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1. 发明申请

US20080028345A1 APPARATUS AND METHOD FOR INTEGRATED CIRCUIT DESIGN FOR CIRCUIT EDIT 审中-公开
标题翻译：用于电路编辑的集成电路设计的装置和方法
公开(公告)号：US20080028345A1
公开(公告)日：2008-01-31
申请号：US11869336
申请日：2007-10-09
申请人： Hitesh Suri , Tahir Malik , Theodore Lundquist
发明人： Hitesh Suri , Tahir Malik , Theodore Lundquist
IPC分类号： G06F17/50 , H01L29/00
CPC分类号： G06F17/5045
摘要： A method and apparatus for optimizing an integrated circuit design for post-fabrication circuit editing and diagnostics. The method and apparatus is specifically directed to adding designed-for-edit modifications and designed-for-diagnostics structures to an integrated circuit design for post-fabrication circuit editing with a charged-particle beam tool. An integrated circuit design may be modified to create efficient and reliable access to specified nodes and structures, such as spare gates, by the charged-particle beam tool during subsequent testing and debugging of the fabricated device. Additionally, structures such as spare gates, spare transistors, spare metal wires, and debug circuitry may be added to an integrated circuit design to provide for easier editing of portions of the design that may fail.
摘要翻译：一种用于优化后制造电路编辑和诊断的集成电路设计的方法和装置。该方法和装置特别涉及将设计的编辑修改和设计的诊断结构添加到用于利用带电粒子束工具的后制造电路编辑的集成电路设计。可以修改集成电路设计，以便在随后的制造的器件的测试和调试期间通过带电粒子束工具高效且可靠地访问指定的节点和结构，例如备用栅极。此外，诸如备用栅极，备用晶体管，备用金属线和调试电路的结构可以被添加到集成电路设计中，以便更容易地编辑可能失败的部分设计。

2. 发明申请

US20070283308A1 Enhanced OP3 algorithms for net cuts, net joins, and probe points for a digital design 失效
标题翻译：增强的OP3算法，用于数字设计的网络切割，网络连接和探测点
公开(公告)号：US20070283308A1
公开(公告)日：2007-12-06
申请号：US11502951
申请日：2006-08-11
申请人： Tamal Basu , Saurabh Gupta , Tahir Malik , Hitesh Suri
发明人： Tamal Basu , Saurabh Gupta , Tahir Malik , Hitesh Suri
IPC分类号： G06F17/50
CPC分类号： G06F17/5072 , G06F17/5081
摘要： Enhanced algorithms are provided for finding circuit edit locations which utilize automated conversions from circuit schematic to physical layout design. The enhanced algorithms further include a user interface enabling the user to provide preferences, limitations, and constraints in order to bias the search to be conducted, as well as using the provided design data in order to locate the best positions for particular edit schemes, including net cuts and net joins.
摘要翻译：提供增强的算法用于查找电路编辑位置，利用从电路原理图到物理布局设计的自动转换。增强算法还包括使得用户能够提供偏好，限制和约束的用户界面，以便偏移要进行的搜索，以及使用所提供的设计数据，以定位特定编辑方案的最佳位置，包括净切割和网络连接。

3. 发明授权

US07539966B2 Enhanced OP3 algorithms for net cuts, net joins, and probe points for a digital design 失效
标题翻译：增强的OP3算法，用于数字设计的网络切割，网络连接和探测点
公开(公告)号：US07539966B2
公开(公告)日：2009-05-26
申请号：US11502951
申请日：2006-08-11
申请人： Tamal Basu , Saurabh Gupta , Tahir Malik , Hitesh Suri
发明人： Tamal Basu , Saurabh Gupta , Tahir Malik , Hitesh Suri
IPC分类号： G06F17/50
CPC分类号： G06F17/5072 , G06F17/5081
摘要： Enhanced algorithms are provided for finding circuit edit locations which utilize automated conversions from circuit schematic to physical layout design. The enhanced algorithms further include a user interface enabling the user to provide preferences, limitations, and constraints in order to bias the search to be conducted, as well as using the provided design data in order to locate the best positions for particular edit schemes, including net cuts and net joins.
摘要翻译：提供增强的算法用于查找电路编辑位置，利用从电路原理图到物理布局设计的自动转换。增强算法还包括使得用户能够提供偏好，限制和约束的用户界面，以便偏移要进行的搜索，以及使用所提供的设计数据，以定位特定编辑方案的最佳位置，包括净切割和网络连接。

4. 发明申请

US20080113455A1 Planar etching of dissimilar materials 审中-公开
标题翻译：平面蚀刻不同材料
公开(公告)号：US20080113455A1
公开(公告)日：2008-05-15
申请号：US11823565
申请日：2007-06-28
申请人： Rajesh Jain , Tahir Malik , Vladimir Makarov
发明人： Rajesh Jain , Tahir Malik , Vladimir Makarov
IPC分类号： H01L21/306 , G05D9/00 , H01L21/02
CPC分类号： H01L21/32136 , H01J37/3056 , H01J2237/3174 , H01L21/31116
摘要： A method of planar etching of dissimilar materials with a Focused Ion Beam (FIB) system such as the OptiFIB manufactured by Credence Systems. The method includes adjusting the selectivity between the two materials, which varies when the ratio of the assisting chemistry pressure to the ion dose rate changes. This method can be used in such applications as FIB circuit edit, failure analysis, and cross sectioning.
摘要翻译：用聚焦离子束（FIB）系统（如Credence Systems制造的OptiFIB）对不同材料进行平面蚀刻的方法。该方法包括调节两种材料之间的选择性，当辅助化学物质压力与离子剂量率的比率发生变化时，这种选择性会发生变化。该方法可用于FIB电路编辑，故障分析和横截面等应用。

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