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    • 3. 发明授权
    • Evaporation source
    • 蒸发源
    • US08366831B2
    • 2013-02-05
    • US12654044
    • 2009-12-08
    • Jong-Woo LeeTae-Seung Kim
    • Jong-Woo LeeTae-Seung Kim
    • C23C16/00
    • C23C14/243
    • The present invention relates to an evaporation source used in a vacuum deposition apparatus for forming an organic film or a metal film. The present invention provides an evaporation source including: a crucible accommodating a deposition material and having an opening portion through which the deposition material passes; a mesh member installed in the opening portion of the crucible and having a plurality of holes; and thermally conductive balls coated on the mesh member. Here, the thermally conductive balls are provided to cover the deposition material having a predetermined interval with the deposition material, not being mixed with the deposition material filling the crucible.
    • 本发明涉及用于形成有机膜或金属膜的真空沉积设备中的蒸发源。 本发明提供一种蒸发源,包括:容纳沉积材料并具有沉积材料通过的开口部分的坩埚; 安装在所述坩埚的开口部分并具有多个孔的网状构件; 和涂覆在网状构件上的导热球。 这里,提供导热球以覆盖与沉积材料具有预定间隔的沉积材料,而不与填充坩埚的沉积材料混合。