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1. 发明授权

US07256868B2 Projection exposure apparatus, device manufacturing method, and sensor unit 失效
标题翻译：投影曝光装置，装置制造方法和传感器装置
公开(公告)号：US07256868B2
公开(公告)日：2007-08-14
申请号：US11052088
申请日：2005-02-08
申请人： Takahiro Akamatsu
发明人： Takahiro Akamatsu
IPC分类号： G03B27/42 , G03B27/72
CPC分类号： G03F7/70341 , G03F7/7085
摘要： A projection exposure apparatus which has a projection optical system and projects a pattern onto a substrate through the projection optical system. The apparatus includes a sensor unit which includes a light-receiving element for detecting light incident through the projection optical system, a vessel in which the light receiving element is arranged, a sealing window which transmits the incident light and seals the vessel, and a driving mechanism which aligns the substrate. A space between the sealing window and the light-receiving element is filled with a liquid having a refractive index which is greater than one, and the liquid also serves as a coolant for cooling the driving mechanism.
摘要翻译：一种具有投影光学系统并通过投影光学系统将图案投影到基板上的投影曝光装置。该装置包括传感器单元，其包括用于检测通过投影光学系统入射的光的光接收元件，布置有光接收元件的容器，透射入射光并密封容器的密封窗口，以及驱动使衬底对准的机构。密封窗和光接收元件之间的空间填充有折射率大于1的液体，并且该液体还用作用于冷却驱动机构的冷却剂。

2. 发明授权

US5162642A Device for detecting the position of a surface 失效
标题翻译：用于检测表面位置的装置
公开(公告)号：US5162642A
公开(公告)日：1992-11-10
申请号：US657950
申请日：1991-02-21
申请人： Takahiro Akamatsu , Haruna Kawashima , Hiroyoshi Kubo
发明人： Takahiro Akamatsu , Haruna Kawashima , Hiroyoshi Kubo
IPC分类号： G03F9/00
CPC分类号： G03F9/7026
摘要： A surface position detecting device usable with a semiconductor device manufacturing exposure apparatus having a projection lens system for projecting an image of a pattern of a mask onto a semiconductor wafer. The device is arranged to detect the position of the wafer relative to an image plane of the projection lens system, into which plane the wafer is to be positioned. The device includes a sensor for sensing light reflected by the wafer thereby to detect the position of the wafer. Also, in order to avoid detection errors due to interference of light caused by a resist layer formed on the wafer, the wafer is irradiated with different wavelengths of lights from plural light sources. In one aspect, the device uses a reference light which is directed to the sensor without reflection by the wafer in order to avoid an effect of drift of the sensor.
摘要翻译：一种可用于具有投影透镜系统的半导体器件制造曝光装置的表面位置检测装置，用于将掩模图案的图像投影到半导体晶片上。该装置被布置成检测晶片相对于投影透镜系统的像平面的位置，晶片将被放置在该平面中。该装置包括用于感测由晶片反射的光的传感器，从而检测晶片的位置。此外，为了避免由于由形成在晶片上的抗蚀剂层引起的光的干扰而导致的检测误差，从多个光源照射不同波长的光的晶片。在一个方面，该装置使用指向传感器的参考光而不会被晶片反射，以避免传感器漂移的影响。

3. 发明授权

US07522264B2 Projection exposure apparatus, device manufacturing method, and sensor unit 失效
标题翻译：投影曝光装置，装置制造方法和传感器装置
公开(公告)号：US07522264B2
公开(公告)日：2009-04-21
申请号：US11764276
申请日：2007-06-18
申请人： Takahiro Akamatsu
发明人： Takahiro Akamatsu
IPC分类号： G03B27/42 , G03B27/72
CPC分类号： G03F7/70341 , G03F7/7085
摘要： A projection exposure apparatus, which has a projection optical system and exposes a substrate through the projection optical system and a liquid, while a gap between the projection optical system and the substrate is filled with the liquid. The apparatus includes a light-receiving element configured to detect light incident thereon through the projection optical system and the liquid, a vessel in which the light-receiving element is arranged, and a fluoroplastic filling a space within the vessel to cover the light-receiving element.
摘要翻译：投影曝光装置具有投影光学系统，并且通过投影光学系统和液体曝光基板，同时投影光学系统和基板之间的间隙被液体填充。该装置包括被配置为检测通过投影光学系统和液体入射到其上的光的光接收元件，其中布置有光接收元件的容器，以及填充容器内的空间以覆盖光接收的氟塑料元件。

4. 发明授权

US4887904A Device for positioning a semi-conductor wafer 失效
标题翻译：用于定位半导体晶片的装置
公开(公告)号：US4887904A
公开(公告)日：1989-12-19
申请号：US222297
申请日：1988-07-22
申请人： Hiroshi Nakazato , Takashi Matsumura , Takahiro Akamatsu , Kenji Fukui
发明人： Hiroshi Nakazato , Takashi Matsumura , Takahiro Akamatsu , Kenji Fukui
IPC分类号： G03F7/20 , H01L21/68
CPC分类号： G03F7/70716 , G03F7/7075 , H01L21/681 , H01L21/682 , H01L2223/54493 , Y10S414/136
摘要： A device for detecting a position of an edge of a disk-like workpiece having an outer periphery whose shape includes a portion bearing positional information related to the workpiece, the device including a system for rotationally moving the workpiece; an illuminating system; and a photodetecting system; wherein the illuminating system and the photodetecting system are disposed so as to sandwich therebetween an outer peripheral portion of the workpiece when it is rotationally moved by the moving system and wherein the illuminating system projects, toward the photodetecting system, a light beam having an elongated shape in cross-section.
摘要翻译：一种用于检测具有外周的圆盘状工件的边缘的位置的装置，该外周的形状包括与工件相关的位置信息的部分，该装置包括用于旋转移动工件的系统; 照明系统; 和光电检测系统; 其中所述照明系统和所述光电检测系统被设置成当由所述移动系统旋转移动时将所述工件的外周部分夹在其间，并且所述照明系统向所述光电检测系统突出具有细长形状的光束横截面。

5. 发明申请

US20080030703A1 PROJECTION EXPOSURE APPARATUS, DEVICE MANUFACTURING METHOD, AND SENSOR UNIT 失效
标题翻译：投影曝光装置，装置制造方法和传感器单元
公开(公告)号：US20080030703A1
公开(公告)日：2008-02-07
申请号：US11764276
申请日：2007-06-18
申请人： Takahiro AKAMATSU
发明人： Takahiro AKAMATSU
IPC分类号： G03B27/42
CPC分类号： G03F7/70341 , G03F7/7085
摘要： A projection exposure apparatus, which has a projection optical system and exposes a substrate through the projection optical system and a liquid, while a gap between the projection optical system and the substrate is filled with the liquid. The apparatus includes a light-receiving element configured to detect light incident thereon through the projection optical system and the liquid, a vessel in which the light-receiving element is arranged, and a fluoroplastic filling a space within the vessel to cover the light-receiving element.
摘要翻译：投影曝光装置具有投影光学系统，并且通过投影光学系统和液体曝光基板，同时投影光学系统和基板之间的间隙被液体填充。该装置包括被配置为检测通过投影光学系统和液体入射到其上的光的光接收元件，其中布置有光接收元件的容器，以及填充容器内的空间以覆盖光接收的氟塑料元件。

6. 发明授权

US07154524B2 Exposure apparatus including a controller configured to read electrical signals from an array of photoelectric converters 有权
标题翻译：曝光装置，包括被配置为从光电转换器阵列读取电信号的控制器
公开(公告)号：US07154524B2
公开(公告)日：2006-12-26
申请号：US11256942
申请日：2005-10-25
申请人： Takahiro Akamatsu
发明人： Takahiro Akamatsu
IPC分类号： B41J2/435 , H01L21/00
CPC分类号： G01J1/4228 , G01J1/04 , G01J1/0418 , G01J2001/4238
摘要： An exposure apparatus for exposing a substrate to a light pulse via a mask. The apparatus includes an array of photoelectric converters to detect the light pulse, and a read circuit to read electrical signals from the array. The read circuit reads electrical signals from a part of the photoelectric converters sequentially switched with respect to each time interval between a successive two of the light pulses thereby to obtain cumulative electrical signals corresponding to a plurality of the light pulses.
摘要翻译：一种用于通过掩模将衬底暴露于光脉冲的曝光装置。该装置包括用于检测光脉冲的光电转换器阵列，以及从阵列读取电信号的读取电路。读取电路从相继的两个光脉冲之间的每个时间间隔顺序地切换的光电转换器的一部分读取电信号，从而获得对应于多个光脉冲的累积电信号。

7. 发明授权

US4853880A Device for positioning a semi-conductor wafer 失效
标题翻译：用于定位半导体晶片的装置
公开(公告)号：US4853880A
公开(公告)日：1989-08-01
申请号：US898222
申请日：1986-08-20
申请人： Takahiro Akamatsu , Hiroshi Nakazato , Takashi Matsumura , Kenji Fukui
发明人： Takahiro Akamatsu , Hiroshi Nakazato , Takashi Matsumura , Kenji Fukui
IPC分类号： G03F7/20
CPC分类号： G03F7/7075
摘要： A device for positioning a disk-like workpiece, the device having a system for detecting a change in position of an edge of the workpiece, the detecting system producing a signal; a system for selecting a portion of the signal produced by said detecting means, which portion contains desired positional information, the selecting means producing a signal; and a positioning system for rotating the workpiece on the basis of the signal produced by the selecting system, to thereby position the workpiece.
摘要翻译：一种用于定位盘状工件的装置，该装置具有用于检测工件边缘位置变化的系统，该检测系统产生一信号; 用于选择由所述检测装置产生的信号的一部分的系统，该部分包含期望的位置信息，所述选择装置产生信号; 以及用于基于由选择系统产生的信号旋转工件的定位系统，从而定位工件。

8. 发明授权

US07027079B2 Exposure apparatus including a read circuit for reading electrical signals from a plurality of photoelectric converters 失效
标题翻译：曝光装置包括用于从多个光电转换器读取电信号的读取电路
公开(公告)号：US07027079B2
公开(公告)日：2006-04-11
申请号：US10717545
申请日：2003-11-21
申请人： Takahiro Akamatsu
发明人： Takahiro Akamatsu
IPC分类号： B41J2/435
CPC分类号： G01J1/4228 , G01J1/04 , G01J1/0418 , G01J2001/4238
摘要： An exposure apparatus reads an electrical signal from a photoelectric sensor by using the time interval between emission pulses even at a high emission frequency of the light source. A photoelectric sensor attached to an exposure apparatus which exposes a substrate to a pulse beam emitted by a light source for generating a pulse beam has a plurality of photoelectric converters. The photoelectric converters are divided into a plurality of blocks. While charges are read from each block by using one time interval between pulse beams, charges in all the photoelectric converters are read by using a plurality of time intervals between pulse beams.
摘要翻译：曝光装置即使在光源的高发射频率下也可以通过使用发射脉冲之间的时间间隔从光电传感器读取电信号。安装在曝光装置上的光电传感器具有多个光电转换器，所述曝光装置将基板曝光于用于产生脉冲光束的光源发射的脉冲光束。光电转换器被分成多个块。虽然通过在脉冲波束之间使用一个时间间隔从每个块读取电荷，但是通过使用脉冲波束之间的多个时间间隔读取所有光电转换器中的电荷。

9. 发明申请

US20060033800A1 Exposure apparatus 有权
标题翻译：曝光装置
公开(公告)号：US20060033800A1
公开(公告)日：2006-02-16
申请号：US11256942
申请日：2005-10-25
申请人： Takahiro Akamatsu
发明人： Takahiro Akamatsu
IPC分类号： B41J2/385
CPC分类号： G01J1/4228 , G01J1/04 , G01J1/0418 , G01J2001/4238
摘要： An exposure apparatus for exposing a substrate to a light pulse via a mask. The apparatus includes an array of photoelectric converters to detect the light pulse, and a read circuit to read electrical signals from the array. The read circuit reads electrical signals from a part of the photoelectric converters sequentially switched with respect to each time interval between a successive two of the light pulses thereby to obtain cumulative electrical signals corresponding to a plurality of the light pulses.
摘要翻译：一种用于通过掩模将衬底暴露于光脉冲的曝光装置。该装置包括用于检测光脉冲的光电转换器阵列，以及从阵列读取电信号的读取电路。读取电路从相继的两个光脉冲之间的每个时间间隔顺序地切换的光电转换器的一部分读取电信号，从而获得对应于多个光脉冲的累积电信号。

10. 发明申请

US20050200815A1 Projection exposure apparatus, device manufacturing method, and sensor unit 失效
标题翻译：投影曝光装置，装置制造方法和传感器装置
公开(公告)号：US20050200815A1
公开(公告)日：2005-09-15
申请号：US11052088
申请日：2005-02-08
申请人： Takahiro Akamatsu
发明人： Takahiro Akamatsu
IPC分类号： G03F7/20 , H01L21/027 , G03B21/18
CPC分类号： G03F7/70341 , G03F7/7085
摘要： A projection exposure apparatus which has a projection optical system and projects a pattern onto a substrate through the projection optical system is disclosed. This apparatus includes a sensor unit which comprises a light-receiving element for detecting light incident through the projection optical system, a vessel in which the light-receiving element is arranged, and a sealing window which transmits the incident light and seals the vessel. A space between the sealing window and the light-receiving element is filled with a medium having a refractive index greater than 1.
摘要翻译：公开了具有投影光学系统并通过投影光学系统将图案投影到基板上的投影曝光装置。该装置包括传感器单元，其包括用于检测通过投影光学系统入射的光的光接收元件，布置有光接收元件的容器，以及透射入射光并密封容器的密封窗。密封窗和光接收元件之间的空间用折射率大于1的介质填充。

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