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    • 3. 发明申请
    • POLYMER, METHOD FOR PRODUCING THE SAME, AND RESIST COMPOSITION CONTAINING THE SAME
    • 聚合物,其制造方法和含有该组合物的耐腐蚀组合物
    • US20120165499A1
    • 2012-06-28
    • US13330971
    • 2011-12-20
    • Jung-Hoon OHJoon Hee HanTae Gon KimHyun Sang Joo
    • Jung-Hoon OHJoon Hee HanTae Gon KimHyun Sang Joo
    • C08G63/66
    • C08G63/668G03F7/0392G03F7/0395G03F7/2039
    • Provided is a copolymer containing a repeating unit represented by the following formula (1): wherein R1 represents an alkanediyl group, a heteroalkanediyl group, a cycloalkanediyl group, a heterocycloalkanediyl group, an arylene group, a heteroarylene group, or an alkylarylene group; R2 represents a hydrogen atom, an alkyl group, a heteroalkyl group, a cycloalkyl group, a heterocycloalkyl group, an aryl group, a heteroaryl group, an alkoxy group, or an alkylalkoxy group; R3, R4, R5 and R6 each independently represent a hydrogen atom or an alkyl group having 1 to 5 carbon atoms; n1 represents an integer from 0 to 10; and n2 represents an integer from 0 to 10.The copolymer, when incorporated into a resist composition, can provide a satisfactory resist pattern with high sensitivity, high resolution, high etching resistance and a reduced amount of outgas.
    • 提供含有下式(1)表示的重复单元的共聚物:其中R1表示烷二基,杂烷二基,环烷二基,杂环烷二基,亚芳基,亚杂芳基或烷基亚芳基。 R2表示氢原子,烷基,杂烷基,环烷基,杂环烷基,芳基,杂芳基,烷氧基或烷基烷氧基; R 3,R 4,R 5和R 6各自独立地表示氢原子或碳原子数1〜5的烷基。 n1表示0〜10的整数, n2表示0〜10的整数。当共聚物掺入抗蚀剂组合物中时,可以提供令人满意的抗敏剂图案,其具有高灵敏度,高分辨率,高耐蚀刻性和减少的废气量。