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    • 5. 发明授权
    • Mask and mask frame assembly for evaporation
    • 面罩和面罩框架组件用于蒸发
    • US06955726B2
    • 2005-10-18
    • US10452382
    • 2003-06-03
    • Chang Ho KangTae Seung Kim
    • Chang Ho KangTae Seung Kim
    • H05B33/10C23C14/04H01L51/50C23C16/00B44C1/22C23C14/00C25B11/00H01L21/425
    • C23C14/042H01L51/56
    • A mask frame assembly includes a frame having an opening and a mask having at least two unit mask elements. Both ends of each unit mask element are fixed to the frame in a state of tension. The unit mask elements include a unit masking pattern, and overlap each other on a predetermined width to form a single mask pattern block. Each unit mask element has a recessed wall in an overlapping portion thereof so as to maintain the thickness of the mask constant at an overlap between the unit mask elements. Accordingly, the mask frame assembly reduces distortion in an evaporation pattern due to an increase in the size of a mask pattern, facilitates the adjustment of a total pitch of evaporation patterns, and prevents evaporation from occurring at undesired positions.
    • 掩模框架组件包括具有开口的框架和具有至少两个单元掩模元件的掩模。 每个单元掩模元件的两端在张力的状态下被固定到框架上。 单元掩模元件包括单元掩模图案,并且在预定宽度上彼此重叠以形成单个掩模图案块。 每个单元掩模元件在其重叠部分中具有凹壁,以便保持掩模的厚度在单元掩模元件之间的重叠处恒定。 因此,掩模框架组件由于掩模图案的尺寸的增加而减小了蒸发图案的变形,有助于调整蒸发图案的总间距,并且防止在不希望的位置发生蒸发。
    • 8. 发明授权
    • Evaporation source
    • 蒸发源
    • US08366831B2
    • 2013-02-05
    • US12654044
    • 2009-12-08
    • Jong-Woo LeeTae-Seung Kim
    • Jong-Woo LeeTae-Seung Kim
    • C23C16/00
    • C23C14/243
    • The present invention relates to an evaporation source used in a vacuum deposition apparatus for forming an organic film or a metal film. The present invention provides an evaporation source including: a crucible accommodating a deposition material and having an opening portion through which the deposition material passes; a mesh member installed in the opening portion of the crucible and having a plurality of holes; and thermally conductive balls coated on the mesh member. Here, the thermally conductive balls are provided to cover the deposition material having a predetermined interval with the deposition material, not being mixed with the deposition material filling the crucible.
    • 本发明涉及用于形成有机膜或金属膜的真空沉积设备中的蒸发源。 本发明提供一种蒸发源,包括:容纳沉积材料并具有沉积材料通过的开口部分的坩埚; 安装在所述坩埚的开口部分并具有多个孔的网状构件; 和涂覆在网状构件上的导热球。 这里,提供导热球以覆盖与沉积材料具有预定间隔的沉积材料,而不与填充坩埚的沉积材料混合。