的光学系统。棱镜单元包括具有圆锥形凹折射表面和圆锥形凸折射表面的一对锥形折射表面，以及一对锥形折射表面，其具有棱锥形凹折射表面和锥形凸折射表面。一对的凹折射面和凸折射面中的至少一个被设置在另一对的凹折射面和另一对的凸折射面之间。

10. 发明申请

US20080143987A1 EXPOSURE APPARATUS AND DEVICE FABRICATION METHOD 审中-公开
标题翻译：曝光装置和装置制造方法
公开(公告)号：US20080143987A1
公开(公告)日：2008-06-19
申请号：US11955705
申请日：2007-12-13
申请人： Takanori Uemura
发明人： Takanori Uemura
IPC分类号： G03B27/54
CPC分类号： G03B27/54 , G03F7/70091 , G03F7/70333
摘要： An exposure apparatus comprises an illumination optical system configured to illuminate a reticle arranged on a surface to be illuminated with a light beam from a light source, a projection optical system configured to project a pattern of the reticle onto a substrate, and a stage configured to drive the substrate, wherein the illumination optical system includes a light distribution forming unit configured to form a trapezoidal light intensity distribution along a scanning direction of the reticle on the surface to be illuminated to uniform a light angle distribution for illuminating each point on the surface to be illuminated, and the substrate is exposed with the light intensity distribution and light angle distribution formed by the light distribution forming unit, while the stage drives the substrate by tilting a normal to the substrate with respect to an optical axis of the projection optical system.
摘要翻译：曝光装置包括：照明光学系统，被配置为用来自光源的光束照射布置在要被照明的表面上的掩模版;投影光学系统，其被配置为将掩模版的图案投影到基板上;以及台，驱动所述基板，其中所述照明光学系统包括配光形成单元，所述配光形成单元被配置为沿着要被照射的表面上的所述掩模版的扫描方向形成梯形光强度分布，以使得将所述表面上的每个点照射的光角分布均匀化被照射，并且通过由配光形成单元形成的光强度分布和光角分布来曝光基板，同时通过相对于投影光学系统的光轴倾斜垂直于基板来驱动基板。

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